JPS5795658A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5795658A
JPS5795658A JP55171606A JP17160680A JPS5795658A JP S5795658 A JPS5795658 A JP S5795658A JP 55171606 A JP55171606 A JP 55171606A JP 17160680 A JP17160680 A JP 17160680A JP S5795658 A JPS5795658 A JP S5795658A
Authority
JP
Japan
Prior art keywords
oxidized film
poly
capacitor
increased
withstand voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55171606A
Other languages
English (en)
Japanese (ja)
Other versions
JPS625344B2 (enrdf_load_stackoverflow
Inventor
Keimei Mikoshiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55171606A priority Critical patent/JPS5795658A/ja
Publication of JPS5795658A publication Critical patent/JPS5795658A/ja
Publication of JPS625344B2 publication Critical patent/JPS625344B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D88/00—Three-dimensional [3D] integrated devices

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
JP55171606A 1980-12-05 1980-12-05 Manufacture of semiconductor device Granted JPS5795658A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55171606A JPS5795658A (en) 1980-12-05 1980-12-05 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55171606A JPS5795658A (en) 1980-12-05 1980-12-05 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5795658A true JPS5795658A (en) 1982-06-14
JPS625344B2 JPS625344B2 (enrdf_load_stackoverflow) 1987-02-04

Family

ID=15926275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55171606A Granted JPS5795658A (en) 1980-12-05 1980-12-05 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5795658A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846666A (ja) * 1981-09-14 1983-03-18 Seiko Epson Corp 半導体装置の製造方法
JPS61226951A (ja) * 1985-04-01 1986-10-08 Hitachi Ltd キヤパシタ
JPS62264645A (ja) * 1986-05-13 1987-11-17 Fujitsu Ltd 半導体装置の製造方法
EP0875925A3 (en) * 1997-04-30 2000-12-27 Samsung Electronics Co., Ltd. Method of manufacturing capacitors in integrated circuits

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846666A (ja) * 1981-09-14 1983-03-18 Seiko Epson Corp 半導体装置の製造方法
JPS61226951A (ja) * 1985-04-01 1986-10-08 Hitachi Ltd キヤパシタ
JPS62264645A (ja) * 1986-05-13 1987-11-17 Fujitsu Ltd 半導体装置の製造方法
EP0875925A3 (en) * 1997-04-30 2000-12-27 Samsung Electronics Co., Ltd. Method of manufacturing capacitors in integrated circuits

Also Published As

Publication number Publication date
JPS625344B2 (enrdf_load_stackoverflow) 1987-02-04

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