GB1334377A - Method of photographic transfer - Google Patents

Method of photographic transfer

Info

Publication number
GB1334377A
GB1334377A GB1334377DA GB1334377A GB 1334377 A GB1334377 A GB 1334377A GB 1334377D A GB1334377D A GB 1334377DA GB 1334377 A GB1334377 A GB 1334377A
Authority
GB
United Kingdom
Prior art keywords
original pattern
individual structures
developable image
array
photographic transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Licentia Patent Verwaltungs GmbH
Original Assignee
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Licentia Patent Verwaltungs GmbH filed Critical Licentia Patent Verwaltungs GmbH
Publication of GB1334377A publication Critical patent/GB1334377A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

1334377 Photographic process LICENTIA PATENT-VERWALTUNGS GmbH 26 Nov 1970 [2 Dec 1969] 56260/70 Heading G2C A developable image is formed in a photosensitive layer on a substrate using an original pattern comprising a plurality of like individual structures arranged in a regular array on a member or on each of a plurality of members, by exposing the layer successively at least 3 times, each successive exposure being to different individual structures of the array for an insufficient time to produce a developable image. The process is used in semiconductor and printed circuit manufacture to obviate faults in the original pattern.
GB1334377D 1969-12-02 1970-11-26 Method of photographic transfer Expired GB1334377A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691960463 DE1960463A1 (en) 1969-12-02 1969-12-02 Method for error-free photographic transmission

Publications (1)

Publication Number Publication Date
GB1334377A true GB1334377A (en) 1973-10-17

Family

ID=5752748

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1334377D Expired GB1334377A (en) 1969-12-02 1970-11-26 Method of photographic transfer

Country Status (4)

Country Link
JP (1) JPS5517505B1 (en)
DE (1) DE1960463A1 (en)
FR (1) FR2073447B1 (en)
GB (1) GB1334377A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0075756A1 (en) * 1981-09-24 1983-04-06 International Business Machines Corporation Method of developing relief images in a photoresist layer
EP1566697A2 (en) * 2004-02-18 2005-08-24 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0075756A1 (en) * 1981-09-24 1983-04-06 International Business Machines Corporation Method of developing relief images in a photoresist layer
EP1566697A2 (en) * 2004-02-18 2005-08-24 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1566697A3 (en) * 2004-02-18 2005-10-26 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7190434B2 (en) 2004-02-18 2007-03-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7428040B2 (en) 2004-02-18 2008-09-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
FR2073447B1 (en) 1973-02-02
JPS5517505B1 (en) 1980-05-12
DE1960463A1 (en) 1971-06-09
FR2073447A1 (en) 1971-10-01

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees