JPS5646227A - Mask substrate for electronic device - Google Patents
Mask substrate for electronic deviceInfo
- Publication number
- JPS5646227A JPS5646227A JP12167279A JP12167279A JPS5646227A JP S5646227 A JPS5646227 A JP S5646227A JP 12167279 A JP12167279 A JP 12167279A JP 12167279 A JP12167279 A JP 12167279A JP S5646227 A JPS5646227 A JP S5646227A
- Authority
- JP
- Japan
- Prior art keywords
- mask substrate
- electronic device
- mirror
- polishing
- peripheral part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
Abstract
PURPOSE:To effectively inhibit the occurrence of pinholes in sputtering by mirror- polishing a peripheral part of a mask substrate for an electronic device. CONSTITUTION:Peripheral part 1a of mask substrate 1 is mirror-polished. Part 1a is preferably chamfered prior to the mirror polishing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12167279A JPS5646227A (en) | 1979-09-21 | 1979-09-21 | Mask substrate for electronic device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12167279A JPS5646227A (en) | 1979-09-21 | 1979-09-21 | Mask substrate for electronic device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5646227A true JPS5646227A (en) | 1981-04-27 |
JPS6134669B2 JPS6134669B2 (en) | 1986-08-08 |
Family
ID=14817030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12167279A Granted JPS5646227A (en) | 1979-09-21 | 1979-09-21 | Mask substrate for electronic device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5646227A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6486341A (en) * | 1987-09-29 | 1989-03-31 | Sharp Kk | Optical disk |
JP2003114501A (en) * | 2001-10-04 | 2003-04-18 | Konica Corp | Silver halide photographic plate and method for producing the same |
US7323276B2 (en) | 2003-03-26 | 2008-01-29 | Hoya Corporation | Substrate for photomask, photomask blank and photomask |
JP2008257132A (en) * | 2007-04-09 | 2008-10-23 | Hoya Corp | Substrate for photomask blank and method for manufacturing the substrate, photomask blank, and photomask |
JP2010107613A (en) * | 2008-10-29 | 2010-05-13 | Tosoh Corp | Substrate for photomask and method for manufacturing the substrate |
US8012563B2 (en) | 2003-07-18 | 2011-09-06 | Shin-Etsu Chemical Co., Ltd. | Large-size substrate |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4784969B2 (en) * | 2004-03-30 | 2011-10-05 | Hoya株式会社 | Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, method for manufacturing reflective mask blank, method for manufacturing exposure mask, and method for manufacturing reflective mask |
JP2005333124A (en) * | 2004-04-22 | 2005-12-02 | Asahi Glass Co Ltd | Low expansion glass substrate for reflection type mask and reflection type mask |
JP5818861B2 (en) * | 2013-11-07 | 2015-11-18 | Hoya株式会社 | Mask blank, method of manufacturing the same, and mask |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50153871A (en) * | 1974-05-30 | 1975-12-11 | ||
JPS5311717A (en) * | 1976-07-12 | 1978-02-02 | Kubota Ltd | Cultivating machine |
JPS5425A (en) * | 1977-06-03 | 1979-01-05 | Hitachi Ltd | Method of chamfering glass substrate |
JPS55146928A (en) * | 1979-05-02 | 1980-11-15 | Ulvac Corp | Manufacturing of photomask substrate |
-
1979
- 1979-09-21 JP JP12167279A patent/JPS5646227A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50153871A (en) * | 1974-05-30 | 1975-12-11 | ||
JPS5311717A (en) * | 1976-07-12 | 1978-02-02 | Kubota Ltd | Cultivating machine |
JPS5425A (en) * | 1977-06-03 | 1979-01-05 | Hitachi Ltd | Method of chamfering glass substrate |
JPS55146928A (en) * | 1979-05-02 | 1980-11-15 | Ulvac Corp | Manufacturing of photomask substrate |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6486341A (en) * | 1987-09-29 | 1989-03-31 | Sharp Kk | Optical disk |
JP2506123B2 (en) * | 1987-09-29 | 1996-06-12 | シャープ株式会社 | optical disk |
JP2003114501A (en) * | 2001-10-04 | 2003-04-18 | Konica Corp | Silver halide photographic plate and method for producing the same |
US7323276B2 (en) | 2003-03-26 | 2008-01-29 | Hoya Corporation | Substrate for photomask, photomask blank and photomask |
US8012563B2 (en) | 2003-07-18 | 2011-09-06 | Shin-Etsu Chemical Co., Ltd. | Large-size substrate |
JP2008257132A (en) * | 2007-04-09 | 2008-10-23 | Hoya Corp | Substrate for photomask blank and method for manufacturing the substrate, photomask blank, and photomask |
JP2010107613A (en) * | 2008-10-29 | 2010-05-13 | Tosoh Corp | Substrate for photomask and method for manufacturing the substrate |
Also Published As
Publication number | Publication date |
---|---|
JPS6134669B2 (en) | 1986-08-08 |
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