JPS57162465A - Mis transistor device - Google Patents

Mis transistor device

Info

Publication number
JPS57162465A
JPS57162465A JP56047477A JP4747781A JPS57162465A JP S57162465 A JPS57162465 A JP S57162465A JP 56047477 A JP56047477 A JP 56047477A JP 4747781 A JP4747781 A JP 4747781A JP S57162465 A JPS57162465 A JP S57162465A
Authority
JP
Japan
Prior art keywords
same
gate
interposing
substrate
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56047477A
Other languages
Japanese (ja)
Inventor
Yuji Furumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56047477A priority Critical patent/JPS57162465A/en
Publication of JPS57162465A publication Critical patent/JPS57162465A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain an MIS transistor device generating no variation of threshold voltage by a method wherein mutually adjoinin MIS transistors of two groups are constituted of electrode plates consisting of the same conductive material, insulating films consisting of the same material and having the same thickness, and the regions consisting of the same semiconductor material, the electrode plates are connected electrically, and one of the transistors is used as a gate. CONSTITUTION:The n type source region and drain region are formed by diffusion in the surface region of a p type Si substrate 42, and the gate electrode 41 is provided on the surface of the substrate 42 between the regions thereof interposing a gate insulating film 44 between them to constitute the MIS transistor. While polycrystallines Si layer 46 is provided on the surface region adjoining thereto interposing an insulating film 42 between them, and moreover a gate electrode 41' is formed thereon interposing an insulating film 44' between them. At this time, the two electrodes 41, 41' are formed with the same conductive material and are connected electrically, and the gate insulating films 44, 44' are formed with the same insulating material having the same thickness. Moreover the polycrystalline Si layer 46 is also formed with the material the same with the substrate 42, and impurity concentration are also made as the same.
JP56047477A 1981-03-31 1981-03-31 Mis transistor device Pending JPS57162465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56047477A JPS57162465A (en) 1981-03-31 1981-03-31 Mis transistor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56047477A JPS57162465A (en) 1981-03-31 1981-03-31 Mis transistor device

Publications (1)

Publication Number Publication Date
JPS57162465A true JPS57162465A (en) 1982-10-06

Family

ID=12776211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56047477A Pending JPS57162465A (en) 1981-03-31 1981-03-31 Mis transistor device

Country Status (1)

Country Link
JP (1) JPS57162465A (en)

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