JPS52134719A - Electrophotographic copying - Google Patents

Electrophotographic copying

Info

Publication number
JPS52134719A
JPS52134719A JP4745376A JP4745376A JPS52134719A JP S52134719 A JPS52134719 A JP S52134719A JP 4745376 A JP4745376 A JP 4745376A JP 4745376 A JP4745376 A JP 4745376A JP S52134719 A JPS52134719 A JP S52134719A
Authority
JP
Japan
Prior art keywords
electrophotographic copying
plates
resin
letterpresss
esp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4745376A
Other languages
Japanese (ja)
Other versions
JPS6049892B2 (en
Inventor
Fumiaki Shinozaki
Tomoaki Ikeda
Sho Nakao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4745376A priority Critical patent/JPS6049892B2/en
Priority to DE19772718047 priority patent/DE2718047B2/en
Publication of JPS52134719A publication Critical patent/JPS52134719A/en
Publication of JPS6049892B2 publication Critical patent/JPS6049892B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Abstract

PURPOSE: To enable a photopolymerizable composition suitable for use in a resist for forming esp. lithographic printing plates, resin letterpresss plates, and print substrates to be developed with water by adding a specified water soluble methacrylic acid resin.
COPYRIGHT: (C)1977,JPO&Japio
JP4745376A 1976-04-26 1976-04-26 Photopolymerizable composition Expired JPS6049892B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4745376A JPS6049892B2 (en) 1976-04-26 1976-04-26 Photopolymerizable composition
DE19772718047 DE2718047B2 (en) 1976-04-26 1977-04-22 Photopolymerizable mixture that can be developed with water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4745376A JPS6049892B2 (en) 1976-04-26 1976-04-26 Photopolymerizable composition

Publications (2)

Publication Number Publication Date
JPS52134719A true JPS52134719A (en) 1977-11-11
JPS6049892B2 JPS6049892B2 (en) 1985-11-05

Family

ID=12775561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4745376A Expired JPS6049892B2 (en) 1976-04-26 1976-04-26 Photopolymerizable composition

Country Status (2)

Country Link
JP (1) JPS6049892B2 (en)
DE (1) DE2718047B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6398651A (en) * 1986-10-15 1988-04-30 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive laminated body using thereof

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3274156D1 (en) * 1981-12-10 1986-12-11 Toray Industries Photosensitive polymer composition
EP0152889B1 (en) * 1984-02-18 1987-09-16 BASF Aktiengesellschaft Photosensitive recording material
DE3621477A1 (en) * 1985-06-26 1987-01-08 Canon Kk Resin mixture which can be cured by radiation of effective energy
DE3540950A1 (en) * 1985-11-19 1987-05-21 Basf Ag MIXTURES CROSS-LINKABLE BY PHOTOPOLYMERISATION
JP3044689B2 (en) * 1994-10-14 2000-05-22 日本ゼオン株式会社 Photosensitive elastomer composition and photosensitive rubber plate
US5543262A (en) * 1995-02-24 1996-08-06 International Paper Company Benzanthrone polymerization gate in photopolymerizable compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6398651A (en) * 1986-10-15 1988-04-30 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive laminated body using thereof

Also Published As

Publication number Publication date
DE2718047A1 (en) 1977-11-03
JPS6049892B2 (en) 1985-11-05
DE2718047B2 (en) 1979-05-03

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