JPS5424236A - Etching solution and minute working process - Google Patents

Etching solution and minute working process

Info

Publication number
JPS5424236A
JPS5424236A JP8955477A JP8955477A JPS5424236A JP S5424236 A JPS5424236 A JP S5424236A JP 8955477 A JP8955477 A JP 8955477A JP 8955477 A JP8955477 A JP 8955477A JP S5424236 A JPS5424236 A JP S5424236A
Authority
JP
Japan
Prior art keywords
etching solution
working process
minute working
minute
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8955477A
Other languages
Japanese (ja)
Inventor
Masumi Nakamichi
Tetsuo Muramatsu
Masaya Masukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP8955477A priority Critical patent/JPS5424236A/en
Publication of JPS5424236A publication Critical patent/JPS5424236A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)

Abstract

PURPOSE:To carry out efficient minute working of a Co-Ni alloy film which becomes passivity to nitric acid at a high etching rate and form a good pattern by etching the film with an aq. soln. of hydrochloric acid contg. H2O2.
JP8955477A 1977-07-25 1977-07-25 Etching solution and minute working process Pending JPS5424236A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8955477A JPS5424236A (en) 1977-07-25 1977-07-25 Etching solution and minute working process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8955477A JPS5424236A (en) 1977-07-25 1977-07-25 Etching solution and minute working process

Publications (1)

Publication Number Publication Date
JPS5424236A true JPS5424236A (en) 1979-02-23

Family

ID=13974031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8955477A Pending JPS5424236A (en) 1977-07-25 1977-07-25 Etching solution and minute working process

Country Status (1)

Country Link
JP (1) JPS5424236A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0735548A1 (en) * 1995-03-31 1996-10-02 Vacuumschmelze Gmbh Treatment for magnets for optically detecting the easy direction of magnetisation
US6855639B1 (en) * 2003-08-01 2005-02-15 Intel Corporation Precise patterning of high-K films

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0735548A1 (en) * 1995-03-31 1996-10-02 Vacuumschmelze Gmbh Treatment for magnets for optically detecting the easy direction of magnetisation
US6855639B1 (en) * 2003-08-01 2005-02-15 Intel Corporation Precise patterning of high-K films

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