JPS57121234A - Plasma processing and device thereof - Google Patents

Plasma processing and device thereof

Info

Publication number
JPS57121234A
JPS57121234A JP768481A JP768481A JPS57121234A JP S57121234 A JPS57121234 A JP S57121234A JP 768481 A JP768481 A JP 768481A JP 768481 A JP768481 A JP 768481A JP S57121234 A JPS57121234 A JP S57121234A
Authority
JP
Japan
Prior art keywords
wafers
unified
gas
plasma processing
relation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP768481A
Other languages
English (en)
Inventor
Itaru Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP768481A priority Critical patent/JPS57121234A/ja
Publication of JPS57121234A publication Critical patent/JPS57121234A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Drying Of Semiconductors (AREA)
JP768481A 1981-01-20 1981-01-20 Plasma processing and device thereof Pending JPS57121234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP768481A JPS57121234A (en) 1981-01-20 1981-01-20 Plasma processing and device thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP768481A JPS57121234A (en) 1981-01-20 1981-01-20 Plasma processing and device thereof

Publications (1)

Publication Number Publication Date
JPS57121234A true JPS57121234A (en) 1982-07-28

Family

ID=11672609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP768481A Pending JPS57121234A (en) 1981-01-20 1981-01-20 Plasma processing and device thereof

Country Status (1)

Country Link
JP (1) JPS57121234A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261317A (ja) * 1985-09-11 1987-03-18 Toshiba Corp 気相成長装置
JPH02294029A (ja) * 1989-05-08 1990-12-05 Nec Kyushu Ltd ドライエッチング装置
JPH04137526U (ja) * 1991-05-31 1992-12-22 京セラ株式会社 光記録体の基板ホルダ

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143381A (ja) * 1974-10-11 1976-04-14 Hitachi Ltd Tategatakisokagakuseiseisochi
JPS5179574A (en) * 1975-01-08 1976-07-10 Hitachi Ltd cvd sochi

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143381A (ja) * 1974-10-11 1976-04-14 Hitachi Ltd Tategatakisokagakuseiseisochi
JPS5179574A (en) * 1975-01-08 1976-07-10 Hitachi Ltd cvd sochi

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261317A (ja) * 1985-09-11 1987-03-18 Toshiba Corp 気相成長装置
JPH02294029A (ja) * 1989-05-08 1990-12-05 Nec Kyushu Ltd ドライエッチング装置
JPH04137526U (ja) * 1991-05-31 1992-12-22 京セラ株式会社 光記録体の基板ホルダ

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