JPS57164984A - Exfoliating solution for tin or tin alloy - Google Patents
Exfoliating solution for tin or tin alloyInfo
- Publication number
- JPS57164984A JPS57164984A JP56050515A JP5051581A JPS57164984A JP S57164984 A JPS57164984 A JP S57164984A JP 56050515 A JP56050515 A JP 56050515A JP 5051581 A JP5051581 A JP 5051581A JP S57164984 A JPS57164984 A JP S57164984A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- contg
- exfoliating
- soln
- tin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56050515A JPS57164984A (en) | 1981-04-06 | 1981-04-06 | Exfoliating solution for tin or tin alloy |
DE19823212410 DE3212410A1 (de) | 1981-04-06 | 1982-04-02 | Abstreifloesung fuer zinn und zinnlegierungen |
GB8210057A GB2099855A (en) | 1981-04-06 | 1982-04-05 | Acidic aqueous solution for stripping tin or tin alloys from copper plate |
US06/366,018 US4374744A (en) | 1981-04-06 | 1982-04-06 | Stripping solution for tin or tin alloys |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56050515A JPS57164984A (en) | 1981-04-06 | 1981-04-06 | Exfoliating solution for tin or tin alloy |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57164984A true JPS57164984A (en) | 1982-10-09 |
JPH0151548B2 JPH0151548B2 (ja) | 1989-11-06 |
Family
ID=12861103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56050515A Granted JPS57164984A (en) | 1981-04-06 | 1981-04-06 | Exfoliating solution for tin or tin alloy |
Country Status (4)
Country | Link |
---|---|
US (1) | US4374744A (ja) |
JP (1) | JPS57164984A (ja) |
DE (1) | DE3212410A1 (ja) |
GB (1) | GB2099855A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58123878A (ja) * | 1982-01-11 | 1983-07-23 | エンソ−ン・インコ−ポレ−テツド | 剥離材 |
JPS59219475A (ja) * | 1983-05-30 | 1984-12-10 | Metsuku Kk | 錫または錫合金の剥離液 |
JPH01129491A (ja) * | 1987-11-16 | 1989-05-22 | Metsuku Kk | 錫または錫一鉛合金の剥離方法 |
US5223087A (en) * | 1989-04-18 | 1993-06-29 | Tokai Denka Kogyo Kabushiki Kaisha | Chemical solubilizing agent for tin or tin alloy |
JP2010111748A (ja) * | 2008-11-05 | 2010-05-20 | Mec Kk | 接着層形成液及び接着層形成方法 |
CN105441954A (zh) * | 2015-12-22 | 2016-03-30 | 安徽省春谷3D打印智能装备产业技术研究院有限公司 | 金属表面光亮剂材料组合物和金属表面光亮剂 |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1144797B (it) * | 1981-10-14 | 1986-10-29 | Alfachimici Spa | Soluzione per l asportazione di stagno o lega stagno piombo da un substrato mediante operazione a spruzzo |
USRE32555E (en) * | 1982-09-20 | 1987-12-08 | Circuit Chemistry Corporation | Solder stripping solution |
US4704234A (en) * | 1983-01-17 | 1987-11-03 | American Cyanamid Company | Compositions comprising imidazole, pyrazole or derivatives thereof for removing undesirable organic matter from a surface |
US4537638A (en) * | 1983-01-17 | 1985-08-27 | American Cyanamid Co. | Method for removal of undesirable organic matter |
AT380493B (de) * | 1984-06-18 | 1986-05-26 | Kapsch Ag | Mittel zur chemischen oberflaechenbehandlung von metallen |
USRE34613E (en) * | 1985-05-28 | 1994-05-24 | Recytec Sa | Process for decontaminating radioactively contaminated metal or cement-containing materials |
JPS63172799A (ja) * | 1987-01-12 | 1988-07-16 | 日本パ−カライジング株式会社 | アルミニウムの表面洗浄剤 |
DE3738307A1 (de) * | 1987-11-11 | 1989-05-24 | Ruwel Werke Gmbh | Badloesungen und verfahren zum entfernen von blei/zinn-, blei- bzw. zinnschichten auf kupfer- oder nickeloberflaechen |
