JPS5783035A - Etching method for semiconductor device - Google Patents
Etching method for semiconductor deviceInfo
- Publication number
- JPS5783035A JPS5783035A JP15977380A JP15977380A JPS5783035A JP S5783035 A JPS5783035 A JP S5783035A JP 15977380 A JP15977380 A JP 15977380A JP 15977380 A JP15977380 A JP 15977380A JP S5783035 A JPS5783035 A JP S5783035A
- Authority
- JP
- Japan
- Prior art keywords
- film
- etching
- gentle
- side face
- molybdenum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 title abstract 7
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 3
- 229910052750 molybdenum Inorganic materials 0.000 abstract 3
- 239000011733 molybdenum Substances 0.000 abstract 3
- 238000001020 plasma etching Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 150000004767 nitrides Chemical class 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15977380A JPS5783035A (en) | 1980-11-12 | 1980-11-12 | Etching method for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15977380A JPS5783035A (en) | 1980-11-12 | 1980-11-12 | Etching method for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5783035A true JPS5783035A (en) | 1982-05-24 |
Family
ID=15700942
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15977380A Pending JPS5783035A (en) | 1980-11-12 | 1980-11-12 | Etching method for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5783035A (ja) |
-
1980
- 1980-11-12 JP JP15977380A patent/JPS5783035A/ja active Pending
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