JPS5741640A - Photomask and its production, and pattern transfer method using said photomask - Google Patents

Photomask and its production, and pattern transfer method using said photomask

Info

Publication number
JPS5741640A
JPS5741640A JP11731180A JP11731180A JPS5741640A JP S5741640 A JPS5741640 A JP S5741640A JP 11731180 A JP11731180 A JP 11731180A JP 11731180 A JP11731180 A JP 11731180A JP S5741640 A JPS5741640 A JP S5741640A
Authority
JP
Japan
Prior art keywords
electron beam
photomask
film
thicknesses
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11731180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS627536B2 (enrdf_load_stackoverflow
Inventor
Tatsuya Ikeuchi
Tomihiro Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP11731180A priority Critical patent/JPS5741640A/ja
Publication of JPS5741640A publication Critical patent/JPS5741640A/ja
Publication of JPS627536B2 publication Critical patent/JPS627536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11731180A 1980-08-26 1980-08-26 Photomask and its production, and pattern transfer method using said photomask Granted JPS5741640A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11731180A JPS5741640A (en) 1980-08-26 1980-08-26 Photomask and its production, and pattern transfer method using said photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11731180A JPS5741640A (en) 1980-08-26 1980-08-26 Photomask and its production, and pattern transfer method using said photomask

Publications (2)

Publication Number Publication Date
JPS5741640A true JPS5741640A (en) 1982-03-08
JPS627536B2 JPS627536B2 (enrdf_load_stackoverflow) 1987-02-18

Family

ID=14708603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11731180A Granted JPS5741640A (en) 1980-08-26 1980-08-26 Photomask and its production, and pattern transfer method using said photomask

Country Status (1)

Country Link
JP (1) JPS5741640A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2589593A1 (fr) * 1985-08-09 1987-05-07 Pichot Michel Masque de lithographie, procede de fabrication de ce masque et procede de fabrication d'un circuit integre a l'aide dudit masque
FR2606210A1 (fr) * 1986-10-30 1988-05-06 Devine Roderick Procede de fabrication d'un masque de photolithogravure et masque obtenu

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2589593A1 (fr) * 1985-08-09 1987-05-07 Pichot Michel Masque de lithographie, procede de fabrication de ce masque et procede de fabrication d'un circuit integre a l'aide dudit masque
FR2606210A1 (fr) * 1986-10-30 1988-05-06 Devine Roderick Procede de fabrication d'un masque de photolithogravure et masque obtenu

Also Published As

Publication number Publication date
JPS627536B2 (enrdf_load_stackoverflow) 1987-02-18

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