JPS57104141A - Photomask and photomask substrate - Google Patents

Photomask and photomask substrate

Info

Publication number
JPS57104141A
JPS57104141A JP18040980A JP18040980A JPS57104141A JP S57104141 A JPS57104141 A JP S57104141A JP 18040980 A JP18040980 A JP 18040980A JP 18040980 A JP18040980 A JP 18040980A JP S57104141 A JPS57104141 A JP S57104141A
Authority
JP
Japan
Prior art keywords
photomask
substrate
forming
layer
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18040980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6146821B2 (esLanguage
Inventor
Akira Kaneki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP18040980A priority Critical patent/JPS57104141A/ja
Priority to EP81109440A priority patent/EP0054736B1/en
Priority to DE8181109440T priority patent/DE3170637D1/de
Priority to US06/317,343 priority patent/US4363846A/en
Publication of JPS57104141A publication Critical patent/JPS57104141A/ja
Publication of JPS6146821B2 publication Critical patent/JPS6146821B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential
    • Y10T428/24868—Translucent outer layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/261—In terms of molecular thickness or light wave length

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP18040980A 1980-12-22 1980-12-22 Photomask and photomask substrate Granted JPS57104141A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP18040980A JPS57104141A (en) 1980-12-22 1980-12-22 Photomask and photomask substrate
EP81109440A EP0054736B1 (en) 1980-12-22 1981-10-30 Photomask and photomask blank
DE8181109440T DE3170637D1 (en) 1980-12-22 1981-10-30 Photomask and photomask blank
US06/317,343 US4363846A (en) 1980-12-22 1981-11-02 Photomask and photomask blank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18040980A JPS57104141A (en) 1980-12-22 1980-12-22 Photomask and photomask substrate

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP62201762A Division JPS6352141A (ja) 1987-08-14 1987-08-14 フオトマスク
JP62201763A Division JPS6352142A (ja) 1987-08-14 1987-08-14 フオトマスク

Publications (2)

Publication Number Publication Date
JPS57104141A true JPS57104141A (en) 1982-06-29
JPS6146821B2 JPS6146821B2 (esLanguage) 1986-10-16

Family

ID=16082737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18040980A Granted JPS57104141A (en) 1980-12-22 1980-12-22 Photomask and photomask substrate

Country Status (2)

Country Link
US (1) US4363846A (esLanguage)
JP (1) JPS57104141A (esLanguage)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材
JPS6033557A (ja) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd 電子線露光用マスク素材の製造方法
JPS6091356A (ja) * 1983-10-25 1985-05-22 Hoya Corp クロムマスクブランクとその製造方法
JPS6093438A (ja) * 1983-10-27 1985-05-25 Konishiroku Photo Ind Co Ltd フオトマスク
JPS6095434A (ja) * 1983-10-28 1985-05-28 Konishiroku Photo Ind Co Ltd フオトマスク材料の表面強化方法
JPS60154254A (ja) * 1984-01-24 1985-08-13 Hoya Corp フオトマスクブランクとフオトマスク
JPS60182439A (ja) * 1984-02-29 1985-09-18 Konishiroku Photo Ind Co Ltd クロムマスク素材
JPS61176934A (ja) * 1985-01-31 1986-08-08 Toppan Printing Co Ltd フオトマスクブランクの製造方法
JPS61232457A (ja) * 1985-04-09 1986-10-16 Asahi Glass Co Ltd 改良されたフオトマスクブランク及びフオトマスク
JPS61235819A (ja) * 1985-04-12 1986-10-21 Hitachi Ltd 液晶表示素子とその製造方法
JPS61240243A (ja) * 1985-04-18 1986-10-25 Asahi Glass Co Ltd フオトマスクブランクおよびフオトマスク
JPH0349530U (esLanguage) * 1989-09-22 1991-05-15
JPH04293423A (ja) * 1991-03-25 1992-10-19 Kubota Corp 脱穀選別制御装置
JPH05297570A (ja) * 1992-04-20 1993-11-12 Toppan Printing Co Ltd フォトマスクブランクの製造方法
US7264908B2 (en) 2003-05-16 2007-09-04 Shin-Etsu Chemical Co., Ltd. Photo mask blank and photo mask
JP2008517862A (ja) * 2004-10-21 2008-05-29 コーニング インコーポレイテッド 開口部を有する不透明クロム被膜を備えた光学素子およびその作成方法
JP2010056025A (ja) * 2008-08-29 2010-03-11 Casio Comput Co Ltd 発光パネル及び発光パネルの製造方法

