JPS58101493A - 基板 - Google Patents
基板Info
- Publication number
- JPS58101493A JPS58101493A JP57159722A JP15972282A JPS58101493A JP S58101493 A JPS58101493 A JP S58101493A JP 57159722 A JP57159722 A JP 57159722A JP 15972282 A JP15972282 A JP 15972282A JP S58101493 A JPS58101493 A JP S58101493A
- Authority
- JP
- Japan
- Prior art keywords
- solder
- chip
- substrate
- bonding
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
め要約のデータは記録されません。
Description
【発明の詳細な説明】
本発明の分野
半導体チップのパンケージングにおける主要な技術は、
チップを装着するために用いら几るセラミック又はプラ
スチックの基板上にチップを装着しそして必要なピンの
入出力Cl10)接続を設けることである。基板は又、
〒ヤパシタ及び抵抗の如き回路構成素子を含み得る。多
くの場合において、所与の基板上に1種以上のチップを
パンケージソゲし、又は単一のチップに種々の型の接続
を設けることが必要とさnるっ従って、必要な相互接続
路と同様に、各チップのための装着パッドが設けらnね
ばならない。
チップを装着するために用いら几るセラミック又はプラ
スチックの基板上にチップを装着しそして必要なピンの
入出力Cl10)接続を設けることである。基板は又、
〒ヤパシタ及び抵抗の如き回路構成素子を含み得る。多
くの場合において、所与の基板上に1種以上のチップを
パンケージソゲし、又は単一のチップに種々の型の接続
を設けることが必要とさnるっ従って、必要な相互接続
路と同様に、各チップのための装着パッドが設けらnね
ばならない。
基板にチップを接続するために、2つの主なシステムが
用いう几ている。その1つのシステムはいわゆるフリッ
プ・チップはんだボンディング・システムであり、この
場合にはチップ表面上のはんだ接続体が基板上に形成さ
れたはんだバンドにはんだ付けさrる。その結果、チッ
プと基板との間に機械的接着(bond ing)及び
電気的接続が得うレるつもう1つのシステムはワイヤ・
ボンディング・システムであり、この場合には典型的に
はアルミニウム又は金から成るワイヤが超音波溶接の如
き方法によシチップ上及び基板上のアルミニウム、金又
は他の適合する金属に接続さnる。チップは又、機械的
強度を増すために、接着剤を用いて接着さnてもよい。
用いう几ている。その1つのシステムはいわゆるフリッ
プ・チップはんだボンディング・システムであり、この
場合にはチップ表面上のはんだ接続体が基板上に形成さ
れたはんだバンドにはんだ付けさrる。その結果、チッ
プと基板との間に機械的接着(bond ing)及び
電気的接続が得うレるつもう1つのシステムはワイヤ・
ボンディング・システムであり、この場合には典型的に
はアルミニウム又は金から成るワイヤが超音波溶接の如
き方法によシチップ上及び基板上のアルミニウム、金又
は他の適合する金属に接続さnる。チップは又、機械的
強度を増すために、接着剤を用いて接着さnてもよい。
しかしながら、アルミニウム及び金はいず几もはんだと
適合しないので相互に接続Gn得す、即ち金のワイヤ及
びアルミニウムのワイヤはいず几も従来のP b /
S nはんだに良好に接着さ几得ない。従って、従来に
おいては、単一の基板上に上記2つのシステムによる接
続を併用することは不可能であり、即ち、多数のチップ
を含む基板はすべてフリップ・チップはんだボンデ1ン
グ・システム又はワイヤ・ボンデ1ング・システムのい
すルかにより接着さnねばならず、又1つのチップは1
つの型の接続しか有することができなかった。
適合しないので相互に接続Gn得す、即ち金のワイヤ及
びアルミニウムのワイヤはいず几も従来のP b /
S nはんだに良好に接着さ几得ない。従って、従来に
おいては、単一の基板上に上記2つのシステムによる接
