JPS5779174A - Etching solution for chromium film and chromium oxide film - Google Patents
Etching solution for chromium film and chromium oxide filmInfo
- Publication number
- JPS5779174A JPS5779174A JP15667980A JP15667980A JPS5779174A JP S5779174 A JPS5779174 A JP S5779174A JP 15667980 A JP15667980 A JP 15667980A JP 15667980 A JP15667980 A JP 15667980A JP S5779174 A JPS5779174 A JP S5779174A
- Authority
- JP
- Japan
- Prior art keywords
- alcohol
- soln
- chromium
- film
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 title abstract 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052804 chromium Inorganic materials 0.000 title abstract 2
- 239000011651 chromium Substances 0.000 title abstract 2
- 229910000423 chromium oxide Inorganic materials 0.000 title abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 7
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 abstract 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 2
- 238000002156 mixing Methods 0.000 abstract 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 235000011187 glycerol Nutrition 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 125000001424 substituent group Chemical group 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 150000005846 sugar alcohols Polymers 0.000 abstract 1
- 238000001039 wet etching Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15667980A JPS5779174A (en) | 1980-11-06 | 1980-11-06 | Etching solution for chromium film and chromium oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15667980A JPS5779174A (en) | 1980-11-06 | 1980-11-06 | Etching solution for chromium film and chromium oxide film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5779174A true JPS5779174A (en) | 1982-05-18 |
| JPS6328990B2 JPS6328990B2 (enrdf_load_stackoverflow) | 1988-06-10 |
Family
ID=15632946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15667980A Granted JPS5779174A (en) | 1980-11-06 | 1980-11-06 | Etching solution for chromium film and chromium oxide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5779174A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61124589A (ja) * | 1984-11-17 | 1986-06-12 | Daikin Ind Ltd | エツチング剤組成物 |
| US6171765B1 (en) * | 1998-05-26 | 2001-01-09 | Agilent Technologies, Inc. | Photolithographic processing for polymer LEDs with reactive metal cathodes |
| WO2007010864A1 (ja) * | 2005-07-15 | 2007-01-25 | Ulvac Coating Corporation | グレートーンマスク用ブランクス、及びそれを用いたグレートーンマスク及びその製造方法 |
| WO2007010866A1 (ja) * | 2005-07-15 | 2007-01-25 | Ulvac Coating Corporation | グレートーンマスク用ブランクス、及びそれを用いたグレートーンマスク及びその製造方法 |
| EP2592131A3 (en) * | 2011-11-14 | 2013-06-12 | Advanced Technology Materials, Inc. | Aqueous cerium-containing solution having an extended bath lifetime for removing mask material |
| CN112087878A (zh) * | 2020-09-14 | 2020-12-15 | 深圳市志凌伟业光电有限公司 | 复合铜膜结构蚀刻方法 |
-
1980
- 1980-11-06 JP JP15667980A patent/JPS5779174A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61124589A (ja) * | 1984-11-17 | 1986-06-12 | Daikin Ind Ltd | エツチング剤組成物 |
| US6171765B1 (en) * | 1998-05-26 | 2001-01-09 | Agilent Technologies, Inc. | Photolithographic processing for polymer LEDs with reactive metal cathodes |
| WO2007010864A1 (ja) * | 2005-07-15 | 2007-01-25 | Ulvac Coating Corporation | グレートーンマスク用ブランクス、及びそれを用いたグレートーンマスク及びその製造方法 |
| WO2007010866A1 (ja) * | 2005-07-15 | 2007-01-25 | Ulvac Coating Corporation | グレートーンマスク用ブランクス、及びそれを用いたグレートーンマスク及びその製造方法 |
| JP4898679B2 (ja) * | 2005-07-15 | 2012-03-21 | アルバック成膜株式会社 | グレートーンマスク用ブランクスを用いたグレートーンマスクの製造方法 |
| JP4898680B2 (ja) * | 2005-07-15 | 2012-03-21 | アルバック成膜株式会社 | グレートーンマスク用ブランクスを用いたグレートーンマスクの製造方法 |
| EP2592131A3 (en) * | 2011-11-14 | 2013-06-12 | Advanced Technology Materials, Inc. | Aqueous cerium-containing solution having an extended bath lifetime for removing mask material |
| CN112087878A (zh) * | 2020-09-14 | 2020-12-15 | 深圳市志凌伟业光电有限公司 | 复合铜膜结构蚀刻方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6328990B2 (enrdf_load_stackoverflow) | 1988-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5779174A (en) | Etching solution for chromium film and chromium oxide film | |
| JPS5635130A (en) | Resist material and method for forming resist pattern | |
| JPS5483846A (en) | Diffusing plate | |
| JPS57102972A (en) | Water ink composition | |
| JPS56142071A (en) | Ink jet nozzle plate | |
| JPS5394770A (en) | Photo mask | |
| JPS5779173A (en) | Etching method for chromium film and chromium oxide film | |
| JPS5619045A (en) | Electron beam sensitive inorganic resist | |
| JPS55115478A (en) | Ink composition for ink jet printing | |
| JPS57202535A (en) | Formation of negative resist pattern | |
| JPS5339058A (en) | Production of semiconductor device | |
| JPS5461478A (en) | Chromium plate | |
| JPS5478980A (en) | Anisotropic etching method | |
| JPS55138078A (en) | Selective etching liquid for laminated metallic film | |
| GB1504264A (en) | Etching of tantalum layers | |
| JPS5495186A (en) | Production of compound semiconductor device | |
| JPS55155068A (en) | Aqueous ink for jet printing | |
| JPS5482172A (en) | Pattern forming method for mo thin film using al mask | |
| JPS5527355A (en) | Developing ink composition for lithographic plate | |
| JPS54158870A (en) | Etching method | |
| JPS5647571A (en) | Etching liquid for mo | |
| JPS5767010A (en) | Etching method for indium-phosphorus crystal | |
| JPS56126460A (en) | Nozzle plate for liquid injection | |
| JPS57172723A (en) | Formation of electrode | |
| JPS53105982A (en) | Micropattern formation method |