JPS6449231A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6449231A JPS6449231A JP20513487A JP20513487A JPS6449231A JP S6449231 A JPS6449231 A JP S6449231A JP 20513487 A JP20513487 A JP 20513487A JP 20513487 A JP20513487 A JP 20513487A JP S6449231 A JPS6449231 A JP S6449231A
- Authority
- JP
- Japan
- Prior art keywords
- films
- photoresist
- wafer
- plasma
- etching method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To remove photoresist films without giving damages to the surface of a wafer at all by a method wherein the top surfaces of the photoresist films are removed by a plasma etching method and then the photoresist films and buried films are removed by plasma enclosing etching. CONSTITUTION:A certain process is applied to photoresist films 2 formed on a wafer 1. During that process, modified layers 3 are formed in the surfaces of the photoresist film 2. Further, buried layers 4 made of photoresist are formed on the parts of the wafer which are not covered with the photoresist films 2. The top surfaces of the resist films 2, i.e. the modified layers 3, are removed by the application of a plasma etching method with oxygen. The resist films 2 and the buried layers 4 are removed by the application of a plasma enclosing etching method. With this constitution, the resist films 2 can be removed without giving damages to the surface of the wafer at all.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20513487A JPS6449231A (en) | 1987-08-20 | 1987-08-20 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20513487A JPS6449231A (en) | 1987-08-20 | 1987-08-20 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6449231A true JPS6449231A (en) | 1989-02-23 |
Family
ID=16501989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20513487A Pending JPS6449231A (en) | 1987-08-20 | 1987-08-20 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6449231A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009218574A (en) * | 2008-02-15 | 2009-09-24 | Tokyo Electron Ltd | Method of forming pattern, and method and device for manufacturing semiconductor device |
-
1987
- 1987-08-20 JP JP20513487A patent/JPS6449231A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009218574A (en) * | 2008-02-15 | 2009-09-24 | Tokyo Electron Ltd | Method of forming pattern, and method and device for manufacturing semiconductor device |
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