JPS58171416A - 耐熱性重合体 - Google Patents
耐熱性重合体Info
- Publication number
- JPS58171416A JPS58171416A JP57053815A JP5381582A JPS58171416A JP S58171416 A JPS58171416 A JP S58171416A JP 57053815 A JP57053815 A JP 57053815A JP 5381582 A JP5381582 A JP 5381582A JP S58171416 A JPS58171416 A JP S58171416A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- formula
- group
- organosilsesquioxane
- lower alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
- C08G77/52—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/44—Block-or graft-polymers containing polysiloxane sequences containing only polysiloxane sequences
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57053815A JPS58171416A (ja) | 1982-04-02 | 1982-04-02 | 耐熱性重合体 |
DE8383103232T DE3366387D1 (en) | 1982-04-02 | 1983-03-31 | Heat-resistant silicone block polymer |
EP83103232A EP0091104B1 (en) | 1982-04-02 | 1983-03-31 | Heat-resistant silicone block polymer |
US06/480,789 US4513132A (en) | 1982-04-02 | 1983-03-31 | Heat-resistant silicone block polymer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57053815A JPS58171416A (ja) | 1982-04-02 | 1982-04-02 | 耐熱性重合体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58171416A true JPS58171416A (ja) | 1983-10-08 |
JPS6320450B2 JPS6320450B2 (US08124317-20120228-C00060.png) | 1988-04-27 |
Family
ID=12953286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57053815A Granted JPS58171416A (ja) | 1982-04-02 | 1982-04-02 | 耐熱性重合体 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4513132A (US08124317-20120228-C00060.png) |
EP (1) | EP0091104B1 (US08124317-20120228-C00060.png) |
JP (1) | JPS58171416A (US08124317-20120228-C00060.png) |
DE (1) | DE3366387D1 (US08124317-20120228-C00060.png) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001064393A (ja) * | 1999-08-06 | 2001-03-13 | Dow Corning Corp | 縮合反応硬化性シルセスキオキサン樹脂組成物並びにその合成及び硬化方法 |
JP2005076031A (ja) * | 2003-09-01 | 2005-03-24 | Samsung Electronics Co Ltd | 新規のシロキサン樹脂及びこれを用いた半導体層間絶縁膜 |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3779940T2 (de) * | 1986-03-28 | 1993-02-18 | Daikin Ind Ltd | Zusammensetzung eines formtrennmittels. |
US4780338A (en) * | 1987-03-26 | 1988-10-25 | General Electric Company | Solventless silicone coating composition |
JPH01236249A (ja) * | 1988-03-16 | 1989-09-21 | Shin Etsu Chem Co Ltd | 発泡性シリコーンゴム組成物 |
US5030699A (en) * | 1988-06-07 | 1991-07-09 | Showa Denko K.K. | Ladder silicone oligomer composition |
JPH0344238U (US08124317-20120228-C00060.png) * | 1989-09-07 | 1991-04-24 | ||
JP2928341B2 (ja) * | 1990-07-03 | 1999-08-03 | 三菱電機株式会社 | シリコーンラダー系樹脂塗布液組成物 |
JPH0438097U (US08124317-20120228-C00060.png) * | 1990-07-27 | 1992-03-31 | ||
JP2991786B2 (ja) * | 1990-11-22 | 1999-12-20 | 三菱電機株式会社 | シリコーン樹脂組成物 |
US5378790A (en) * | 1992-09-16 | 1995-01-03 | E. I. Du Pont De Nemours & Co. | Single component inorganic/organic network materials and precursors thereof |
US5412053A (en) * | 1993-08-12 | 1995-05-02 | The University Of Dayton | Polymers containing alternating silsesquioxane and bridging group segments and process for their preparation |
US5484867A (en) * | 1993-08-12 | 1996-01-16 | The University Of Dayton | Process for preparation of polyhedral oligomeric silsesquioxanes and systhesis of polymers containing polyhedral oligomeric silsesqioxane group segments |
WO1995016751A1 (en) * | 1993-12-17 | 1995-06-22 | Bp Chemicals (Hitco) Inc. | Silicone composite materials having high temperature resistance |
WO2000077575A1 (en) * | 1999-06-10 | 2000-12-21 | Alliedsignal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
US7723415B2 (en) | 1999-08-04 | 2010-05-25 | Hybrid Plastics, Inc. | POSS nanostructured chemicals as dispersion aids and friction reducing agents |
US6972312B1 (en) * | 1999-08-04 | 2005-12-06 | Hybrid Plastics Llc | Process for the formation of polyhedral oligomeric silsesquioxanes |
US7553904B2 (en) * | 1999-08-04 | 2009-06-30 | Hybrid Plastics, Inc. | High use temperature nanocomposite resins |
