JPS6157625B2 - - Google Patents
Info
- Publication number
- JPS6157625B2 JPS6157625B2 JP1885880A JP1885880A JPS6157625B2 JP S6157625 B2 JPS6157625 B2 JP S6157625B2 JP 1885880 A JP1885880 A JP 1885880A JP 1885880 A JP1885880 A JP 1885880A JP S6157625 B2 JPS6157625 B2 JP S6157625B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- mask
- substance
- defects
- coating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007547 defect Effects 0.000 claims description 23
- 239000006023 eutectic alloy Substances 0.000 claims description 11
- 230000002950 deficient Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 239000011247 coating layer Substances 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 4
- 230000005496 eutectics Effects 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011651 chromium Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1885880A JPS56114951A (en) | 1980-02-18 | 1980-02-18 | Method for correcting mask pattern defect |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1885880A JPS56114951A (en) | 1980-02-18 | 1980-02-18 | Method for correcting mask pattern defect |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56114951A JPS56114951A (en) | 1981-09-09 |
| JPS6157625B2 true JPS6157625B2 (enrdf_load_stackoverflow) | 1986-12-08 |
Family
ID=11983231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1885880A Granted JPS56114951A (en) | 1980-02-18 | 1980-02-18 | Method for correcting mask pattern defect |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56114951A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2803259B2 (ja) * | 1989-12-12 | 1998-09-24 | 三菱電機株式会社 | マスクのパターン欠け欠陥の修正方法 |
| JP2009251119A (ja) * | 2008-04-02 | 2009-10-29 | Ntn Corp | 転写部材 |
-
1980
- 1980-02-18 JP JP1885880A patent/JPS56114951A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56114951A (en) | 1981-09-09 |
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