JPS5243372A - Process for production of semiconductor - Google Patents

Process for production of semiconductor

Info

Publication number
JPS5243372A
JPS5243372A JP11863875A JP11863875A JPS5243372A JP S5243372 A JPS5243372 A JP S5243372A JP 11863875 A JP11863875 A JP 11863875A JP 11863875 A JP11863875 A JP 11863875A JP S5243372 A JPS5243372 A JP S5243372A
Authority
JP
Japan
Prior art keywords
semiconductor
production
substrate
photoresist
failure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11863875A
Other languages
Japanese (ja)
Inventor
Hajime Matsui
Hiroaki Emoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11863875A priority Critical patent/JPS5243372A/en
Publication of JPS5243372A publication Critical patent/JPS5243372A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To remove the photoresist having been used in selective etching of the oxide film formed on one surface of a semiconductor substrate by means of plasma treatment after forming a dielectric film on the other surface, thereby preventing the failure of the substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP11863875A 1975-10-01 1975-10-01 Process for production of semiconductor Pending JPS5243372A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11863875A JPS5243372A (en) 1975-10-01 1975-10-01 Process for production of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11863875A JPS5243372A (en) 1975-10-01 1975-10-01 Process for production of semiconductor

Publications (1)

Publication Number Publication Date
JPS5243372A true JPS5243372A (en) 1977-04-05

Family

ID=14741482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11863875A Pending JPS5243372A (en) 1975-10-01 1975-10-01 Process for production of semiconductor

Country Status (1)

Country Link
JP (1) JPS5243372A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227877A (en) * 1995-10-27 1996-09-03 Hitachi Ltd Plasma treatment method and device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227877A (en) * 1995-10-27 1996-09-03 Hitachi Ltd Plasma treatment method and device

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