JPS5795679A - Manufacturing method of selenium semiconductor device - Google Patents

Manufacturing method of selenium semiconductor device

Info

Publication number
JPS5795679A
JPS5795679A JP55171821A JP17182180A JPS5795679A JP S5795679 A JPS5795679 A JP S5795679A JP 55171821 A JP55171821 A JP 55171821A JP 17182180 A JP17182180 A JP 17182180A JP S5795679 A JPS5795679 A JP S5795679A
Authority
JP
Japan
Prior art keywords
layer
insulation
superb
heat
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55171821A
Other languages
Japanese (ja)
Other versions
JPS6248914B2 (en
Inventor
Yoshihiko Mizushima
Akitsu Takeda
Toshiro Ogino
Hideaki Ito
Masayoshi Oka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Origin Electric Co Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Origin Electric Co Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Origin Electric Co Ltd, Nippon Telegraph and Telephone Corp filed Critical Origin Electric Co Ltd
Priority to JP55171821A priority Critical patent/JPS5795679A/en
Publication of JPS5795679A publication Critical patent/JPS5795679A/en
Publication of JPS6248914B2 publication Critical patent/JPS6248914B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/0272Selenium or tellurium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To obtain a Se semiconductor device by covering with an insulation thin film a thin layer of Se or chiefly of Se on a substrate and heat-treating the insulation film at temperatures below the melting point of Se. CONSTITUTION:A thin layer 14 of Se or mostly of Se is evaporated on a substrated 11 of Al and the like, the main surface 16 of which is not necessarily made coarse. It is then covered with epoxy resin which has a high insulation and superb property in high frequencies and is resistive to heat treatment. SiO2 or the like may be used instead. It is then heat-treated at temperatures below the melting point of Si for several minutes to 60min to make a throughly crystalized Se layer 12. By this method of forming the layer 12 after covering the layer 14 with the insulation layer 13, a uniform and superb quality of the layer 12 of strong adhesion without the need of making the coarse surface is obtained. The device has a superb property and is easy to handle.
JP55171821A 1980-12-05 1980-12-05 Manufacturing method of selenium semiconductor device Granted JPS5795679A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55171821A JPS5795679A (en) 1980-12-05 1980-12-05 Manufacturing method of selenium semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55171821A JPS5795679A (en) 1980-12-05 1980-12-05 Manufacturing method of selenium semiconductor device

Publications (2)

Publication Number Publication Date
JPS5795679A true JPS5795679A (en) 1982-06-14
JPS6248914B2 JPS6248914B2 (en) 1987-10-16

Family

ID=15930356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55171821A Granted JPS5795679A (en) 1980-12-05 1980-12-05 Manufacturing method of selenium semiconductor device

Country Status (1)

Country Link
JP (1) JPS5795679A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60220967A (en) * 1984-04-18 1985-11-05 Fuji Xerox Co Ltd Semiconductor device
JP2015233027A (en) * 2013-06-13 2015-12-24 日本放送協会 Photoelectric conversion device, manufacturing method thereof, lamination type solid-state imaging device, and solar battery
CN115084290A (en) * 2022-07-06 2022-09-20 中国科学院化学研究所 Polycrystalline selenium film, preparation method thereof and solar cell

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60220967A (en) * 1984-04-18 1985-11-05 Fuji Xerox Co Ltd Semiconductor device
JP2015233027A (en) * 2013-06-13 2015-12-24 日本放送協会 Photoelectric conversion device, manufacturing method thereof, lamination type solid-state imaging device, and solar battery
CN115084290A (en) * 2022-07-06 2022-09-20 中国科学院化学研究所 Polycrystalline selenium film, preparation method thereof and solar cell
CN115084290B (en) * 2022-07-06 2023-07-25 中国科学院化学研究所 Polycrystalline selenium film, preparation method thereof and solar cell

Also Published As

Publication number Publication date
JPS6248914B2 (en) 1987-10-16

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