JPS577129A - Treating method and device for sputtering - Google Patents
Treating method and device for sputteringInfo
- Publication number
- JPS577129A JPS577129A JP8202880A JP8202880A JPS577129A JP S577129 A JPS577129 A JP S577129A JP 8202880 A JP8202880 A JP 8202880A JP 8202880 A JP8202880 A JP 8202880A JP S577129 A JPS577129 A JP S577129A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electrode
- plasma
- sio2
- jar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8202880A JPS577129A (en) | 1980-06-17 | 1980-06-17 | Treating method and device for sputtering |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8202880A JPS577129A (en) | 1980-06-17 | 1980-06-17 | Treating method and device for sputtering |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS577129A true JPS577129A (en) | 1982-01-14 |
Family
ID=13763065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8202880A Pending JPS577129A (en) | 1980-06-17 | 1980-06-17 | Treating method and device for sputtering |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS577129A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0096004A2 (de) * | 1982-05-28 | 1983-12-07 | Ciba-Geigy Ag | Neue Sulfonyl(thio)harnstoffe, Verfahren zu deren Herstellung und deren Verwendung als Herbizide und/oder Wachstumsregulatoren |
JPS5988820A (ja) * | 1982-11-15 | 1984-05-22 | Ulvac Corp | シ−トプラズマを利用した化合物半導体薄膜製造装置 |
JPH0290568A (ja) * | 1988-09-28 | 1990-03-30 | Nippon Telegr & Teleph Corp <Ntt> | 薄膜トランジスタの製造方法 |
JPH07270827A (ja) * | 1994-12-21 | 1995-10-20 | Seiko Epson Corp | 液晶表示装置の製造方法 |
EP0838535A1 (de) * | 1996-10-28 | 1998-04-29 | Leybold Systems GmbH | Interferenzschichtensystem |
JP2008001989A (ja) * | 2006-06-23 | 2008-01-10 | Qimonda Ag | スパッタ堆積装置およびスパッタ堆積方法 |
-
1980
- 1980-06-17 JP JP8202880A patent/JPS577129A/ja active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0096004A2 (de) * | 1982-05-28 | 1983-12-07 | Ciba-Geigy Ag | Neue Sulfonyl(thio)harnstoffe, Verfahren zu deren Herstellung und deren Verwendung als Herbizide und/oder Wachstumsregulatoren |
JPS5988820A (ja) * | 1982-11-15 | 1984-05-22 | Ulvac Corp | シ−トプラズマを利用した化合物半導体薄膜製造装置 |
JPH023291B2 (ja) * | 1982-11-15 | 1990-01-23 | Ulvac Corp | |
JPH0290568A (ja) * | 1988-09-28 | 1990-03-30 | Nippon Telegr & Teleph Corp <Ntt> | 薄膜トランジスタの製造方法 |
JPH07270827A (ja) * | 1994-12-21 | 1995-10-20 | Seiko Epson Corp | 液晶表示装置の製造方法 |
EP0838535A1 (de) * | 1996-10-28 | 1998-04-29 | Leybold Systems GmbH | Interferenzschichtensystem |
JP2008001989A (ja) * | 2006-06-23 | 2008-01-10 | Qimonda Ag | スパッタ堆積装置およびスパッタ堆積方法 |
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