JPS5742128A - Exposing method by electron beam - Google Patents

Exposing method by electron beam

Info

Publication number
JPS5742128A
JPS5742128A JP11795980A JP11795980A JPS5742128A JP S5742128 A JPS5742128 A JP S5742128A JP 11795980 A JP11795980 A JP 11795980A JP 11795980 A JP11795980 A JP 11795980A JP S5742128 A JPS5742128 A JP S5742128A
Authority
JP
Japan
Prior art keywords
stage
point
wafer
corrected
coordinates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11795980A
Other languages
English (en)
Inventor
Takeari Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11795980A priority Critical patent/JPS5742128A/ja
Publication of JPS5742128A publication Critical patent/JPS5742128A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
JP11795980A 1980-08-27 1980-08-27 Exposing method by electron beam Pending JPS5742128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11795980A JPS5742128A (en) 1980-08-27 1980-08-27 Exposing method by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11795980A JPS5742128A (en) 1980-08-27 1980-08-27 Exposing method by electron beam

Publications (1)

Publication Number Publication Date
JPS5742128A true JPS5742128A (en) 1982-03-09

Family

ID=14724478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11795980A Pending JPS5742128A (en) 1980-08-27 1980-08-27 Exposing method by electron beam

Country Status (1)

Country Link
JP (1) JPS5742128A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58210622A (ja) * 1982-06-01 1983-12-07 Fujitsu Ltd 電子ビ−ム露光方法
JPS59135727A (ja) * 1983-01-24 1984-08-04 Jeol Ltd 荷電粒子ビ−ム露光方法
JP2002110516A (ja) * 2000-09-28 2002-04-12 Advantest Corp 電子ビーム露光装置、露光方法、及び半導体素子製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58210622A (ja) * 1982-06-01 1983-12-07 Fujitsu Ltd 電子ビ−ム露光方法
JPH0336297B2 (ja) * 1982-06-01 1991-05-31 Fujitsu Ltd
JPS59135727A (ja) * 1983-01-24 1984-08-04 Jeol Ltd 荷電粒子ビ−ム露光方法
JP2002110516A (ja) * 2000-09-28 2002-04-12 Advantest Corp 電子ビーム露光装置、露光方法、及び半導体素子製造方法

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