JPS57202535A - Formation of negative resist pattern - Google Patents

Formation of negative resist pattern

Info

Publication number
JPS57202535A
JPS57202535A JP8756981A JP8756981A JPS57202535A JP S57202535 A JPS57202535 A JP S57202535A JP 8756981 A JP8756981 A JP 8756981A JP 8756981 A JP8756981 A JP 8756981A JP S57202535 A JPS57202535 A JP S57202535A
Authority
JP
Japan
Prior art keywords
layer
plasma
resist
resist pattern
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8756981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6360893B2 (en, 2012
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8756981A priority Critical patent/JPS57202535A/ja
Publication of JPS57202535A publication Critical patent/JPS57202535A/ja
Publication of JPS6360893B2 publication Critical patent/JPS6360893B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8756981A 1981-06-09 1981-06-09 Formation of negative resist pattern Granted JPS57202535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8756981A JPS57202535A (en) 1981-06-09 1981-06-09 Formation of negative resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8756981A JPS57202535A (en) 1981-06-09 1981-06-09 Formation of negative resist pattern

Publications (2)

Publication Number Publication Date
JPS57202535A true JPS57202535A (en) 1982-12-11
JPS6360893B2 JPS6360893B2 (en, 2012) 1988-11-25

Family

ID=13918624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8756981A Granted JPS57202535A (en) 1981-06-09 1981-06-09 Formation of negative resist pattern

Country Status (1)

Country Link
JP (1) JPS57202535A (en, 2012)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211143A (en) * 1981-06-23 1982-12-24 Oki Electric Ind Co Ltd Formation of micropattern
JPS60241225A (ja) * 1984-05-14 1985-11-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 陰画レジスト像を生成する方法
JPS61107346A (ja) * 1984-10-26 1986-05-26 ユセベ　エレクトロニックス，ソシエテ　アノニム フォトレジスト層中にネガ図形を形成する方法
JPS61219034A (ja) * 1985-03-19 1986-09-29 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 耐プラズマ性重合体物質の製法
JPS62115153A (ja) * 1985-09-03 1987-05-26 ゼネラル・エレクトリツク・カンパニイ 有機フイルムから有機物質をパタ−ン化して除去する方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211143A (en) * 1981-06-23 1982-12-24 Oki Electric Ind Co Ltd Formation of micropattern
JPS60241225A (ja) * 1984-05-14 1985-11-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 陰画レジスト像を生成する方法
JPS61107346A (ja) * 1984-10-26 1986-05-26 ユセベ　エレクトロニックス，ソシエテ　アノニム フォトレジスト層中にネガ図形を形成する方法
JPH0220869A (ja) * 1984-10-26 1990-01-24 Ucb Sa 乾式現像用レジスト
JPS61219034A (ja) * 1985-03-19 1986-09-29 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 耐プラズマ性重合体物質の製法
JPS62115153A (ja) * 1985-09-03 1987-05-26 ゼネラル・エレクトリツク・カンパニイ 有機フイルムから有機物質をパタ−ン化して除去する方法

Also Published As

Publication number Publication date
JPS6360893B2 (en, 2012) 1988-11-25

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