JPS57172764A - Manufacture of semiconductor element - Google Patents

Manufacture of semiconductor element

Info

Publication number
JPS57172764A
JPS57172764A JP56057001A JP5700181A JPS57172764A JP S57172764 A JPS57172764 A JP S57172764A JP 56057001 A JP56057001 A JP 56057001A JP 5700181 A JP5700181 A JP 5700181A JP S57172764 A JPS57172764 A JP S57172764A
Authority
JP
Japan
Prior art keywords
film
layer
contact layer
mask
lead out
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56057001A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0123951B2 (enrdf_load_stackoverflow
Inventor
Seiichi Takahashi
Yoshiaki Sano
Katsuzo Uenishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56057001A priority Critical patent/JPS57172764A/ja
Publication of JPS57172764A publication Critical patent/JPS57172764A/ja
Publication of JPH0123951B2 publication Critical patent/JPH0123951B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/30—Devices controlled by electric currents or voltages
    • H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H10D48/34—Bipolar devices
    • H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions

Landscapes

  • Bipolar Transistors (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
JP56057001A 1981-04-17 1981-04-17 Manufacture of semiconductor element Granted JPS57172764A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56057001A JPS57172764A (en) 1981-04-17 1981-04-17 Manufacture of semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56057001A JPS57172764A (en) 1981-04-17 1981-04-17 Manufacture of semiconductor element

Publications (2)

Publication Number Publication Date
JPS57172764A true JPS57172764A (en) 1982-10-23
JPH0123951B2 JPH0123951B2 (enrdf_load_stackoverflow) 1989-05-09

Family

ID=13043235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56057001A Granted JPS57172764A (en) 1981-04-17 1981-04-17 Manufacture of semiconductor element

Country Status (1)

Country Link
JP (1) JPS57172764A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59149055A (ja) * 1983-02-12 1984-08-25 アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド バイポ−ラプレ−ナトランジスタの製造方法
JPS6057667A (ja) * 1983-09-08 1985-04-03 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS60119775A (ja) * 1983-12-02 1985-06-27 Hitachi Ltd 半導体装置の製造方法
JPS60145659A (ja) * 1984-01-10 1985-08-01 Oki Electric Ind Co Ltd 半導体素子の製造方法
JPS63182860A (ja) * 1987-01-26 1988-07-28 Toshiba Corp 半導体装置とその製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59149055A (ja) * 1983-02-12 1984-08-25 アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド バイポ−ラプレ−ナトランジスタの製造方法
JPS6057667A (ja) * 1983-09-08 1985-04-03 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS60119775A (ja) * 1983-12-02 1985-06-27 Hitachi Ltd 半導体装置の製造方法
JPS60145659A (ja) * 1984-01-10 1985-08-01 Oki Electric Ind Co Ltd 半導体素子の製造方法
JPS63182860A (ja) * 1987-01-26 1988-07-28 Toshiba Corp 半導体装置とその製造方法

Also Published As

Publication number Publication date
JPH0123951B2 (enrdf_load_stackoverflow) 1989-05-09

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