JPS5679430A - Manufacture of semiconductor integrated circuit device - Google Patents
Manufacture of semiconductor integrated circuit deviceInfo
- Publication number
- JPS5679430A JPS5679430A JP15661979A JP15661979A JPS5679430A JP S5679430 A JPS5679430 A JP S5679430A JP 15661979 A JP15661979 A JP 15661979A JP 15661979 A JP15661979 A JP 15661979A JP S5679430 A JPS5679430 A JP S5679430A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- substrate
- photo
- transfer
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P95/00—
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15661979A JPS5679430A (en) | 1979-12-03 | 1979-12-03 | Manufacture of semiconductor integrated circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15661979A JPS5679430A (en) | 1979-12-03 | 1979-12-03 | Manufacture of semiconductor integrated circuit device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5679430A true JPS5679430A (en) | 1981-06-30 |
| JPS641928B2 JPS641928B2 (enExample) | 1989-01-13 |
Family
ID=15631670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15661979A Granted JPS5679430A (en) | 1979-12-03 | 1979-12-03 | Manufacture of semiconductor integrated circuit device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5679430A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113334754A (zh) * | 2021-07-01 | 2021-09-03 | 唐汉聪 | 一种油墨印刷纸表面覆膜工艺 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH077927U (ja) * | 1993-07-20 | 1995-02-03 | 大英産業株式会社 | 日除けシート |
| JPH0719701U (ja) * | 1993-09-13 | 1995-04-07 | 東京メガネ製造株式会社 | 曇止めシール |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS505105A (enExample) * | 1973-05-15 | 1975-01-20 | ||
| JPS5322370A (en) * | 1976-08-13 | 1978-03-01 | Fujitsu Ltd | Inspecting method of semiconductor device |
| JPS5431282A (en) * | 1977-08-12 | 1979-03-08 | Mitsubishi Electric Corp | Pattern formation method |
-
1979
- 1979-12-03 JP JP15661979A patent/JPS5679430A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS505105A (enExample) * | 1973-05-15 | 1975-01-20 | ||
| JPS5322370A (en) * | 1976-08-13 | 1978-03-01 | Fujitsu Ltd | Inspecting method of semiconductor device |
| JPS5431282A (en) * | 1977-08-12 | 1979-03-08 | Mitsubishi Electric Corp | Pattern formation method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113334754A (zh) * | 2021-07-01 | 2021-09-03 | 唐汉聪 | 一种油墨印刷纸表面覆膜工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS641928B2 (enExample) | 1989-01-13 |
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