JPS57137473A - Etching method for aluminum film - Google Patents

Etching method for aluminum film

Info

Publication number
JPS57137473A
JPS57137473A JP2197581A JP2197581A JPS57137473A JP S57137473 A JPS57137473 A JP S57137473A JP 2197581 A JP2197581 A JP 2197581A JP 2197581 A JP2197581 A JP 2197581A JP S57137473 A JPS57137473 A JP S57137473A
Authority
JP
Japan
Prior art keywords
mask
film
etched
etching
ion etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2197581A
Other languages
Japanese (ja)
Inventor
Hiroshi Ikejima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2197581A priority Critical patent/JPS57137473A/en
Publication of JPS57137473A publication Critical patent/JPS57137473A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To obtain an accurately etched side face having a smoothened corner and a gently inclined plane by subjecting an Al film formed on a substrate to isotropic etching and anisotropic etching under the same mask. CONSTITUTION:An Al film 3 is formed on an oxide film 2 formed on a silicon substrate 1. After forming a mask 4 having a prescribed pattern, the film 3 is isotropically etched to the intermediate part through the mask 4 with an etching soln. such as hot phosphoric acid. Reactive ion etching is continuously carried out through the mask 4 with gaseous CCl4 or BCl2 to remove the residual part. The ion etching proceeds anisotropically, and the masked part is not etched to give a stepped etched section. This process is suitable for the fine working of an integrated circuit, etc.
JP2197581A 1981-02-17 1981-02-17 Etching method for aluminum film Pending JPS57137473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2197581A JPS57137473A (en) 1981-02-17 1981-02-17 Etching method for aluminum film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2197581A JPS57137473A (en) 1981-02-17 1981-02-17 Etching method for aluminum film

Publications (1)

Publication Number Publication Date
JPS57137473A true JPS57137473A (en) 1982-08-25

Family

ID=12070026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2197581A Pending JPS57137473A (en) 1981-02-17 1981-02-17 Etching method for aluminum film

Country Status (1)

Country Link
JP (1) JPS57137473A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5923876A (en) * 1982-07-28 1984-02-07 Hitachi Ltd Etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5923876A (en) * 1982-07-28 1984-02-07 Hitachi Ltd Etching method
JPS6214636B2 (en) * 1982-07-28 1987-04-03 Hitachi Ltd

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