続を併用することは不可能であり、即ち、多数のチップ
を含む基板はすべてフリップ・チップはんだボンデ1ン
グ・システム又はワイヤ・ボンデ1ング・システムのい
すルかにより接着さnねばならず、又1つのチップは1
つの型の接続しか有することができなかった。
本発明の要旨
本発明に従って、はんだボンディング及びワイヤ・ボン
デ1ングの両方が同一の基板上に施され得る技術が達成
さ几るっそのためには、はんだパッドの配置1体が基板
上に設けられる。ワイヤ・ボンデ1ングが施さ几るべき
各パッドには、多層金属パッドがはんだ付けさ几ている
。各金属パッドは、その対応するパッドにはんだ付けさ
几ているはんだの下層と、ワイヤ・ボンデ1ングさnる
チップのワイヤに接着さ几る金属の上層と、そ几らの2
つの層の間に挿入さ几てそれらの各層に接着さ几る、上
記下層のはんだ及び上記上層の金属に対して不浸透性の
金属の障壁層とを有する。こ几は、ワイヤに不適合なは
んだパッドを、ワイヤ・ボンデ1ングさ几得るパッドに
変fヒさせるっこの技術は、所望であルば、所与のチッ
プがフリップ・チップはんだ接着部およびワイヤ接着部
を有することを可能にし、又所与の基板がそnらの両シ
ステムによシ装着さt’したチップを有することを可能
にする。
デ1ングの両方が同一の基板上に施され得る技術が達成
さ几るっそのためには、はんだパッドの配置1体が基板
上に設けられる。ワイヤ・ボンデ1ングが施さ几るべき
各パッドには、多層金属パッドがはんだ付けさ几ている
。各金属パッドは、その対応するパッドにはんだ付けさ
几ているはんだの下層と、ワイヤ・ボンデ1ングさnる
チップのワイヤに接着さ几る金属の上層と、そ几らの2
つの層の間に挿入さ几てそれらの各層に接着さ几る、上
記下層のはんだ及び上記上層の金属に対して不浸透性の
金属の障壁層とを有する。こ几は、ワイヤに不適合なは
んだパッドを、ワイヤ・ボンデ1ングさ几得るパッドに
変fヒさせるっこの技術は、所望であルば、所与のチッ
プがフリップ・チップはんだ接着部およびワイヤ接着部
を有することを可能にし、又所与の基板がそnらの両シ
ステムによシ装着さt’したチップを有することを可能
にする。
本発明の好実施例
第1図太び第2図において、本発明に従って半導体チッ
プを装着するための従来のセラミック基板10が設けら
1ている。セラミック基板10は、フリップ・チップ・
ボンデづング表面16上に形成さ几た従来のP b /
S nはんだボール14を有するクリップ・チップ・
ボンデ1ング型チツプ12と、ワイヤ・ボンディング表
面24上の適当な接続体22に接着さnfCアルミニウ
ム・ワイヤ20とを装着する様に構成さnている。
プを装着するための従来のセラミック基板10が設けら
1ている。セラミック基板10は、フリップ・チップ・
ボンデづング表面16上に形成さ几た従来のP b /
S nはんだボール14を有するクリップ・チップ・
ボンデ1ング型チツプ12と、ワイヤ・ボンディング表
面24上の適当な接続体22に接着さnfCアルミニウ
ム・ワイヤ20とを装着する様に構成さnている。
基板10は、表面上のある位置に形成されたpb/Sn
はんだパッド26の第1配列体を有し、そnらのはんだ
パッド26はチップ12上のはんだボール14と組合わ
される様に配置さnているっはんだパッド26をはんだ
ボール14にはんだ付けするために従来のはんだ再流動
技術が用いらn。
はんだパッド26の第1配列体を有し、そnらのはんだ
パッド26はチップ12上のはんだボール14と組合わ
される様に配置さnているっはんだパッド26をはんだ
ボール14にはんだ付けするために従来のはんだ再流動
技術が用いらn。
その結果チップ12が基板10に機械的に接着さn且つ
電気的に接続さnるっ 基板10は又、チップ18上のワイヤ20の外方端部に
゛対応する様に構成さnているはんだバンド28の第2
配列体を有している。パッド28の配列体における各パ
ッドには、その1つが第3図に示さnている、3層金属
ペデスタル30が接続されている。各ペデスタルは、従
来のPb/Snはんだの下層32と、アルミニウムの上
層34と、そ几らの層32及び34の間に挿入さnてい
るニッケルの中間層36とを有する。
電気的に接続さnるっ 基板10は又、チップ18上のワイヤ20の外方端部に
