JPS5584938A - Production of photo mask - Google Patents
Production of photo maskInfo
- Publication number
- JPS5584938A JPS5584938A JP16546478A JP16546478A JPS5584938A JP S5584938 A JPS5584938 A JP S5584938A JP 16546478 A JP16546478 A JP 16546478A JP 16546478 A JP16546478 A JP 16546478A JP S5584938 A JPS5584938 A JP S5584938A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mask
- remaining
- positioning
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To correct at high precision and obtain a photo mask for integrated circuit device having fine and delicate pattern, by positioning the light shielding film remaining on a mask substrate by using electron beam, when producing patterns which become photo mask. CONSTITUTION:The position 5 (X1, Y1) of a light shielding film (Cr film) remaining in a pattern region 2 on a light transmitting substrate 1 is detected by reference of positioning lmarks 41, 42 provided on outer Cr film 3. The pattern 2 is covered with a covered with a conductive thin film 6, and a resist 8 is further provided on the film 6. Prior to forming the film 6, the film 3 is formed with an insulating film 7, and the film 8 is provided so that the positioning marks 41, 42 may not be filled with the film 6, then the film 7 covering the marks 41, 42 is removed. A secondary electron detector is fitted to electron beam exposure device, and accurate positioning is achieved by the difference eta of secondary reflections of the Cr film 3 and substrate 1. Then, using a fine electron beam, the part of remaining light shielding film 5 is radiated, and developed, and the resist 8 is removed. Then, using the film 8 as the mask, the remaining Cr film 5 is removed, then the films 7, 6, 8 are all removed, so that a mask is completed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16546478A JPS5584938A (en) | 1978-12-20 | 1978-12-20 | Production of photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16546478A JPS5584938A (en) | 1978-12-20 | 1978-12-20 | Production of photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5584938A true JPS5584938A (en) | 1980-06-26 |
Family
ID=15812906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16546478A Pending JPS5584938A (en) | 1978-12-20 | 1978-12-20 | Production of photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5584938A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5870226A (en) * | 1981-10-23 | 1983-04-26 | Nec Kyushu Ltd | Photomask |
JPS63299124A (en) * | 1987-05-29 | 1988-12-06 | Hitachi Ltd | X-ray exposure mask |
-
1978
- 1978-12-20 JP JP16546478A patent/JPS5584938A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5870226A (en) * | 1981-10-23 | 1983-04-26 | Nec Kyushu Ltd | Photomask |
JPS63299124A (en) * | 1987-05-29 | 1988-12-06 | Hitachi Ltd | X-ray exposure mask |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5630129A (en) | Manufacture of photomask | |
JPS5584938A (en) | Production of photo mask | |
JPS57106128A (en) | Forming method for pattern | |
JPS5492061A (en) | Micropattern forming method | |
JPS542668A (en) | Manufacture of semiconductor device | |
JPS5621328A (en) | Method of making pattern | |
JPS5616129A (en) | Pattern forming method | |
JPS56137632A (en) | Pattern forming | |
JPS5772327A (en) | Formation of resist pattern | |
JPS5556629A (en) | Pattern forming method | |
JPS5616140A (en) | Production of photomask for contraction | |
JPS6421450A (en) | Production of mask | |
JPS5596952A (en) | Production of photomask | |
JPS5752056A (en) | Photomask | |
JPS5741637A (en) | Microstep tablet | |
JPS5748731A (en) | Manufacture of mask | |
JPS5388728A (en) | Method of forming pattern | |
JPS53136969A (en) | Photomask | |
JPS55165631A (en) | Manufacture of semiconductor device | |
JPS57212445A (en) | Production of photomask | |
JPS5492063A (en) | Manufacture of semiconductor device | |
JPS5638475A (en) | Fabrication of photomask | |
JPS55156329A (en) | Manufacture for integrated element | |
JPS56107241A (en) | Dry etching method | |
JPS56107555A (en) | Detection of position of electron beam |