JPS5638475A - Fabrication of photomask - Google Patents

Fabrication of photomask

Info

Publication number
JPS5638475A
JPS5638475A JP11370779A JP11370779A JPS5638475A JP S5638475 A JPS5638475 A JP S5638475A JP 11370779 A JP11370779 A JP 11370779A JP 11370779 A JP11370779 A JP 11370779A JP S5638475 A JPS5638475 A JP S5638475A
Authority
JP
Japan
Prior art keywords
thin film
resist film
substrate plate
mark
standard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11370779A
Other languages
English (en)
Japanese (ja)
Other versions
JPS636862B2 (enrdf_load_stackoverflow
Inventor
Takeari Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11370779A priority Critical patent/JPS5638475A/ja
Publication of JPS5638475A publication Critical patent/JPS5638475A/ja
Publication of JPS636862B2 publication Critical patent/JPS636862B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11370779A 1979-09-05 1979-09-05 Fabrication of photomask Granted JPS5638475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11370779A JPS5638475A (en) 1979-09-05 1979-09-05 Fabrication of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11370779A JPS5638475A (en) 1979-09-05 1979-09-05 Fabrication of photomask

Publications (2)

Publication Number Publication Date
JPS5638475A true JPS5638475A (en) 1981-04-13
JPS636862B2 JPS636862B2 (enrdf_load_stackoverflow) 1988-02-12

Family

ID=14619119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11370779A Granted JPS5638475A (en) 1979-09-05 1979-09-05 Fabrication of photomask

Country Status (1)

Country Link
JP (1) JPS5638475A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6548213B2 (en) 1988-11-22 2003-04-15 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6482395B2 (ja) 2015-06-15 2019-03-13 株式会社ブリヂストン 空気入りタイヤ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251874A (en) * 1975-10-22 1977-04-26 Jeol Ltd Electron beam exposure device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251874A (en) * 1975-10-22 1977-04-26 Jeol Ltd Electron beam exposure device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6548213B2 (en) 1988-11-22 2003-04-15 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US6733933B2 (en) 1988-11-22 2004-05-11 Renesas Technology Corporation Mask for manufacturing semiconductor device and method of manufacture thereof
US7008736B2 (en) 1988-11-22 2006-03-07 Renesas Technology Corp. Semiconductor integrated circuit device fabrication method using a mask having a phase shifting film covering region and an opening region

Also Published As

Publication number Publication date
JPS636862B2 (enrdf_load_stackoverflow) 1988-02-12

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