JPS5723937A - Photographic etching method - Google Patents

Photographic etching method

Info

Publication number
JPS5723937A
JPS5723937A JP9836380A JP9836380A JPS5723937A JP S5723937 A JPS5723937 A JP S5723937A JP 9836380 A JP9836380 A JP 9836380A JP 9836380 A JP9836380 A JP 9836380A JP S5723937 A JPS5723937 A JP S5723937A
Authority
JP
Japan
Prior art keywords
resist
substrate
hmds
parts
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9836380A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0128373B2 (enrdf_load_stackoverflow
Inventor
Masaru Sasako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9836380A priority Critical patent/JPS5723937A/ja
Publication of JPS5723937A publication Critical patent/JPS5723937A/ja
Publication of JPH0128373B2 publication Critical patent/JPH0128373B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9836380A 1980-07-17 1980-07-17 Photographic etching method Granted JPS5723937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9836380A JPS5723937A (en) 1980-07-17 1980-07-17 Photographic etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9836380A JPS5723937A (en) 1980-07-17 1980-07-17 Photographic etching method

Publications (2)

Publication Number Publication Date
JPS5723937A true JPS5723937A (en) 1982-02-08
JPH0128373B2 JPH0128373B2 (enrdf_load_stackoverflow) 1989-06-02

Family

ID=14217790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9836380A Granted JPS5723937A (en) 1980-07-17 1980-07-17 Photographic etching method

Country Status (1)

Country Link
JP (1) JPS5723937A (enrdf_load_stackoverflow)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60158441A (ja) * 1983-12-20 1985-08-19 チバ−ガイギ−　アクチエンゲゼルシヤフト 画像形成方法
JPS61107346A (ja) * 1984-10-26 1986-05-26 ユセベ　エレクトロニックス，ソシエテ　アノニム フォトレジスト層中にネガ図形を形成する方法
JPS61138255A (ja) * 1984-12-07 1986-06-25 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 上部画像化プラズマ現像可能なレジスト
JPS61200537A (ja) * 1985-02-27 1986-09-05 イムテツク・プロダクツ・インコ−ポレ−テツド 蒸気拡散画像反転によりポジのホトレジストの画像の質を高める方法
JPS61268028A (ja) * 1985-04-08 1986-11-27 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ホトレジスト中にマスク像を現像する方法
JPS6225424A (ja) * 1985-07-26 1987-02-03 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法
JPS63165845A (ja) * 1986-12-26 1988-07-09 Toshiba Corp パタ−ン形成方法
JPS63300237A (ja) * 1987-05-19 1988-12-07 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 気相ホトレジスト・シリル化方法
JPH0227361A (ja) * 1988-07-18 1990-01-30 Matsushita Electric Ind Co Ltd パターン形成方法
US4921778A (en) * 1988-07-29 1990-05-01 Shipley Company Inc. Photoresist pattern fabrication employing chemically amplified metalized material
JPH02297557A (ja) * 1989-05-12 1990-12-10 Mitsubishi Electric Corp レジストパターンの形成方法
US5215867A (en) * 1983-09-16 1993-06-01 At&T Bell Laboratories Method with gas functionalized plasma developed layer
KR100776281B1 (ko) 2006-06-20 2007-11-13 세메스 주식회사 기판 처리 장치
US8267103B2 (en) 2006-06-12 2012-09-18 Semes Co. Ltd Method and apparatus for cleaning substrates

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5215867A (en) * 1983-09-16 1993-06-01 At&T Bell Laboratories Method with gas functionalized plasma developed layer
JPS60158441A (ja) * 1983-12-20 1985-08-19 チバ−ガイギ−　アクチエンゲゼルシヤフト 画像形成方法
JPH0220869A (ja) * 1984-10-26 1990-01-24 Ucb Sa 乾式現像用レジスト
JPS61107346A (ja) * 1984-10-26 1986-05-26 ユセベ　エレクトロニックス，ソシエテ　アノニム フォトレジスト層中にネガ図形を形成する方法
JPS61138255A (ja) * 1984-12-07 1986-06-25 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 上部画像化プラズマ現像可能なレジスト
JPS61200537A (ja) * 1985-02-27 1986-09-05 イムテツク・プロダクツ・インコ−ポレ−テツド 蒸気拡散画像反転によりポジのホトレジストの画像の質を高める方法
JPS61268028A (ja) * 1985-04-08 1986-11-27 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ホトレジスト中にマスク像を現像する方法
JPS6225424A (ja) * 1985-07-26 1987-02-03 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法
JPS63165845A (ja) * 1986-12-26 1988-07-09 Toshiba Corp パタ−ン形成方法
JPS63300237A (ja) * 1987-05-19 1988-12-07 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 気相ホトレジスト・シリル化方法
JPH0227361A (ja) * 1988-07-18 1990-01-30 Matsushita Electric Ind Co Ltd パターン形成方法
US4921778A (en) * 1988-07-29 1990-05-01 Shipley Company Inc. Photoresist pattern fabrication employing chemically amplified metalized material
JPH02297557A (ja) * 1989-05-12 1990-12-10 Mitsubishi Electric Corp レジストパターンの形成方法
US8267103B2 (en) 2006-06-12 2012-09-18 Semes Co. Ltd Method and apparatus for cleaning substrates
KR100776281B1 (ko) 2006-06-20 2007-11-13 세메스 주식회사 기판 처리 장치

Also Published As

Publication number Publication date
JPH0128373B2 (enrdf_load_stackoverflow) 1989-06-02

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