JPS56114951A - Method for correcting mask pattern defect - Google Patents

Method for correcting mask pattern defect

Info

Publication number
JPS56114951A
JPS56114951A JP1885880A JP1885880A JPS56114951A JP S56114951 A JPS56114951 A JP S56114951A JP 1885880 A JP1885880 A JP 1885880A JP 1885880 A JP1885880 A JP 1885880A JP S56114951 A JPS56114951 A JP S56114951A
Authority
JP
Japan
Prior art keywords
substrate
layer
mask
defect
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1885880A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6157625B2 (enrdf_load_stackoverflow
Inventor
Yoshikazu Obayashi
Shigeo Uotani
Hiroji Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1885880A priority Critical patent/JPS56114951A/ja
Publication of JPS56114951A publication Critical patent/JPS56114951A/ja
Publication of JPS6157625B2 publication Critical patent/JPS6157625B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1885880A 1980-02-18 1980-02-18 Method for correcting mask pattern defect Granted JPS56114951A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1885880A JPS56114951A (en) 1980-02-18 1980-02-18 Method for correcting mask pattern defect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1885880A JPS56114951A (en) 1980-02-18 1980-02-18 Method for correcting mask pattern defect

Publications (2)

Publication Number Publication Date
JPS56114951A true JPS56114951A (en) 1981-09-09
JPS6157625B2 JPS6157625B2 (enrdf_load_stackoverflow) 1986-12-08

Family

ID=11983231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1885880A Granted JPS56114951A (en) 1980-02-18 1980-02-18 Method for correcting mask pattern defect

Country Status (1)

Country Link
JP (1) JPS56114951A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法
JP2009251119A (ja) * 2008-04-02 2009-10-29 Ntn Corp 転写部材

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法
JP2009251119A (ja) * 2008-04-02 2009-10-29 Ntn Corp 転写部材

Also Published As

Publication number Publication date
JPS6157625B2 (enrdf_load_stackoverflow) 1986-12-08

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