JPS5413500A - Etching method for indium phosphorus single crystal to mirror face - Google Patents

Etching method for indium phosphorus single crystal to mirror face

Info

Publication number
JPS5413500A
JPS5413500A JP7849177A JP7849177A JPS5413500A JP S5413500 A JPS5413500 A JP S5413500A JP 7849177 A JP7849177 A JP 7849177A JP 7849177 A JP7849177 A JP 7849177A JP S5413500 A JPS5413500 A JP S5413500A
Authority
JP
Japan
Prior art keywords
mirror face
single crystal
etching method
soln
indium phosphorus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7849177A
Other languages
Japanese (ja)
Other versions
JPS605560B2 (en
Inventor
Yorimitsu Nishitani
Kenzo Akita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP52078491A priority Critical patent/JPS605560B2/en
Publication of JPS5413500A publication Critical patent/JPS5413500A/en
Publication of JPS605560B2 publication Critical patent/JPS605560B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To obtain the title mirror face with little residual scratches due to polishing and pin holes by carrying out etching with a soln. of sulfuric acid or phosphoric acid contg. a specified amt. of H2O2, or an aq. soln. of nitric acid or sulfuric acid and further carrying out etching wtih a bromine-contg. soln. of alcohols, acetone or acetic acid.
COPYRIGHT: (C)1979,JPO&Japio
JP52078491A 1977-07-02 1977-07-02 Mirror etching method for indium phosphide single crystal Expired JPS605560B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52078491A JPS605560B2 (en) 1977-07-02 1977-07-02 Mirror etching method for indium phosphide single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52078491A JPS605560B2 (en) 1977-07-02 1977-07-02 Mirror etching method for indium phosphide single crystal

Publications (2)

Publication Number Publication Date
JPS5413500A true JPS5413500A (en) 1979-01-31
JPS605560B2 JPS605560B2 (en) 1985-02-12

Family

ID=13663437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52078491A Expired JPS605560B2 (en) 1977-07-02 1977-07-02 Mirror etching method for indium phosphide single crystal

Country Status (1)

Country Link
JP (1) JPS605560B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62252140A (en) * 1986-04-25 1987-11-02 Nippon Mining Co Ltd Cleaning method for inp wafer
JPS62290137A (en) * 1986-06-10 1987-12-17 Nippon Mining Co Ltd Mirroe polishing liquid for inp wafer
WO2010122821A1 (en) 2009-04-20 2010-10-28 住友電気工業株式会社 Process for producing indium-phosphorus substrate, process for producing epitaxial wafer, indium-phosphorus substrate, and epitaxial wafer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4841755A (en) * 1971-09-28 1973-06-18
JPS4885084A (en) * 1972-01-27 1973-11-12

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4841755A (en) * 1971-09-28 1973-06-18
JPS4885084A (en) * 1972-01-27 1973-11-12

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62252140A (en) * 1986-04-25 1987-11-02 Nippon Mining Co Ltd Cleaning method for inp wafer
JPS62290137A (en) * 1986-06-10 1987-12-17 Nippon Mining Co Ltd Mirroe polishing liquid for inp wafer
WO2010122821A1 (en) 2009-04-20 2010-10-28 住友電気工業株式会社 Process for producing indium-phosphorus substrate, process for producing epitaxial wafer, indium-phosphorus substrate, and epitaxial wafer
US8487409B2 (en) 2009-04-20 2013-07-16 Sumitomo Electric Industries, Ltd. Indium phosphide substrate manufacturing method, epitaxial wafer manufacturing method indium phosphide substrate, and epitaxial wafer

Also Published As

Publication number Publication date
JPS605560B2 (en) 1985-02-12

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