゛対応する様に構成さnているはんだバンド28の第2
配列体を有している。パッド28の配列体における各パ
ッドには、その1つが第3図に示さnている、3層金属
ペデスタル30が接続されている。各ペデスタルは、従
来のPb/Snはんだの下層32と、アルミニウムの上
層34と、そ几らの層32及び34の間に挿入さnてい
るニッケルの中間層36とを有する。
各ペデスタル60のはんだ下層32は、チップ18のワ
イヤ20に接着さnる様に配置さ几たアルミニウム上層
64の上面を有するペデスタル60のゲタ1」体が設け
ら几る様に、はんだパッド28の配列体におけるパッド
の1つにはんだ接続さ−rL%そしてペデスタル30の
アルミニウム上層とチップ18のアルミニウム・ワイヤ
20との間に、超音波浴接の如き溶接接続が施さ几る。
イヤ20に接着さnる様に配置さ几たアルミニウム上層
64の上面を有するペデスタル60のゲタ1」体が設け
ら几る様に、はんだパッド28の配列体におけるパッド
の1つにはんだ接続さ−rL%そしてペデスタル30の
アルミニウム上層とチップ18のアルミニウム・ワイヤ
20との間に、超音波浴接の如き溶接接続が施さ几る。
チップ18は又、所望ならば、例えばエポヤシ又ははん
だ型合金37の如き、接着剤又は金属を用いて、基板1
0の表面にポンディングさ几得る。
だ型合金37の如き、接着剤又は金属を用いて、基板1
0の表面にポンディングさ几得る。
配列体におけるはんだバンド26及び28の一部は、そ
の一部が59として示さ几ている導体によって、互いに
相互接続さル、又金属で充填さルた貫通孔38に相互接
続されているうそルらの貫通孔には入出力ピン40がろ
う付けさnているっスウエージさ几たピン(awage
d pin)の如き仙のピンも用いら几、又ピン型で
ない接続体も用いら1得ることはもちろんであるつ アルミニウム及び金はいずれもはんだに効果的に接着さ
れ得ないので、典型的にはアルミニウム、場合によって
金のワイヤを用いるワイヤ・ボンデ1ング型チンプに適
しているバンドにはんだパッド28を接続するためには
、ペデスタル60を用いることが必要である。アルミニ
ウム中P b / S nはんだとの間には、目立った
メタラジカルな接着作用が何ら生じず、金とPb/Sn
はんだとの間では、金がはんだ中に相互溶解し、金のワ
イヤは短時間のうちに完全に溶解名し得るので、接続体
が破壊さ几てしまり。従って、ワイヤ・ボンデ1ングヲ
要する各パッドには別個のペデスタルが設けらルる。は
んだの下層62は、はんだパッドにはんだ接続さ几るっ
中間層66ははんだの下層62及び金属の上層340両
方に接着せねばならず、又はんだ金属が上層の金又はア
ルミニウム中に移動しない様に七nらの層の間の障壁層
として働かねばならないっニッケル又はニッケル合金が
好ましいが、銅、銅合金及びステンレス鋼の如き他の金
属も用いらル得る。
の一部が59として示さ几ている導体によって、互いに
相互接続さル、又金属で充填さルた貫通孔38に相互接
続されているうそルらの貫通孔には入出力ピン40がろ
う付けさnているっスウエージさ几たピン(awage
d pin)の如き仙のピンも用いら几、又ピン型で
ない接続体も用いら1得ることはもちろんであるつ アルミニウム及び金はいずれもはんだに効果的に接着さ
れ得ないので、典型的にはアルミニウム、場合によって
金のワイヤを用いるワイヤ・ボンデ1ング型チンプに適
しているバンドにはんだパッド28を接続するためには
、ペデスタル60を用いることが必要である。アルミニ
ウム中P b / S nはんだとの間には、目立った
メタラジカルな接着作用が何ら生じず、金とPb/Sn
はんだとの間では、金がはんだ中に相互溶解し、金のワ
イヤは短時間のうちに完全に溶解名し得るので、接続体
が破壊さ几てしまり。従って、ワイヤ・ボンデ1ングヲ
要する各パッドには別個のペデスタルが設けらルる。は
んだの下層62は、はんだパッドにはんだ接続さ几るっ
中間層66ははんだの下層62及び金属の上層340両
方に接着せねばならず、又はんだ金属が上層の金又はア
ルミニウム中に移動しない様に七nらの層の間の障壁層
として働かねばならないっニッケル又はニッケル合金が
好ましいが、銅、銅合金及びステンレス鋼の如き他の金
属も用いらル得る。
上層64はワイヤ・ボンディング型チップのワイヤに接
