JPS5243372A - Process for production of semiconductor - Google Patents
Process for production of semiconductorInfo
- Publication number
- JPS5243372A JPS5243372A JP11863875A JP11863875A JPS5243372A JP S5243372 A JPS5243372 A JP S5243372A JP 11863875 A JP11863875 A JP 11863875A JP 11863875 A JP11863875 A JP 11863875A JP S5243372 A JPS5243372 A JP S5243372A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- production
- substrate
- photoresist
- failure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To remove the photoresist having been used in selective etching of the oxide film formed on one surface of a semiconductor substrate by means of plasma treatment after forming a dielectric film on the other surface, thereby preventing the failure of the substrate.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11863875A JPS5243372A (en) | 1975-10-01 | 1975-10-01 | Process for production of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11863875A JPS5243372A (en) | 1975-10-01 | 1975-10-01 | Process for production of semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5243372A true JPS5243372A (en) | 1977-04-05 |
Family
ID=14741482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11863875A Pending JPS5243372A (en) | 1975-10-01 | 1975-10-01 | Process for production of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5243372A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08227877A (en) * | 1995-10-27 | 1996-09-03 | Hitachi Ltd | Plasma treatment method and device |
-
1975
- 1975-10-01 JP JP11863875A patent/JPS5243372A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08227877A (en) * | 1995-10-27 | 1996-09-03 | Hitachi Ltd | Plasma treatment method and device |
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