JPS56167330A - Fine pattern forming method - Google Patents

Fine pattern forming method

Info

Publication number
JPS56167330A
JPS56167330A JP7180580A JP7180580A JPS56167330A JP S56167330 A JPS56167330 A JP S56167330A JP 7180580 A JP7180580 A JP 7180580A JP 7180580 A JP7180580 A JP 7180580A JP S56167330 A JPS56167330 A JP S56167330A
Authority
JP
Japan
Prior art keywords
ion
resist
specimen
coating
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7180580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6230493B2 (enrdf_load_stackoverflow
Inventor
Kazue Yoshida
Hiroki Kuwano
Shinichi Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7180580A priority Critical patent/JPS56167330A/ja
Publication of JPS56167330A publication Critical patent/JPS56167330A/ja
Publication of JPS6230493B2 publication Critical patent/JPS6230493B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
JP7180580A 1980-05-29 1980-05-29 Fine pattern forming method Granted JPS56167330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7180580A JPS56167330A (en) 1980-05-29 1980-05-29 Fine pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7180580A JPS56167330A (en) 1980-05-29 1980-05-29 Fine pattern forming method

Publications (2)

Publication Number Publication Date
JPS56167330A true JPS56167330A (en) 1981-12-23
JPS6230493B2 JPS6230493B2 (enrdf_load_stackoverflow) 1987-07-02

Family

ID=13471142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7180580A Granted JPS56167330A (en) 1980-05-29 1980-05-29 Fine pattern forming method

Country Status (1)

Country Link
JP (1) JPS56167330A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5976428A (ja) * 1982-10-26 1984-05-01 Nippon Telegr & Teleph Corp <Ntt> 微細パタ−ン形成法
JPS60105230A (ja) * 1983-11-12 1985-06-10 Fujitsu Ltd パタ−ン形成方法
US12230506B2 (en) 2020-06-24 2025-02-18 Asm Ip Holding B.V. Area selective organic material removal

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0223187U (enrdf_load_stackoverflow) * 1988-07-25 1990-02-15

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4828121A (enrdf_load_stackoverflow) * 1971-12-22 1973-04-13
JPS5028237A (enrdf_load_stackoverflow) * 1973-07-11 1975-03-22
JPS5228267A (en) * 1975-08-28 1977-03-03 Nippon Telegr & Teleph Corp <Ntt> Minute processing
JPS53142180A (en) * 1977-05-18 1978-12-11 Agency Of Ind Science & Technol Pattern transcribing method and transcribing intermediate body

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4828121A (enrdf_load_stackoverflow) * 1971-12-22 1973-04-13
JPS5028237A (enrdf_load_stackoverflow) * 1973-07-11 1975-03-22
JPS5228267A (en) * 1975-08-28 1977-03-03 Nippon Telegr & Teleph Corp <Ntt> Minute processing
JPS53142180A (en) * 1977-05-18 1978-12-11 Agency Of Ind Science & Technol Pattern transcribing method and transcribing intermediate body

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5976428A (ja) * 1982-10-26 1984-05-01 Nippon Telegr & Teleph Corp <Ntt> 微細パタ−ン形成法
JPS60105230A (ja) * 1983-11-12 1985-06-10 Fujitsu Ltd パタ−ン形成方法
US12230506B2 (en) 2020-06-24 2025-02-18 Asm Ip Holding B.V. Area selective organic material removal

Also Published As

Publication number Publication date
JPS6230493B2 (enrdf_load_stackoverflow) 1987-07-02

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