着され得る金属であるべきであり、それらのワイヤは典
型的にはアルミニウム又は金のワイヤである。従って、
上面の金属は、最適な同−金層間の接着を得るために1
.ワイヤの組成に応じて、アルミニウム又は金であるべ
きであるっ処理又は再加工中に用いら几る例えば約54
0℃の如き高温において、金及びアルミニウムは迅速に
望ましくない金属間化合物を形成するので、金のワイヤ
の接着には上面に金を有するペデスタルが用いら几、ア
ルミニウム・ワイヤの接着には上面にアルミニウムを有
するペデスタルが用いらルることか好ましい。
着され得る金属であるべきであり、それらのワイヤは典
型的にはアルミニウム又は金のワイヤである。従って、
上面の金属は、最適な同−金層間の接着を得るために1
.ワイヤの組成に応じて、アルミニウム又は金であるべ
きであるっ処理又は再加工中に用いら几る例えば約54
0℃の如き高温において、金及びアルミニウムは迅速に
望ましくない金属間化合物を形成するので、金のワイヤ
の接着には上面に金を有するペデスタルが用いら几、ア
ルミニウム・ワイヤの接着には上面にアルミニウムを有
するペデスタルが用いらルることか好ましい。
第4図は、単一のチップにワイヤ・ボンデ1ング及びク
リップ・チップはんだボンデ1ングの両方による接続が
行なわルる様に適合さ几ている、本発明のもう1つの実
施例を示している。この場合には、クリップ・チップ・
ボンディング型半導体チップ44上のはんだポール42
と組合わされる、前述の如きはんだパッド26の配列体
が基板10に設けらルている。更に、チップ44は、基
板に接続さ几ねばならないチップの裏側に接続さ几てい
るアルミニウム命ワ4ヤ46を有しているっこのワ4ヤ
は、接地等の如き多くの目的に用いら几得る。その様な
接続を設けるには、ペデスタル30がはんだ付けさ几る
はんだバンド48が更に設けらnる。ペデスタル60の
アルミニウム上層34は、例えば超音波技術によシ、ア
ルミニウム・ワイヤ46に接着さCる。
リップ・チップはんだボンデ1ングの両方による接続が
行なわルる様に適合さ几ている、本発明のもう1つの実
施例を示している。この場合には、クリップ・チップ・
ボンディング型半導体チップ44上のはんだポール42
と組合わされる、前述の如きはんだパッド26の配列体
が基板10に設けらルている。更に、チップ44は、基
板に接続さ几ねばならないチップの裏側に接続さ几てい
るアルミニウム命ワ4ヤ46を有しているっこのワ4ヤ
は、接地等の如き多くの目的に用いら几得る。その様な
接続を設けるには、ペデスタル30がはんだ付けさ几る
はんだバンド48が更に設けらnる。ペデスタル60の
アルミニウム上層34は、例えば超音波技術によシ、ア
ルミニウム・ワイヤ46に接着さCる。
この技術を用いることによって、はんだパッド接続を設
ける几めに基板を従来の技術に従って処理することが出
来、そ1らが適当でない場合には、はんだパッド技術を
ワイヤ・ボンデ1ング技術に変えるためにペデスタル3
0を用いることができ、又そnらの両技術を同一基板上
で併用することが可能でおる。この様に同一チップ上に
両技術を併用し得ることの大きな利点の1つは、モジュ
ールが、他に悪影響を与えることなく、640℃μ上に
おける加熱並びに7リツプ・チップ・ボンデ1ング又は
ワイヤ・ボンデ1ングされているチップの除去及び交換
によって、処理又は再加工さn得ることである。
ける几めに基板を従来の技術に従って処理することが出
来、そ1らが適当でない場合には、はんだパッド技術を
ワイヤ・ボンデ1ング技術に変えるためにペデスタル3
0を用いることができ、又そnらの両技術を同一基板上
で併用することが可能でおる。この様に同一チップ上に
両技術を併用し得ることの大きな利点の1つは、モジュ
ールが、他に悪影響を与えることなく、640℃μ上に
おける加熱並びに7リツプ・チップ・ボンデ1ング又は
ワイヤ・ボンデ1ングされているチップの除去及び交換
によって、処理又は再加工さn得ることである。
又、この技術は、基板上にフリップ・チップ・ボンデト
ングが全く用いられず、ワイヤ・ボンディングだけが用
いら几る場合にも適用式れ得るっこの様な技術は、製造
において1つの型の技術だけを基板に用いたいが、場合
によってフリップ・チップ・ボンディング技術及びクリ
ップ・チップ・ボンデ1ング技術とワイヤ・ボンデ1ン
