JPS57120672A - Plasma etching method - Google Patents

Plasma etching method

Info

Publication number
JPS57120672A
JPS57120672A JP528981A JP528981A JPS57120672A JP S57120672 A JPS57120672 A JP S57120672A JP 528981 A JP528981 A JP 528981A JP 528981 A JP528981 A JP 528981A JP S57120672 A JPS57120672 A JP S57120672A
Authority
JP
Japan
Prior art keywords
substrate
etched
plasma etching
etching method
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP528981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS619391B2 (nl
Inventor
Yoshihiro Todokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP528981A priority Critical patent/JPS57120672A/ja
Publication of JPS57120672A publication Critical patent/JPS57120672A/ja
Publication of JPS619391B2 publication Critical patent/JPS619391B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP528981A 1981-01-16 1981-01-16 Plasma etching method Granted JPS57120672A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP528981A JPS57120672A (en) 1981-01-16 1981-01-16 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP528981A JPS57120672A (en) 1981-01-16 1981-01-16 Plasma etching method

Publications (2)

Publication Number Publication Date
JPS57120672A true JPS57120672A (en) 1982-07-27
JPS619391B2 JPS619391B2 (nl) 1986-03-22

Family

ID=11607075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP528981A Granted JPS57120672A (en) 1981-01-16 1981-01-16 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS57120672A (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6247130A (ja) * 1985-08-27 1987-02-28 Kokusai Electric Co Ltd 反応性イオンエツチング装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6286294U (nl) * 1985-11-19 1987-06-02
JPH01123792U (nl) * 1988-02-12 1989-08-23
KR100373825B1 (ko) * 2000-02-29 2003-02-26 (주)일산금속 자전거의 완충장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6247130A (ja) * 1985-08-27 1987-02-28 Kokusai Electric Co Ltd 反応性イオンエツチング装置

Also Published As

Publication number Publication date
JPS619391B2 (nl) 1986-03-22

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