JPS636862B2 - - Google Patents

Info

Publication number
JPS636862B2
JPS636862B2 JP54113707A JP11370779A JPS636862B2 JP S636862 B2 JPS636862 B2 JP S636862B2 JP 54113707 A JP54113707 A JP 54113707A JP 11370779 A JP11370779 A JP 11370779A JP S636862 B2 JPS636862 B2 JP S636862B2
Authority
JP
Japan
Prior art keywords
electron beam
pattern
photomask
mask substrate
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54113707A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5638475A (en
Inventor
Takeari Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11370779A priority Critical patent/JPS5638475A/ja
Publication of JPS5638475A publication Critical patent/JPS5638475A/ja
Publication of JPS636862B2 publication Critical patent/JPS636862B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11370779A 1979-09-05 1979-09-05 Fabrication of photomask Granted JPS5638475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11370779A JPS5638475A (en) 1979-09-05 1979-09-05 Fabrication of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11370779A JPS5638475A (en) 1979-09-05 1979-09-05 Fabrication of photomask

Publications (2)

Publication Number Publication Date
JPS5638475A JPS5638475A (en) 1981-04-13
JPS636862B2 true JPS636862B2 (enrdf_load_stackoverflow) 1988-02-12

Family

ID=14619119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11370779A Granted JPS5638475A (en) 1979-09-05 1979-09-05 Fabrication of photomask

Country Status (1)

Country Link
JP (1) JPS5638475A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10960711B2 (en) 2015-06-15 2021-03-30 Bridgestone Corporation Pneumatic tire

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2710967B2 (ja) 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251874A (en) * 1975-10-22 1977-04-26 Jeol Ltd Electron beam exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10960711B2 (en) 2015-06-15 2021-03-30 Bridgestone Corporation Pneumatic tire

Also Published As

Publication number Publication date
JPS5638475A (en) 1981-04-13

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