JPS5727029A - Formation of mo pattern - Google Patents
Formation of mo patternInfo
- Publication number
- JPS5727029A JPS5727029A JP10125280A JP10125280A JPS5727029A JP S5727029 A JPS5727029 A JP S5727029A JP 10125280 A JP10125280 A JP 10125280A JP 10125280 A JP10125280 A JP 10125280A JP S5727029 A JPS5727029 A JP S5727029A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- etching
- cms
- adhered
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 3
- 239000004793 Polystyrene Substances 0.000 abstract 2
- 229920002223 polystyrene Polymers 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000005566 electron beam evaporation Methods 0.000 abstract 1
- 230000002349 favourable effect Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10125280A JPS5727029A (en) | 1980-07-25 | 1980-07-25 | Formation of mo pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10125280A JPS5727029A (en) | 1980-07-25 | 1980-07-25 | Formation of mo pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5727029A true JPS5727029A (en) | 1982-02-13 |
| JPS6137774B2 JPS6137774B2 (enrdf_load_stackoverflow) | 1986-08-26 |
Family
ID=14295717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10125280A Granted JPS5727029A (en) | 1980-07-25 | 1980-07-25 | Formation of mo pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5727029A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60123373A (ja) * | 1983-12-06 | 1985-07-02 | 齋藤 武雄 | 潜熱による加温容器 |
| JPS6299558U (enrdf_load_stackoverflow) * | 1985-12-13 | 1987-06-25 | ||
| JPH01500507A (ja) * | 1986-07-02 | 1989-02-23 | マックヴェイ，マーチン リンゼイ | 絶縁性キャリーバッグ |
| JPH0517288U (ja) * | 1991-08-21 | 1993-03-05 | 日野自動車工業株式会社 | 樹脂製部品の取付け部構造 |
| JP2009069852A (ja) * | 2001-11-02 | 2009-04-02 | Samsung Electronics Co Ltd | 反射−透過型液晶表示装置の製造方法 |
-
1980
- 1980-07-25 JP JP10125280A patent/JPS5727029A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60123373A (ja) * | 1983-12-06 | 1985-07-02 | 齋藤 武雄 | 潜熱による加温容器 |
| JPS6299558U (enrdf_load_stackoverflow) * | 1985-12-13 | 1987-06-25 | ||
| JPH01500507A (ja) * | 1986-07-02 | 1989-02-23 | マックヴェイ，マーチン リンゼイ | 絶縁性キャリーバッグ |
| JPH0517288U (ja) * | 1991-08-21 | 1993-03-05 | 日野自動車工業株式会社 | 樹脂製部品の取付け部構造 |
| JP2009069852A (ja) * | 2001-11-02 | 2009-04-02 | Samsung Electronics Co Ltd | 反射−透過型液晶表示装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6137774B2 (enrdf_load_stackoverflow) | 1986-08-26 |
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