GB8829253D0 (en) * | 1988-12-15 | 1989-01-25 | Imasa Ltd | Method of removing deposits of tin lead or tin/lead alloys from copper substrates and compositions for use therein |
US4957653A (en) * | 1989-04-07 | 1990-09-18 | Macdermid, Incorporated | Composition containing alkane sulfonic acid and ferric nitrate for stripping tin or tin-lead alloy from copper surfaces, and method for stripping tin or tin-lead alloy |
US4944851A (en) * | 1989-06-05 | 1990-07-31 | Macdermid, Incorporated | Electrolytic method for regenerating tin or tin-lead alloy stripping compositions |
US4921571A (en) * | 1989-07-28 | 1990-05-01 | Macdermid, Incorporated | Inhibited composition and method for stripping tin, lead or tin-lead alloy from copper surfaces |
JPH0375386A (ja) * | 1989-08-18 | 1991-03-29 | Metsuku Kk | 錫又は錫‐鉛合金の剥離方法 |
US5017267A (en) * | 1990-07-17 | 1991-05-21 | Macdermid, Incorporated | Composition and method for stripping tin or tin-lead alloy from copper surfaces |
CH682023A5 (ja) * | 1990-10-26 | 1993-06-30 | Recytec Sa | |
US5234542A (en) * | 1992-03-04 | 1993-08-10 | Macdermid, Incorporated | Composition and process for stripping tin from copper surfaces |
DE4335716C2 (de) * | 1993-04-30 | 2001-07-26 | Ami Doduco Gmbh | Verwendung eines Additives aus einem Emulgator und einem oder mehreren Inhibitoren zu einem Bad zum Entfernen von Schichten aus Nickel, Zinn, Blei oder Zinn-Blei von Oberflächen aus Kupfer oder Kupferlegierungen |
JP3400558B2 (ja) * | 1994-08-12 | 2003-04-28 | メック株式会社 | 銅および銅合金のエッチング液 |
GB9425090D0 (en) * | 1994-12-12 | 1995-02-08 | Alpha Metals Ltd | Copper coating |
US5741432A (en) * | 1995-01-17 | 1998-04-21 | The Dexter Corporation | Stabilized nitric acid compositions |
US5911907A (en) * | 1995-08-30 | 1999-06-15 | Surface Tek Specialty Products, Inc. | Composition and method for stripping tin and tin-lead from copper surfaces |
TW470785B (en) | 1998-02-03 | 2002-01-01 | Atotech Deutschland Gmbh | Process for preliminary treatment of copper surfaces |
US6649081B1 (en) | 1998-03-24 | 2003-11-18 | Henkel Corporation | Aqueous liquid deoxidizing composition and process for aluminum, with low foaming tendency |
SG83733A1 (en) * | 1998-06-26 | 2001-10-16 | Atotech Deutschland Gmbh | Solution and process to pretreat copper surfaces |
SG83734A1 (en) * | 1998-06-26 | 2001-10-16 | Atotech Deutschland Gmbh | Process to pretreat copper surfaces |
US7351353B1 (en) * | 2000-01-07 | 2008-04-01 | Electrochemicals, Inc. | Method for roughening copper surfaces for bonding to substrates |
EP1356502A1 (en) * | 2001-01-16 | 2003-10-29 | Cabot Microelectronics Corporation | Ammonium oxalate-containing polishing system and method |
TWI231831B (en) * | 2001-10-11 | 2005-05-01 | Shipley Co Llc | Stripping solution |
TW200417628A (en) * | 2002-09-09 | 2004-09-16 | Shipley Co Llc | Improved cleaning composition |
JP4585299B2 (ja) * | 2004-12-09 | 2010-11-24 | 東京応化工業株式会社 | リソグラフィー用リンス液及びそれを用いたレジストパターン形成方法 |
CN101233601A (zh) * | 2005-06-13 | 2008-07-30 | 高级技术材料公司 | 在金属硅化物形成后用于选择性除去金属或金属合金的组合物及方法 |
FI121569B (fi) * | 2005-10-14 | 2011-01-14 | Yara Suomi Oy | Menetelmä metallioksidien saostamiseksi jätevesiliuoksesta |
ES2348361T3 (es) * | 2005-10-25 | 2010-12-03 | Atotech Deutschland Gmbh | Método para adhesión mejorada de materiales polímeros a superficies de cobre o aleaciones de cobre. |
TWI516573B (zh) * | 2007-02-06 | 2016-01-11 | 安堤格里斯公司 | 選擇性移除TiSiN之組成物及方法 |
