JPS5676536A - Anodization of silicon nitride film - Google Patents
Anodization of silicon nitride filmInfo
- Publication number
- JPS5676536A JPS5676536A JP15324079A JP15324079A JPS5676536A JP S5676536 A JPS5676536 A JP S5676536A JP 15324079 A JP15324079 A JP 15324079A JP 15324079 A JP15324079 A JP 15324079A JP S5676536 A JPS5676536 A JP S5676536A
- Authority
- JP
- Japan
- Prior art keywords
- silicon nitride
- nitride film
- film
- anodization
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15324079A JPS5676536A (en) | 1979-11-27 | 1979-11-27 | Anodization of silicon nitride film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15324079A JPS5676536A (en) | 1979-11-27 | 1979-11-27 | Anodization of silicon nitride film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5676536A true JPS5676536A (en) | 1981-06-24 |
JPH0114701B2 JPH0114701B2 (ja) | 1989-03-14 |
Family
ID=15558112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15324079A Granted JPS5676536A (en) | 1979-11-27 | 1979-11-27 | Anodization of silicon nitride film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5676536A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58169976A (ja) * | 1982-03-30 | 1983-10-06 | Fujitsu Ltd | 半導体装置の製造方法 |
US4450041A (en) * | 1982-06-21 | 1984-05-22 | The United States Of America As Represented By The Secretary Of The Navy | Chemical etching of transformed structures |
US4863556A (en) * | 1985-09-30 | 1989-09-05 | Siemens Aktiengesellschaft | Method for transferring superfine photoresist structures |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50141276A (ja) * | 1974-04-30 | 1975-11-13 | ||
JPS5488092A (en) * | 1977-12-26 | 1979-07-12 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating semiconductor |
-
1979
- 1979-11-27 JP JP15324079A patent/JPS5676536A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50141276A (ja) * | 1974-04-30 | 1975-11-13 | ||
JPS5488092A (en) * | 1977-12-26 | 1979-07-12 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating semiconductor |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58169976A (ja) * | 1982-03-30 | 1983-10-06 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH0578193B2 (ja) * | 1982-03-30 | 1993-10-28 | Fujitsu Ltd | |
US4450041A (en) * | 1982-06-21 | 1984-05-22 | The United States Of America As Represented By The Secretary Of The Navy | Chemical etching of transformed structures |
US4863556A (en) * | 1985-09-30 | 1989-09-05 | Siemens Aktiengesellschaft | Method for transferring superfine photoresist structures |
Also Published As
Publication number | Publication date |
---|---|
JPH0114701B2 (ja) | 1989-03-14 |
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