グ技術との組合せでなく、ワイヤ・ボンデ1ング型チン
プだけを基板に接着する必要があるときでも、コストを
節減する技術として用いられ得るっその場合には、はん
だバンドを有するフリップ・チップ・ボンデ1ング型の
基板が、本発明によるペデスタルを用いることにより、
ワイヤ・ボンディングさnたチイプだけを装着する友め
に用いらn得るっ
ングが全く用いられず、ワイヤ・ボンディングだけが用
いら几る場合にも適用式れ得るっこの様な技術は、製造
において1つの型の技術だけを基板に用いたいが、場合
によってフリップ・チップ・ボンディング技術及びクリ
ップ・チップ・ボンデ1ング技術とワイヤ・ボンデ1ン
グ技術との組合せでなく、ワイヤ・ボンデ1ング型チン
プだけを基板に接着する必要があるときでも、コストを
節減する技術として用いられ得るっその場合には、はん
だバンドを有するフリップ・チップ・ボンデ1ング型の
基板が、本発明によるペデスタルを用いることにより、
ワイヤ・ボンディングさnたチイプだけを装着する友め
に用いらn得るっ
第1図は本発明に従ってパンケージングさnている1つ
のセラミック基板及び2つの半導体チップを示す分解斜
視図、第2図は第1図の線2−2における断面図、第3
図はセラミック基板上の選択さf’L7’cパッドに取
付けら几る本発明によるペデスタルの斜視図、第4図は
単一のチップがフリップ・チップ・ボンデ1ング及びワ
イヤ・ボンデ1ングの両技術を用いて基板に接続さnて
いる、第2図と同様な断面図である。 10・・・・セラミック基板、12,44・・・・フリ
ップ・チップ・ボンデ1ング型チツプ、14.42・・
・・はんだボール、16・・・・フリップ・チップ・ボ
ンデ1ング表面、18・・・・ワイヤ・ボンディング型
チップ、20.46・・・・アルミニウム・ワ<−’v
、22・・・・接続体、24・・・・ワイヤ・ボンデ1
ング表面、26,2B、48・・・・はんだバンド、5
0・・・・3層金属ペデスタル、32・・・・はんだ下
層、34・・・・アルミニウム上層、66・・・・ニン
ケル中間層、37・・・・エポ千シ又ははんだ型合金、
38・・・・金属で充填さ几た貫通孔、39・・・・導
体、40・・・・入出力ピンっ
のセラミック基板及び2つの半導体チップを示す分解斜
視図、第2図は第1図の線2−2における断面図、第3
図はセラミック基板上の選択さf’L7’cパッドに取
付けら几る本発明によるペデスタルの斜視図、第4図は
単一のチップがフリップ・チップ・ボンデ1ング及びワ
イヤ・ボンデ1ングの両技術を用いて基板に接続さnて
いる、第2図と同様な断面図である。 10・・・・セラミック基板、12,44・・・・フリ
ップ・チップ・ボンデ1ング型チツプ、14.42・・
・・はんだボール、16・・・・フリップ・チップ・ボ
ンデ1ング表面、18・・・・ワイヤ・ボンディング型
チップ、20.46・・・・アルミニウム・ワ<−’v
、22・・・・接続体、24・・・・ワイヤ・ボンデ1
ング表面、26,2B、48・・・・はんだバンド、5
0・・・・3層金属ペデスタル、32・・・・はんだ下
層、34・・・・アルミニウム上層、66・・・・ニン
ケル中間層、37・・・・エポ千シ又ははんだ型合金、
38・・・・金属で充填さ几た貫通孔、39・・・・導
体、40・・・・入出力ピンっ
Claims (1)
- 入出力手段と、少なくとも一部が集積回路チップを相互
接続するためのパターンに配置さnている複数のはんだ
パッドとを有している。集積回路チップを装着するため
の基板において、少なくとも1つの上記はんだバンドに
多層金属ペデスタルが接続さnておシ、上記ペデスタル
は上記はんだパッドに接続さ几ているはんだの下層と、
アルミニウム又は金のワイヤに接着さnるに適している
金属の上層と、上記両層間に挿入さ几ていて上記下層の
はんだ及び上記上層の金属に対して不浸透性の金属の中
間層とを有することヲ肴徴とする、集積回路チップ装着
用基板。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US328889 | 1981-12-09 | ||
