JPS5258476A - Method and device for etching - Google Patents

Method and device for etching

Info

Publication number
JPS5258476A
JPS5258476A JP13408175A JP13408175A JPS5258476A JP S5258476 A JPS5258476 A JP S5258476A JP 13408175 A JP13408175 A JP 13408175A JP 13408175 A JP13408175 A JP 13408175A JP S5258476 A JPS5258476 A JP S5258476A
Authority
JP
Japan
Prior art keywords
etching
occurence
ions
detection
film formed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13408175A
Other languages
Japanese (ja)
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13408175A priority Critical patent/JPS5258476A/en
Publication of JPS5258476A publication Critical patent/JPS5258476A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To prevent the occurence of over-etching by controlling etching through detection of electric signals at the substrate part obtained by ion projection in removing the film formed on the surface of a semiconductor surface by dry etching using ions.
COPYRIGHT: (C)1977,JPO&Japio
JP13408175A 1975-11-10 1975-11-10 Method and device for etching Pending JPS5258476A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13408175A JPS5258476A (en) 1975-11-10 1975-11-10 Method and device for etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13408175A JPS5258476A (en) 1975-11-10 1975-11-10 Method and device for etching

Publications (1)

Publication Number Publication Date
JPS5258476A true JPS5258476A (en) 1977-05-13

Family

ID=15119943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13408175A Pending JPS5258476A (en) 1975-11-10 1975-11-10 Method and device for etching

Country Status (1)

Country Link
JP (1) JPS5258476A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4358338A (en) * 1980-05-16 1982-11-09 Varian Associates, Inc. End point detection method for physical etching process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4358338A (en) * 1980-05-16 1982-11-09 Varian Associates, Inc. End point detection method for physical etching process

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