JPS56110267A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS56110267A JPS56110267A JP1335280A JP1335280A JPS56110267A JP S56110267 A JPS56110267 A JP S56110267A JP 1335280 A JP1335280 A JP 1335280A JP 1335280 A JP1335280 A JP 1335280A JP S56110267 A JPS56110267 A JP S56110267A
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline silicon
- straight line
- bent part
- line part
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/20—Resistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Amplifiers (AREA)
- Protection Of Static Devices (AREA)
Abstract
PURPOSE:To improve withstand electrostatic property without a change in circuit layout by thickening the coat of polycrystalline silicon resistor at the curveture or the bent part. CONSTITUTION:A polycrystalline silicon resistance bent part 11 across the straight line part 3 of polycrystalline silicon resistor has a coat gradually becoming thicker from the straight line part. This structure allows more than two laminated layers of polycrystalline silicon to be continuously formed on the bent part of polycrystalline silicon resistor in the process of manufacturing MOSIC using more than two laminated layers of polycrystalline silicon. This formation can easily be realized. The number 12 indicates a semiconductor for substrate, 13 a field insulation film, 15 a polycrystalline silicon thermaloxidized film, 3 a multicrystal silicon resistance straight line part and 14 an insulation film cover.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1335280A JPS56110267A (en) | 1980-02-06 | 1980-02-06 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1335280A JPS56110267A (en) | 1980-02-06 | 1980-02-06 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56110267A true JPS56110267A (en) | 1981-09-01 |
Family
ID=11830702
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1335280A Pending JPS56110267A (en) | 1980-02-06 | 1980-02-06 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56110267A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6324712A (en) * | 1986-07-17 | 1988-02-02 | Toshiba Corp | Mos-type semiconductor circuit |
JPH0590521A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
JPH0590523A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
JPH0590522A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
-
1980
- 1980-02-06 JP JP1335280A patent/JPS56110267A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6324712A (en) * | 1986-07-17 | 1988-02-02 | Toshiba Corp | Mos-type semiconductor circuit |
JPH0590521A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
JPH0590523A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
JPH0590522A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
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