US7485692B2 (en) | 1999-08-04 | 2009-02-03 | Hybrid Plastics, Inc. | Process for assembly of POSS monomers |
US20060194919A1 (en) * | 1999-08-04 | 2006-08-31 | Lichtenhan Joseph D | Porosity control with polyhedral oligomeric silsesquioxanes |
US7888435B2 (en) * | 1999-08-04 | 2011-02-15 | Hybrid Plastics, Inc. | Process for continuous production of olefin polyhedral oligomeric silsesquioxane cages |
US7638195B2 (en) * | 1999-08-04 | 2009-12-29 | Hybrid Plastics, Inc. | Surface modification with polyhedral oligomeric silsesquioxanes silanols |
US6368400B1 (en) | 2000-07-17 | 2002-04-09 | Honeywell International | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US20090085011A1 (en) * | 2003-12-18 | 2009-04-02 | Lichtenhan Joseph D | Neutron shielding composition |
KR100840782B1 (ko) | 2007-01-16 | 2008-06-23 | 삼성전자주식회사 | 실록산 폴리머 조성물 및 이를 이용한 커패시터 제조 방법 |
US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
KR101631529B1 (ko) * | 2009-10-30 | 2016-06-17 | 삼성전자 주식회사 | 고분자 및 이를 포함하는 조성물과 필름 |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
JP2015515515A (ja) * | 2012-03-21 | 2015-05-28 | ダウ コーニング コーポレーションDow Corning Corporation | 樹脂−直鎖状オルガノシロキサンブロックコポリマーを調製するための方法 |
US9534089B2 (en) * | 2014-07-11 | 2017-01-03 | The Boeing Company | Temperature-resistant silicone resins |
US9309359B2 (en) | 2014-07-11 | 2016-04-12 | The Boeing Company | Temperature-resistant silicone resins |
WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
US10522330B2 (en) * | 2015-06-12 | 2019-12-31 | Varian Semiconductor Equipment Associates, Inc. | In-situ plasma cleaning of process chamber components |
WO2017201035A1 (en) * | 2016-05-20 | 2017-11-23 | Milliken & Company | Compositions comprising siloxane compounds and methods for using the same |
US11472925B2 (en) * | 2018-03-22 | 2022-10-18 | Momentive Performance Materials Inc. | Silicone polymer |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2383817A (en) * | 1940-04-30 | 1945-08-28 | Gen Electric | Organosilicon compounds |
US2562000A (en) * | 1946-10-28 | 1951-07-24 | Du Pont | Polyarylene-siloxanes and processes for making same |
US3017386A (en) * | 1959-01-21 | 1962-01-16 | Gen Electric | Benzene soluble phenyl silsesquioxanes |
US3202634A (en) * | 1960-08-24 | 1965-08-24 | Dow Corning | Silarylenesiloxane block copolymers |
US3278461A (en) * | 1963-08-01 | 1966-10-11 | Gen Electric | Silicon-silicon polymers |
US3318844A (en) * | 1963-12-23 | 1967-05-09 | Gen Electric | Organopolysiloxanes |
US3294737A (en) * | 1963-12-23 | 1966-12-27 | Gen Electric | Organopolysiloxanes |
US3398175A (en) * | 1965-02-08 | 1968-08-20 | Dow Corning | Silphenylene-containing building blocks |
US3372133A (en) * | 1965-06-23 | 1968-03-05 | Gen Electric | Process for producing organo-polysiloxanes |
US4102941A (en) * | 1976-11-11 | 1978-07-25 | General Electric Company | Method for making silarylenesiloxane-polydiorganosiloxane block polymers |
JPS56828A (en) * | 1979-06-15 | 1981-01-07 | Japan Synthetic Rubber Co Ltd | Production of block copolymer |
-
1982
- 1982-04-02 JP JP57053815A patent/JPS58171416A/ja active Granted
-
1983
- 1983-03-31 EP EP83103232A patent/EP0091104B1/en not_active Expired
- 1983-03-31 US US06/480,789 patent/US4513132A/en not_active Expired - Fee Related
- 1983-03-31 DE DE8383103232T patent/DE3366387D1/de not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001064393A (ja) * | 1999-08-06 | 2001-03-13 | Dow Corning Corp | 縮合反応硬化性シルセスキオキサン樹脂組成物並びにその合成及び硬化方法 |
JP2005076031A (ja) * | 2003-09-01 | 2005-03-24 | Samsung Electronics Co Ltd | 新規のシロキサン樹脂及びこれを用いた半導体層間絶縁膜 |
Also Published As
Publication number | Publication date |
---|---|
DE3366387D1 (en) | 1986-10-30 |
EP0091104A1 (en) | 1983-10-12 |
JPS6320450B2 (US08124317-20120228-C00060.png) | 1988-04-27 |
EP0091104B1 (en) | 1986-09-24 |
US4513132A (en) | 1985-04-23 |
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