DE102008001792A1 (de) * | 2008-05-15 | 2009-11-19 | Robert Bosch Gmbh | Verfahren zur Bestimmung der Neigung zur Bildung von Whiskern |
TW201634701A (zh) | 2010-04-15 | 2016-10-01 | 安堤格里斯公司 | 廢棄印刷電路板之回收利用方法 |
US20120098120A1 (en) * | 2010-10-21 | 2012-04-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Centripetal layout for low stress chip package |
SG11201403228RA (en) | 2011-12-15 | 2014-07-30 | Advanced Tech Materials | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment |
US10494696B2 (en) * | 2013-07-08 | 2019-12-03 | Alpha Assembly Solution Inc. | Metal recovery |
TWI521097B (zh) | 2014-06-25 | 2016-02-11 | 優勝奈米科技有限公司 | 剝錫添加劑及其應用 |
CN105506631A (zh) * | 2016-01-29 | 2016-04-20 | 江苏净拓环保科技有限公司 | 一种pcb表面退锡液 |
US10796956B2 (en) | 2018-06-29 | 2020-10-06 | Texas Instruments Incorporated | Contact fabrication to mitigate undercut |
CN109898085B (zh) * | 2019-04-10 | 2021-07-09 | 深圳市松柏实业发展有限公司 | 退锡组合液及退锡方法 |
CN113984465A (zh) * | 2021-10-12 | 2022-01-28 | 江西洪都航空工业集团有限责任公司 | 一种用于溶解钎锡焊料的溶解液及溶解方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1908421C3 (de) * | 1969-02-20 | 1978-03-30 | Gerhard Collardin Gmbh, 5000 Koeln | Mittel zum Ablösen von kupferhaltigen Metallüberzügen von Eisen- und Stahloberflächen |
US3841905A (en) * | 1970-11-19 | 1974-10-15 | Rbp Chem Corp | Method of preparing printed circuit boards with terminal tabs |
JPS5221460B1 (ja) * | 1971-04-26 | 1977-06-10 | ||
GB1446816A (en) * | 1973-05-02 | 1976-08-18 | Furukawa Electric Co Ltd | Chemical dissolution treatment of tin or alloys thereof |
US3926699A (en) * | 1974-06-17 | 1975-12-16 | Rbp Chemical Corp | Method of preparing printed circuit boards with terminal tabs |
US3990982A (en) * | 1974-12-18 | 1976-11-09 | Rbp Chemical Corporation | Composition for stripping lead-tin solder |
GB1565349A (en) * | 1975-10-20 | 1980-04-16 | Albright & Wilson | Aluminium polishing compositions |
US4297257A (en) * | 1980-04-17 | 1981-10-27 | Dart Industries Inc. | Metal stripping composition and method |
JPH0517336A (ja) * | 1991-07-10 | 1993-01-26 | Shiseido Co Ltd | 皮膚外用剤 |
-
1981
- 1981-04-06 JP JP56050515A patent/JPS57164984A/ja active Granted
-
1982
- 1982-04-02 DE DE19823212410 patent/DE3212410A1/de active Granted
- 1982-04-05 GB GB8210057A patent/GB2099855A/en not_active Withdrawn
- 1982-04-06 US US06/366,018 patent/US4374744A/en not_active Expired - Lifetime
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58123878A (ja) * | 1982-01-11 | 1983-07-23 | エンソ−ン・インコ−ポレ−テツド | 剥離材 |
JPS6334231B2 (ja) * | 1982-01-11 | 1988-07-08 | Ensoon Inc | |
JPS59219475A (ja) * | 1983-05-30 | 1984-12-10 | Metsuku Kk | 錫または錫合金の剥離液 |
JPS6242035B2 (ja) * | 1983-05-30 | 1987-09-05 | Metsuku Kk | |
JPH01129491A (ja) * | 1987-11-16 | 1989-05-22 | Metsuku Kk | 錫または錫一鉛合金の剥離方法 |
US5223087A (en) * | 1989-04-18 | 1993-06-29 | Tokai Denka Kogyo Kabushiki Kaisha | Chemical solubilizing agent for tin or tin alloy |
JP2010111748A (ja) * | 2008-11-05 | 2010-05-20 | Mec Kk | 接着層形成液及び接着層形成方法 |
CN105441954A (zh) * | 2015-12-22 | 2016-03-30 | 安徽省春谷3D打印智能装备产业技术研究院有限公司 | 金属表面光亮剂材料组合物和金属表面光亮剂 |
Also Published As
Publication number | Publication date |
---|---|
GB2099855A (en) | 1982-12-15 |
US4374744A (en) | 1983-02-22 |
JPH0151548B2 (ja) | 1989-11-06 |
DE3212410C2 (ja) | 1988-01-07 |
DE3212410A1 (de) | 1982-10-28 |
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