JPS57106140A - Semiconductor device and manufacture thereof - Google Patents
Semiconductor device and manufacture thereofInfo
- Publication number
- JPS57106140A JPS57106140A JP55182010A JP18201080A JPS57106140A JP S57106140 A JPS57106140 A JP S57106140A JP 55182010 A JP55182010 A JP 55182010A JP 18201080 A JP18201080 A JP 18201080A JP S57106140 A JPS57106140 A JP S57106140A
- Authority
- JP
- Japan
- Prior art keywords
- film
- wire
- layer
- covered
- corrosion resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 3
- 229910052782 aluminium Inorganic materials 0.000 abstract 3
- 230000007797 corrosion Effects 0.000 abstract 3
- 238000005260 corrosion Methods 0.000 abstract 3
- 238000002161 passivation Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000005368 silicate glass Substances 0.000 abstract 1
Classifications
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Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Wire Bonding (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP55182010A JPS57106140A (en) | 1980-12-24 | 1980-12-24 | Semiconductor device and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55182010A JPS57106140A (en) | 1980-12-24 | 1980-12-24 | Semiconductor device and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57106140A true JPS57106140A (en) | 1982-07-01 |
JPS6322464B2 JPS6322464B2 (enrdf_load_stackoverflow) | 1988-05-12 |
Family
ID=16110741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55182010A Granted JPS57106140A (en) | 1980-12-24 | 1980-12-24 | Semiconductor device and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57106140A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0555222A (ja) * | 1991-08-28 | 1993-03-05 | Nec Corp | 半導体装置 |
US5455195A (en) * | 1994-05-06 | 1995-10-03 | Texas Instruments Incorporated | Method for obtaining metallurgical stability in integrated circuit conductive bonds |
JP2002373910A (ja) * | 2000-09-12 | 2002-12-26 | Rohm Co Ltd | 半導体装置 |
JP2004128513A (ja) * | 2003-11-26 | 2004-04-22 | Rohm Co Ltd | 半導体装置およびその製造方法 |
US6794732B2 (en) | 2001-07-25 | 2004-09-21 | Rohn Co., Ltd. | Semiconductor device and method of manufacturing the same |
US7759803B2 (en) | 2001-07-25 | 2010-07-20 | Rohm Co., Ltd. | Semiconductor device and method of manufacturing the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4847273A (enrdf_load_stackoverflow) * | 1971-10-15 | 1973-07-05 | ||
JPS528785A (en) * | 1975-07-10 | 1977-01-22 | Citizen Watch Co Ltd | Semiconductor device electrode structure |
-
1980
- 1980-12-24 JP JP55182010A patent/JPS57106140A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4847273A (enrdf_load_stackoverflow) * | 1971-10-15 | 1973-07-05 | ||
JPS528785A (en) * | 1975-07-10 | 1977-01-22 | Citizen Watch Co Ltd | Semiconductor device electrode structure |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0555222A (ja) * | 1991-08-28 | 1993-03-05 | Nec Corp | 半導体装置 |
US5455195A (en) * | 1994-05-06 | 1995-10-03 | Texas Instruments Incorporated | Method for obtaining metallurgical stability in integrated circuit conductive bonds |
JP2002373910A (ja) * | 2000-09-12 | 2002-12-26 | Rohm Co Ltd | 半導体装置 |
US6794732B2 (en) | 2001-07-25 | 2004-09-21 | Rohn Co., Ltd. | Semiconductor device and method of manufacturing the same |
US7244635B2 (en) | 2001-07-25 | 2007-07-17 | Rohm Co., Ltd. | Semiconductor device and method of manufacturing the same |
US7759803B2 (en) | 2001-07-25 | 2010-07-20 | Rohm Co., Ltd. | Semiconductor device and method of manufacturing the same |
US8049343B2 (en) | 2001-07-25 | 2011-11-01 | Rohm Co., Ltd. | Semiconductor device and method of manufacturing the same |
JP2004128513A (ja) * | 2003-11-26 | 2004-04-22 | Rohm Co Ltd | 半導体装置およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6322464B2 (enrdf_load_stackoverflow) | 1988-05-12 |
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