US06/328,889 US4447857A (en) | 1981-12-09 | 1981-12-09 | Substrate with multiple type connections |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58101493A true JPS58101493A (ja) | 1983-06-16 |
JPS6352776B2 JPS6352776B2 (ja) | 1988-10-20 |
Family
ID=23282896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57159722A Granted JPS58101493A (ja) | 1981-12-09 | 1982-09-16 | 基板 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4447857A (ja) |
EP (1) | EP0081135B1 (ja) |
JP (1) | JPS58101493A (ja) |
DE (1) | DE3275789D1 (ja) |
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JP3681542B2 (ja) * | 1998-07-01 | 2005-08-10 | 富士通株式会社 | プリント回路基板および多段バンプ用中継基板 |
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JP3778773B2 (ja) * | 2000-05-09 | 2006-05-24 | 三洋電機株式会社 | 板状体および半導体装置の製造方法 |
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US11239158B1 (en) * | 2020-10-08 | 2022-02-01 | Qualcomm Incorporated | Wire bond inductor structures for flip chip dies |
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-
1981
- 1981-12-09 US US06/328,889 patent/US4447857A/en not_active Expired - Lifetime
-
1982
- 1982-09-16 JP JP57159722A patent/JPS58101493A/ja active Granted
- 1982-11-23 DE DE8282110816T patent/DE3275789D1/de not_active Expired
- 1982-11-23 EP EP82110816A patent/EP0081135B1/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1987000686A1 (en) * | 1985-07-16 | 1987-01-29 | Nippon Telegraph And Telephone Corporation | Connection terminals between substrates and method of producing the same |
US4897918A (en) * | 1985-07-16 | 1990-02-06 | Nippon Telegraph And Telephone | Method of manufacturing an interboard connection terminal |
Also Published As
Publication number | Publication date |
---|---|
DE3275789D1 (en) | 1987-04-23 |
EP0081135B1 (en) | 1987-03-18 |
EP0081135A2 (en) | 1983-06-15 |
JPS6352776B2 (ja) | 1988-10-20 |
US4447857A (en) | 1984-05-08 |
EP0081135A3 (en) | 1984-07-25 |
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