JPS5646227A - Mask substrate for electronic device - Google Patents

Mask substrate for electronic device

Info

Publication number
JPS5646227A
JPS5646227A JP12167279A JP12167279A JPS5646227A JP S5646227 A JPS5646227 A JP S5646227A JP 12167279 A JP12167279 A JP 12167279A JP 12167279 A JP12167279 A JP 12167279A JP S5646227 A JPS5646227 A JP S5646227A
Authority
JP
Japan
Prior art keywords
mask substrate
electronic device
mirror
polishing
peripheral part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12167279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6134669B2 (enrdf_load_stackoverflow
Inventor
Mitsuo Honda
Masato Sekikawa
Kengo Urakabe
Haruo Okamoto
Itsuo Kuroyanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP12167279A priority Critical patent/JPS5646227A/ja
Publication of JPS5646227A publication Critical patent/JPS5646227A/ja
Publication of JPS6134669B2 publication Critical patent/JPS6134669B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP12167279A 1979-09-21 1979-09-21 Mask substrate for electronic device Granted JPS5646227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12167279A JPS5646227A (en) 1979-09-21 1979-09-21 Mask substrate for electronic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12167279A JPS5646227A (en) 1979-09-21 1979-09-21 Mask substrate for electronic device

Publications (2)

Publication Number Publication Date
JPS5646227A true JPS5646227A (en) 1981-04-27
JPS6134669B2 JPS6134669B2 (enrdf_load_stackoverflow) 1986-08-08

Family

ID=14817030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12167279A Granted JPS5646227A (en) 1979-09-21 1979-09-21 Mask substrate for electronic device

Country Status (1)

Country Link
JP (1) JPS5646227A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6486341A (en) * 1987-09-29 1989-03-31 Sharp Kk Optical disk
JP2003114501A (ja) * 2001-10-04 2003-04-18 Konica Corp ハロゲン化銀写真乾板及びその製造方法
US7323276B2 (en) 2003-03-26 2008-01-29 Hoya Corporation Substrate for photomask, photomask blank and photomask
JP2008257132A (ja) * 2007-04-09 2008-10-23 Hoya Corp フォトマスクブランク用基板及びその製造方法、フォトマスクブランク、並びにフォトマスク
CN100514162C (zh) 2003-07-18 2009-07-15 信越化学工业株式会社 大尺寸基板
JP2010107613A (ja) * 2008-10-29 2010-05-13 Tosoh Corp フォトマスク用基板およびその製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4784969B2 (ja) * 2004-03-30 2011-10-05 Ｈｏｙａ株式会社 マスクブランク用のガラス基板の製造方法、マスクブランクの製造方法、反射型マスクブランクの製造方法、露光用マスクの製造方法、及び反射型マスクの製造方法
JP2005333124A (ja) * 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
JP5818861B2 (ja) * 2013-11-07 2015-11-18 Hoya株式会社 マスクブランク及びその製造方法、並びにマスク

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50153871A (enrdf_load_stackoverflow) * 1974-05-30 1975-12-11
JPS5311717A (en) * 1976-07-12 1978-02-02 Kubota Ltd Cultivating machine
JPS5425A (en) * 1977-06-03 1979-01-05 Hitachi Ltd Method of chamfering glass substrate
JPS55146928A (en) * 1979-05-02 1980-11-15 Ulvac Corp Manufacturing of photomask substrate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50153871A (enrdf_load_stackoverflow) * 1974-05-30 1975-12-11
JPS5311717A (en) * 1976-07-12 1978-02-02 Kubota Ltd Cultivating machine
JPS5425A (en) * 1977-06-03 1979-01-05 Hitachi Ltd Method of chamfering glass substrate
JPS55146928A (en) * 1979-05-02 1980-11-15 Ulvac Corp Manufacturing of photomask substrate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6486341A (en) * 1987-09-29 1989-03-31 Sharp Kk Optical disk
JP2003114501A (ja) * 2001-10-04 2003-04-18 Konica Corp ハロゲン化銀写真乾板及びその製造方法
US7323276B2 (en) 2003-03-26 2008-01-29 Hoya Corporation Substrate for photomask, photomask blank and photomask
CN100514162C (zh) 2003-07-18 2009-07-15 信越化学工业株式会社 大尺寸基板
US8012563B2 (en) 2003-07-18 2011-09-06 Shin-Etsu Chemical Co., Ltd. Large-size substrate
JP2008257132A (ja) * 2007-04-09 2008-10-23 Hoya Corp フォトマスクブランク用基板及びその製造方法、フォトマスクブランク、並びにフォトマスク
JP2010107613A (ja) * 2008-10-29 2010-05-13 Tosoh Corp フォトマスク用基板およびその製造方法

Also Published As

Publication number Publication date
JPS6134669B2 (enrdf_load_stackoverflow) 1986-08-08

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