JPS5387720A - Positive type radiation sensitive material - Google Patents
Positive type radiation sensitive materialInfo
- Publication number
- JPS5387720A JPS5387720A JP258777A JP258777A JPS5387720A JP S5387720 A JPS5387720 A JP S5387720A JP 258777 A JP258777 A JP 258777A JP 258777 A JP258777 A JP 258777A JP S5387720 A JPS5387720 A JP S5387720A
- Authority
- JP
- Japan
- Prior art keywords
- sensitive material
- radiation sensitive
- positive type
- type radiation
- hcho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To improve adhesion to a substrate, to enhance radiation sensitivity, and to enable a fine and high precision pattern or the like to easily be formed, by using a dehydration polycondensation product from HCHO and a specified compound having active hydrogen.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP258777A JPS5387720A (en) | 1977-01-13 | 1977-01-13 | Positive type radiation sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP258777A JPS5387720A (en) | 1977-01-13 | 1977-01-13 | Positive type radiation sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5387720A true JPS5387720A (en) | 1978-08-02 |
Family
ID=11533498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP258777A Pending JPS5387720A (en) | 1977-01-13 | 1977-01-13 | Positive type radiation sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5387720A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58219547A (en) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | Positive type radiation-sensitive organic high polymer material |
JPS58219736A (en) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | Manufacture of relief structure |
JPS6010250A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Formation of pattern |
-
1977
- 1977-01-13 JP JP258777A patent/JPS5387720A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58219547A (en) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | Positive type radiation-sensitive organic high polymer material |
JPS58219736A (en) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | Manufacture of relief structure |
JPH0380300B2 (en) * | 1982-06-16 | 1991-12-24 | Hitachi Ltd | |
JPS6010250A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Formation of pattern |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5387720A (en) | Positive type radiation sensitive material | |
JPS51135383A (en) | Semiconductor variable capacitance device | |
JPS5381114A (en) | Radiation sensitive material | |
JPS53145564A (en) | Production of semiconductor device | |
JPS5430787A (en) | Infrared-ray detector | |
JPS52146217A (en) | Positive type radiation sensitive material | |
JPS53120528A (en) | Positive type radiation sensitive material | |
JPS52132678A (en) | High-sensitive positive type electron beam formation | |
JPS5220859A (en) | Direction signal generator | |
JPS5327023A (en) | Positive type radiation sensitive composition | |
JPS5391684A (en) | Semiconductor laser | |
JPS5346222A (en) | Solid state pick up unit | |
JPS5251880A (en) | Moisture sensitive element | |
JPS5381113A (en) | Radiation sensitive material | |
JPS5431597A (en) | Manufacturing method of humidity senser | |
JPS52117072A (en) | Hard mask | |
JPS53139476A (en) | Manufacture of semiconductor device | |
JPS5360638A (en) | Photosensitive material for pattern formation for accelerated particle beamexposure and pattern formation | |
JPS533168A (en) | Semiconductor evaporating apparatus | |
JPS52130292A (en) | Patterning method | |
JPS52141565A (en) | Manufacture of semiconductor unit | |
JPS524185A (en) | Magnetic resistor element | |
JPS5418670A (en) | Manufacture of semiconductor device | |
JPS5349946A (en) | Formation of swelled electrode | |
JPS52146224A (en) | Positive type radiation sensitive material |