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4657648A (en) * 1981-03-17 1987-04-14 Osamu Nagarekawa Method of manufacturing a mask blank including a modified chromium compound
JPS57151945A (en) * 1981-03-17 1982-09-20 Hoya Corp Photomask blank and its manufacture
DE3314602A1 (de) * 1983-04-22 1984-10-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zur fotolithografischen herstellung von strukturen
FR2570392B1 (fr) * 1984-09-19 1987-01-02 Dme Procede de depot sur substrats optiques de couches antireflechissantes susceptibles d'etre gravees
DE3600169A1 (de) * 1985-01-07 1986-07-10 Canon K.K., Tokio/Tokyo Maskenstruktur zur lithographie, verfahren zu ihrer herstellung und lithographisches verfahren
JPS61272746A (ja) * 1985-05-28 1986-12-03 Asahi Glass Co Ltd フオトマスクブランクおよびフオトマスク
JPH0421133U (esLanguage) * 1990-06-12 1992-02-21
US5089361A (en) * 1990-08-17 1992-02-18 Industrial Technology Research Institute Mask making process
US5230971A (en) * 1991-08-08 1993-07-27 E. I. Du Pont De Nemours And Company Photomask blank and process for making a photomask blank using gradual compositional transition between strata
US5254202A (en) * 1992-04-07 1993-10-19 International Business Machines Corporation Fabrication of laser ablation masks by wet etching
US5419988A (en) * 1992-08-07 1995-05-30 Dai Nippon Printing Co., Ltd. Photomask blank and phase shift photomask
KR970006927B1 (ko) * 1992-11-10 1997-04-30 다이 니뽄 인사쯔 가부시키가이샤 위상시프트 포토마스크 및 그 제조방법
CA2110124C (en) * 1992-11-30 2000-04-25 Nobuo Totsuka Surface-treated metal sheet which excels in workability, electrical conductivity and corrosion resistance, and method of producing the same
US5808714A (en) * 1993-09-30 1998-09-15 Optical Coating Laboratory, Inc. Low reflection shadow mask
US5566011A (en) * 1994-12-08 1996-10-15 Luncent Technologies Inc. Antiflector black matrix having successively a chromium oxide layer, a molybdenum layer and a second chromium oxide layer
EP1022614B1 (en) * 1998-07-31 2012-11-14 Hoya Corporation Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern
TW480367B (en) 2000-02-16 2002-03-21 Shinetsu Chemical Co Photomask blank, photomask and method of manufacture
JP2001305713A (ja) 2000-04-25 2001-11-02 Shin Etsu Chem Co Ltd フォトマスク用ブランクス及びフォトマスク
JP4088742B2 (ja) 2000-12-26 2008-05-21 信越化学工業株式会社 フォトマスクブランクス、フォトマスク及びフォトマスクブランクスの製造方法
JP2002244274A (ja) 2001-02-13 2002-08-30 Shin Etsu Chem Co Ltd フォトマスクブランク、フォトマスク及びこれらの製造方法
US20060083997A1 (en) * 2003-10-15 2006-04-20 Taiwan Semiconductor Manufacturing Company, Ltd. Photomask with wavelength reduction material and pellicle
US20050100798A1 (en) 2003-10-15 2005-05-12 Taiwan Semiconductor Manufacturing Company, Ltd. Device and method for providing wavelength reduction with a photomask
US20060057472A1 (en) * 2004-09-15 2006-03-16 Fu Tsai Robert C Method for making chrome photo mask
US7459095B2 (en) * 2004-10-21 2008-12-02 Corning Incorporated Opaque chrome coating suitable for etching
US8168367B2 (en) * 2008-07-11 2012-05-01 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process
DE102009046878A1 (de) * 2009-07-31 2011-02-03 Advanced Mask Technology Center Gmbh & Co. Kg Verringerung der lonenwanderung von Absorbermaterialien von Lithographiemasken durch Chrompassivierung
TWI755337B (zh) * 2017-07-14 2022-02-11 日商Ｈｏｙａ股份有限公司 光罩基底、光罩之製造方法、以及顯示裝置製造方法
EP3712296A4 (en) * 2017-11-14 2021-08-11 Dai Nippon Printing Co., Ltd. METAL PLATE FOR PRODUCING MASKS FOR STEAM DEPOSIT, PROCESS FOR PRODUCING METAL PLATES, MASK FOR STEAM DEPOSIT, PROCESS FOR PRODUCING MASK FOR STEAM DEPOSIT, AND MASK DEVICE FOR STEAM DEPOSIT VAPOR PHASE DEPOSIT MASK
JP2022160364A (ja) * 2021-04-06 2022-10-19 信越化学工業株式会社 フォトマスクブランク、フォトマスクの製造方法及びフォトマスク

