JPS5421274A - Chromium plate - Google Patents
Chromium plateInfo
- Publication number
- JPS5421274A JPS5421274A JP8683977A JP8683977A JPS5421274A JP S5421274 A JPS5421274 A JP S5421274A JP 8683977 A JP8683977 A JP 8683977A JP 8683977 A JP8683977 A JP 8683977A JP S5421274 A JPS5421274 A JP S5421274A
- Authority
- JP
- Japan
- Prior art keywords
- chromium plate
- chromium
- substrate
- increasing
- group element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To make good dimension accuracy, by increasing the etching speed in gas plasma etching, by adding fine amount of V group element such as N, P, As, Sb, Bi to the chromium or chromium oxide coated on a substrate.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8683977A JPS5421274A (en) | 1977-07-19 | 1977-07-19 | Chromium plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8683977A JPS5421274A (en) | 1977-07-19 | 1977-07-19 | Chromium plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5421274A true JPS5421274A (en) | 1979-02-17 |
Family
ID=13897971
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8683977A Pending JPS5421274A (en) | 1977-07-19 | 1977-07-19 | Chromium plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5421274A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
JPS5977337A (en) * | 1982-10-25 | 1984-05-02 | Nippon Steel Chem Co Ltd | Friction testing device |
WO2006006540A1 (en) * | 2004-07-09 | 2006-01-19 | Hoya Corporation | Photomask blank, photomask manufacturing method and semiconductor device manufacturing method |
-
1977
- 1977-07-19 JP JP8683977A patent/JPS5421274A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
JPS6146821B2 (en) * | 1980-12-22 | 1986-10-16 | Dainippon Printing Co Ltd | |
JPS5977337A (en) * | 1982-10-25 | 1984-05-02 | Nippon Steel Chem Co Ltd | Friction testing device |
JPS6334419B2 (en) * | 1982-10-25 | 1988-07-11 | Shinnitsutetsu Kagaku Kk | |
WO2006006540A1 (en) * | 2004-07-09 | 2006-01-19 | Hoya Corporation | Photomask blank, photomask manufacturing method and semiconductor device manufacturing method |
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