JPS574165A - Mos semiconductor device - Google Patents

Mos semiconductor device

Info

Publication number
JPS574165A
JPS574165A JP7817380A JP7817380A JPS574165A JP S574165 A JPS574165 A JP S574165A JP 7817380 A JP7817380 A JP 7817380A JP 7817380 A JP7817380 A JP 7817380A JP S574165 A JPS574165 A JP S574165A
Authority
JP
Japan
Prior art keywords
bent
region
sections
bent sections
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7817380A
Other languages
Japanese (ja)
Inventor
Hiroshi Iwahashi
Masamichi Asano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7817380A priority Critical patent/JPS574165A/en
Publication of JPS574165A publication Critical patent/JPS574165A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To decrease the capacity of a gate electrode to a semiconductor substrate by making the thickness of an oxide film just under a bent section of the gate electrode thicker than the thickness of the oxide film just under a section except the bent section. CONSTITUTION:An N conductive type impurity diffusion layer is formed to the semiconductor substrate 100 so that a P conductive type impurity region 100a remains in meandering arrangement. The impurity diffusion layer constitutes a source 101 and a drain 102, holding the remaining region 100a. The oxide films 104 are made up at the bent sections 103 of the region 100a arranged meanderinly. The gate electrodes 106 are laminated on the region 100a and the bent sections 103 through gate oxide films 105. The films 105 are also set to thickness larger than other sections except the bent sections 103 at the bent sections 103. Accordingly, only capacity to the substrate 100 at the bent sections 103 can be decreased without substantially changing the width of a gate channel. Thus, the operation of a transistor at high speed can be attained.
JP7817380A 1980-06-10 1980-06-10 Mos semiconductor device Pending JPS574165A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7817380A JPS574165A (en) 1980-06-10 1980-06-10 Mos semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7817380A JPS574165A (en) 1980-06-10 1980-06-10 Mos semiconductor device

Publications (1)

Publication Number Publication Date
JPS574165A true JPS574165A (en) 1982-01-09

Family

ID=13654554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7817380A Pending JPS574165A (en) 1980-06-10 1980-06-10 Mos semiconductor device

Country Status (1)

Country Link
JP (1) JPS574165A (en)

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