JPS5784188A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5784188A
JPS5784188A JP15992480A JP15992480A JPS5784188A JP S5784188 A JPS5784188 A JP S5784188A JP 15992480 A JP15992480 A JP 15992480A JP 15992480 A JP15992480 A JP 15992480A JP S5784188 A JPS5784188 A JP S5784188A
Authority
JP
Japan
Prior art keywords
electrode
type
drops
water
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15992480A
Other languages
Japanese (ja)
Inventor
Hirohisa Abe
Yasuo Josa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15992480A priority Critical patent/JPS5784188A/en
Publication of JPS5784188A publication Critical patent/JPS5784188A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/387Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • H01L2224/05073Single internal layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05556Shape in side view
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0103Zinc [Zn]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Wire Bonding (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To reduce the strain under an electrode and the generation of gouging phenomena by a method wherein electrode metal films which are to obtain ohmic contact are formed like drops of water on a side of a device which is connected to outside lead wires by bonding. CONSTITUTION:An n type GaAsP layer 12 is grown in a vapor-phase on a GaP substrate 11 and Zn is diffused to form a p type layer 13. AsZn14 is deposited on the p type GaAsP substrate 13 in vacuum by a metal mask in a form like drops of water. An AuGe film 15 is formed by vacuum deposition on the surface of the n type GaP substrate 11 and sintered to make ohmic contact. An Au film 16 is deposited on the p type GaAsP layer 13 on which patterns like drops of water of the AuZn 14 are formed and patterned and divided for each electrode.With above configuration strain under the electrode on the side of the device which is connected to outside lead wires by bonding can be reduced and the generation of gouging phenomena under the electrode can be reduced, so that the reliability can be improved.
JP15992480A 1980-11-13 1980-11-13 Semiconductor device Pending JPS5784188A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15992480A JPS5784188A (en) 1980-11-13 1980-11-13 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15992480A JPS5784188A (en) 1980-11-13 1980-11-13 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5784188A true JPS5784188A (en) 1982-05-26

Family

ID=15704122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15992480A Pending JPS5784188A (en) 1980-11-13 1980-11-13 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5784188A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5922375A (en) * 1982-07-28 1984-02-04 Matsushita Electric Ind Co Ltd Light-emitting semiconductor device
US6552367B1 (en) 1999-10-08 2003-04-22 Epistar Corporation High brightness light emitting diode having a layer of distributed contacts

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4826669A (en) * 1971-08-10 1973-04-07
JPS5098796A (en) * 1973-12-26 1975-08-06
JPS5111387A (en) * 1974-07-18 1976-01-29 Kyodo Electronic Lab

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4826669A (en) * 1971-08-10 1973-04-07
JPS5098796A (en) * 1973-12-26 1975-08-06
JPS5111387A (en) * 1974-07-18 1976-01-29 Kyodo Electronic Lab

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5922375A (en) * 1982-07-28 1984-02-04 Matsushita Electric Ind Co Ltd Light-emitting semiconductor device
US6552367B1 (en) 1999-10-08 2003-04-22 Epistar Corporation High brightness light emitting diode having a layer of distributed contacts

Similar Documents

Publication Publication Date Title
ES8507730A1 (en) Method of forming ohmic contacts.
JPS5784188A (en) Semiconductor device
JPS56142633A (en) Forming method for back electrode of semiconductor wafer
JPS57199277A (en) Semiconductor luminous elements and manufacture thereof
JPH0531317B2 (en)
JPS55111126A (en) Method of forming electrode for compound-semiconductor device
JPS5797686A (en) Light emitting element pellet
JPS5763837A (en) Semiconductor device
JPS56116674A (en) Photoelectric transducer
JPS5348671A (en) Electrode structure of semiconductor element
JPS5368578A (en) Photo mask
JPS5717188A (en) Semiconductor light-emitting element
JPS5263067A (en) Production of semiconductor device
JPS5775456A (en) Semiconductor device
JPS6428817A (en) Ohmic contact formation
JPS5752125A (en) Mesa structure semiconductor device
JPS56148835A (en) Semiconductor wafer
JPS6489333A (en) Structure of pad electrode
JPS57162482A (en) Semiconductor luminous device and manufacture thereof
JPS5756977A (en) Semiconductor pressure detector
JPS575383A (en) Manufacture of semiconductor device
JPS5736876A (en) Semiconductor photodetector
JPS5555526A (en) Method of manufacturing electrode
JPS5728359A (en) Semiconductor device
JPS5683959A (en) Semiconductor device