JPS5387720A - Positive type radiation sensitive material - Google Patents

Positive type radiation sensitive material

Info

Publication number
JPS5387720A
JPS5387720A JP258777A JP258777A JPS5387720A JP S5387720 A JPS5387720 A JP S5387720A JP 258777 A JP258777 A JP 258777A JP 258777 A JP258777 A JP 258777A JP S5387720 A JPS5387720 A JP S5387720A
Authority
JP
Japan
Prior art keywords
sensitive material
radiation sensitive
positive type
type radiation
hcho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP258777A
Other languages
Japanese (ja)
Inventor
Masataka Miyamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP258777A priority Critical patent/JPS5387720A/en
Publication of JPS5387720A publication Critical patent/JPS5387720A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To improve adhesion to a substrate, to enhance radiation sensitivity, and to enable a fine and high precision pattern or the like to easily be formed, by using a dehydration polycondensation product from HCHO and a specified compound having active hydrogen.
COPYRIGHT: (C)1978,JPO&Japio
JP258777A 1977-01-13 1977-01-13 Positive type radiation sensitive material Pending JPS5387720A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP258777A JPS5387720A (en) 1977-01-13 1977-01-13 Positive type radiation sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP258777A JPS5387720A (en) 1977-01-13 1977-01-13 Positive type radiation sensitive material

Publications (1)

Publication Number Publication Date
JPS5387720A true JPS5387720A (en) 1978-08-02

Family

ID=11533498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP258777A Pending JPS5387720A (en) 1977-01-13 1977-01-13 Positive type radiation sensitive material

Country Status (1)

Country Link
JP (1) JPS5387720A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219547A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Positive type radiation-sensitive organic high polymer material
JPS58219736A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Manufacture of relief structure
JPS6010250A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Formation of pattern

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219547A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Positive type radiation-sensitive organic high polymer material
JPS58219736A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Manufacture of relief structure
JPH0380300B2 (en) * 1982-06-16 1991-12-24 Hitachi Ltd
JPS6010250A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Formation of pattern

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