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5235512A (en) * 1975-07-30 1977-03-18 Rca Corp Raster centering circuit
JPS5235513A (en) * 1975-09-13 1977-03-18 Matsushita Electric Ind Co Ltd Circuit for shaping signal waveform
JPS5322426A (en) * 1972-11-30 1978-03-01 Canon Inc Electrophotographic photo-sensitive body
JPS5421274A (en) * 1977-07-19 1979-02-17 Mitsubishi Electric Corp Chromium plate
JPS54153790A (en) * 1978-05-25 1979-12-04 Fujitsu Ltd Chromium oxide layer formation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1530978A (en) * 1976-05-10 1978-11-01 Rca Corp Method for removing material from a substrate
US4096026A (en) * 1976-07-27 1978-06-20 Toppan Printing Co., Ltd. Method of manufacturing a chromium oxide film
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask
JPS53114356A (en) * 1977-03-16 1978-10-05 Toshiba Corp Exposing mask and its formation
US4178403A (en) * 1977-08-04 1979-12-11 Konishiroku Photo Industry Co., Ltd. Mask blank and mask

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5322426A (en) * 1972-11-30 1978-03-01 Canon Inc Electrophotographic photo-sensitive body
JPS5235512A (en) * 1975-07-30 1977-03-18 Rca Corp Raster centering circuit
JPS5235513A (en) * 1975-09-13 1977-03-18 Matsushita Electric Ind Co Ltd Circuit for shaping signal waveform
JPS5421274A (en) * 1977-07-19 1979-02-17 Mitsubishi Electric Corp Chromium plate
JPS54153790A (en) * 1978-05-25 1979-12-04 Fujitsu Ltd Chromium oxide layer formation

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材
JPS6033557A (ja) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd 電子線露光用マスク素材の製造方法
JPS6091356A (ja) * 1983-10-25 1985-05-22 Hoya Corp クロムマスクブランクとその製造方法
JPS6093438A (ja) * 1983-10-27 1985-05-25 Konishiroku Photo Ind Co Ltd フオトマスク
JPS6095434A (ja) * 1983-10-28 1985-05-28 Konishiroku Photo Ind Co Ltd フオトマスク材料の表面強化方法
JPS60154254A (ja) * 1984-01-24 1985-08-13 Hoya Corp フオトマスクブランクとフオトマスク
JPS60182439A (ja) * 1984-02-29 1985-09-18 Konishiroku Photo Ind Co Ltd クロムマスク素材
JPS61176934A (ja) * 1985-01-31 1986-08-08 Toppan Printing Co Ltd フオトマスクブランクの製造方法
JPS61232457A (ja) * 1985-04-09 1986-10-16 Asahi Glass Co Ltd 改良されたフオトマスクブランク及びフオトマスク
JPS61235819A (ja) * 1985-04-12 1986-10-21 Hitachi Ltd 液晶表示素子とその製造方法
JPS61240243A (ja) * 1985-04-18 1986-10-25 Asahi Glass Co Ltd フオトマスクブランクおよびフオトマスク
JPH0349530U (esLanguage) * 1989-09-22 1991-05-15
JPH04293423A (ja) * 1991-03-25 1992-10-19 Kubota Corp 脱穀選別制御装置
JPH05297570A (ja) * 1992-04-20 1993-11-12 Toppan Printing Co Ltd フォトマスクブランクの製造方法
US7264908B2 (en) 2003-05-16 2007-09-04 Shin-Etsu Chemical Co., Ltd. Photo mask blank and photo mask
JP2008517862A (ja) * 2004-10-21 2008-05-29 コーニング インコーポレイテッド 開口部を有する不透明クロム被膜を備えた光学素子およびその作成方法
JP2010056025A (ja) * 2008-08-29 2010-03-11 Casio Comput Co Ltd 発光パネル及び発光パネルの製造方法

Also Published As

Publication number Publication date
US4363846A (en) 1982-12-14
JPS6146821B2 (esLanguage) 1986-10-16

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