JPS5730374A - Semiconductor device and manufacture thereof - Google Patents

Semiconductor device and manufacture thereof

Info

Publication number
JPS5730374A
JPS5730374A JP10416280A JP10416280A JPS5730374A JP S5730374 A JPS5730374 A JP S5730374A JP 10416280 A JP10416280 A JP 10416280A JP 10416280 A JP10416280 A JP 10416280A JP S5730374 A JPS5730374 A JP S5730374A
Authority
JP
Japan
Prior art keywords
layers
semiconductor
single crystalline
channels
secondary electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10416280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6353706B2 (enrdf_load_html_response
Inventor
Sukehisa Hiyamizu
Toshio Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10416280A priority Critical patent/JPS5730374A/ja
Publication of JPS5730374A publication Critical patent/JPS5730374A/ja
Publication of JPS6353706B2 publication Critical patent/JPS6353706B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes

Landscapes

  • Bipolar Transistors (AREA)
  • Junction Field-Effect Transistors (AREA)
JP10416280A 1980-07-29 1980-07-29 Semiconductor device and manufacture thereof Granted JPS5730374A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10416280A JPS5730374A (en) 1980-07-29 1980-07-29 Semiconductor device and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10416280A JPS5730374A (en) 1980-07-29 1980-07-29 Semiconductor device and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS5730374A true JPS5730374A (en) 1982-02-18
JPS6353706B2 JPS6353706B2 (enrdf_load_html_response) 1988-10-25

Family

ID=14373356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10416280A Granted JPS5730374A (en) 1980-07-29 1980-07-29 Semiconductor device and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS5730374A (enrdf_load_html_response)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59106160A (ja) * 1982-12-11 1984-06-19 Nippon Telegr & Teleph Corp <Ntt> 電界効果トランジスタ
JPS59228768A (ja) * 1983-06-11 1984-12-22 Agency Of Ind Science & Technol 半導体集積回路
JPS6184870A (ja) * 1984-10-03 1986-04-30 Hitachi Ltd 半導体装置
US4983251A (en) * 1985-06-20 1991-01-08 U.S. Philips Corporation Method of manufacturing semiconductor devices
JP2011124273A (ja) * 2009-12-08 2011-06-23 Toyota Motor Corp 配線構造の製造方法及び配線構造
JPWO2011161791A1 (ja) * 2010-06-24 2013-08-19 富士通株式会社 半導体装置
CN107516667A (zh) * 2017-08-24 2017-12-26 北京华进创威电子有限公司 一种多二维电子气沟道的GaN HEMT元胞结构及器件

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011228720A (ja) * 2011-05-30 2011-11-10 Panasonic Corp 半導体装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59106160A (ja) * 1982-12-11 1984-06-19 Nippon Telegr & Teleph Corp <Ntt> 電界効果トランジスタ
JPS59228768A (ja) * 1983-06-11 1984-12-22 Agency Of Ind Science & Technol 半導体集積回路
JPS6184870A (ja) * 1984-10-03 1986-04-30 Hitachi Ltd 半導体装置
US4983251A (en) * 1985-06-20 1991-01-08 U.S. Philips Corporation Method of manufacturing semiconductor devices
JP2011124273A (ja) * 2009-12-08 2011-06-23 Toyota Motor Corp 配線構造の製造方法及び配線構造
JPWO2011161791A1 (ja) * 2010-06-24 2013-08-19 富士通株式会社 半導体装置
US9190507B2 (en) 2010-06-24 2015-11-17 Fujitsu Limited Semiconductor device
US10453948B2 (en) 2010-06-24 2019-10-22 Fujitsu Limited Semiconductor device which comprises transistor and diode
CN107516667A (zh) * 2017-08-24 2017-12-26 北京华进创威电子有限公司 一种多二维电子气沟道的GaN HEMT元胞结构及器件

Also Published As

Publication number Publication date
JPS6353706B2 (enrdf_load_html_response) 1988-10-25

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