DK86989D0 - Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformer - Google Patents
Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformerInfo
- Publication number
- DK86989D0 DK86989D0 DK086989A DK86989A DK86989D0 DK 86989 D0 DK86989 D0 DK 86989D0 DK 086989 A DK086989 A DK 086989A DK 86989 A DK86989 A DK 86989A DK 86989 D0 DK86989 D0 DK 86989D0
- Authority
- DK
- Denmark
- Prior art keywords
- light
- abrasive particles
- sensitive recording
- photopolymerisable
- photocrosslinkable
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002245 particle Substances 0.000 abstract 4
- 239000012530 fluid Substances 0.000 abstract 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 150000002118 epoxides Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3806270A DE3806270A1 (de) | 1988-02-27 | 1988-02-27 | Lichtempfindliche aufzeichnungsmaterialien zur herstellung kratzfester tiefdruckformen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DK86989D0 true DK86989D0 (da) | 1989-02-24 |
| DK86989A DK86989A (da) | 1989-08-28 |
Family
ID=6348343
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK086989A DK86989A (da) | 1988-02-27 | 1989-02-24 | Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformer |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4994348A (da) |
| EP (1) | EP0331007B1 (da) |
| JP (1) | JPH026957A (da) |
| AT (1) | ATE80233T1 (da) |
| AU (1) | AU609256B2 (da) |
| DE (2) | DE3806270A1 (da) |
| DK (1) | DK86989A (da) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4239686A (en) * | 1978-11-21 | 1980-12-16 | Asahi Kasei Kogyo Kabushiki Kaisha | Process for producing phthalimido derivatives |
| US5153260A (en) * | 1989-11-30 | 1992-10-06 | Sumitomo Chemical Company, Limited | Resin compositions for light control sheets, and light control sheets prepared from said compositions |
| JPH03228060A (ja) * | 1990-02-01 | 1991-10-09 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
| DE4322437C1 (de) * | 1993-07-06 | 1995-03-30 | Basf Lacke & Farben | Pulverlack, Verfahren zur Außenbeschichtung von Metallrohren sowie Verwendung des Pulverlacks zur einschichtigen Außenbeschichtung von Metallrohren |
| US8178287B2 (en) * | 2006-09-08 | 2012-05-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist composition and method of forming a resist pattern |
| JP5502352B2 (ja) | 2009-03-23 | 2014-05-28 | 株式会社マキタ | 電動工具 |
| JP5405864B2 (ja) | 2009-03-23 | 2014-02-05 | 株式会社マキタ | 打撃工具 |
| JP6946619B2 (ja) * | 2016-02-25 | 2021-10-06 | 東レ株式会社 | 感光性樹脂組成物、および感光性樹脂印刷版原版 |
| JP6719310B2 (ja) * | 2016-07-14 | 2020-07-08 | 四国化成工業株式会社 | （メタ）アクリレート化合物、その合成方法および該（メタ）アクリレート化合物の利用 |
| WO2018123773A1 (ja) | 2016-12-26 | 2018-07-05 | 東レ株式会社 | 感光性樹脂組成物、およびそれを含む感光性樹脂印刷版原版 |
| JP7171404B2 (ja) * | 2017-12-22 | 2022-11-15 | 住友化学株式会社 | 樹脂、レジスト組成物及びレジストパターンの製造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3770602A (en) * | 1968-11-25 | 1973-11-06 | Ppg Industries Inc | Radiation crosslinkable polymers prepared by reacting a polyepoxy compound with an acrylic anhydride of a monocarboxylic acid |
| DE2054833A1 (de) * | 1970-11-07 | 1972-05-10 | Basf Ag | Verfahren zur Herstellung von Druckformen für den Tiefdruck |
| US3782939A (en) * | 1972-02-09 | 1974-01-01 | Mining And Mfg Co | Dry positive-acting photoresist |
| US3891443A (en) * | 1973-02-01 | 1975-06-24 | Polychrome Corp | Mat finish photosensitive relief plates |
| JPS5422208A (en) * | 1977-07-19 | 1979-02-20 | Toppan Printing Co Ltd | Method of photogravuring |
| US4221892A (en) * | 1978-11-30 | 1980-09-09 | The Dow Chemical Company | Photocurable partially esterified polyepoxides |
| DE2926236A1 (de) * | 1979-06-29 | 1981-01-15 | Hoechst Ag | Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche |
| DE3260250D1 (en) * | 1981-07-20 | 1984-07-19 | Hoechst Ag | Process for improving the technical application properties of disazo pigments |
| DE3128949A1 (de) * | 1981-07-22 | 1983-02-10 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliche aufzeichnungsmaterialien zur herstellung von abriebs- und kratzfesten tiefdruckformen sowie verfahren zur herstellung von tiefdruckformen mittels dieser aufzeichnungsmaterialien |
| US4703338A (en) * | 1983-10-14 | 1987-10-27 | Daicel Chemical Industries, Ltd. | Resin composition to seal electronic device |
-
1988
- 1988-02-27 DE DE3806270A patent/DE3806270A1/de not_active Withdrawn
-
1989
- 1989-02-23 DE DE8989103167T patent/DE58902169D1/de not_active Expired - Lifetime
- 1989-02-23 EP EP89103167A patent/EP0331007B1/de not_active Expired - Lifetime
- 1989-02-23 AT AT89103167T patent/ATE80233T1/de not_active IP Right Cessation
- 1989-02-24 US US07/315,119 patent/US4994348A/en not_active Expired - Fee Related
- 1989-02-24 DK DK086989A patent/DK86989A/da not_active Application Discontinuation
- 1989-02-24 AU AU30706/89A patent/AU609256B2/en not_active Ceased
- 1989-02-27 JP JP1043395A patent/JPH026957A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE3806270A1 (de) | 1989-09-07 |
| EP0331007A2 (de) | 1989-09-06 |
| DE58902169D1 (de) | 1992-10-08 |
| AU609256B2 (en) | 1991-04-26 |
| EP0331007A3 (en) | 1989-11-29 |
| JPH026957A (ja) | 1990-01-11 |
| ATE80233T1 (de) | 1992-09-15 |
| EP0331007B1 (de) | 1992-09-02 |
| DK86989A (da) | 1989-08-28 |
| AU3070689A (en) | 1989-08-31 |
| US4994348A (en) | 1991-02-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AHB | Application shelved due to non-payment |