JPS5610926A - Electron beam drawing device - Google Patents
Electron beam drawing deviceInfo
- Publication number
- JPS5610926A JPS5610926A JP8498379A JP8498379A JPS5610926A JP S5610926 A JPS5610926 A JP S5610926A JP 8498379 A JP8498379 A JP 8498379A JP 8498379 A JP8498379 A JP 8498379A JP S5610926 A JPS5610926 A JP S5610926A
- Authority
- JP
- Japan
- Prior art keywords
- diaphragm
- electron
- linear
- deflector
- aperture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 238000007493 shaping process Methods 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8498379A JPS5610926A (en) | 1979-07-06 | 1979-07-06 | Electron beam drawing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8498379A JPS5610926A (en) | 1979-07-06 | 1979-07-06 | Electron beam drawing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5610926A true JPS5610926A (en) | 1981-02-03 |
JPS6161251B2 JPS6161251B2 (OSRAM) | 1986-12-24 |
Family
ID=13845843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8498379A Granted JPS5610926A (en) | 1979-07-06 | 1979-07-06 | Electron beam drawing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5610926A (OSRAM) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58189204A (ja) * | 1982-04-30 | 1983-11-04 | Konishiroku Photo Ind Co Ltd | 高分子重合体の製造方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6414435U (OSRAM) * | 1987-07-14 | 1989-01-25 | ||
JPH0344043U (OSRAM) * | 1989-09-08 | 1991-04-24 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52103967A (en) * | 1976-02-05 | 1977-08-31 | Western Electric Co | Method of iluminating surface of material to be machined and apparatus therefor |
JPS5316578A (en) * | 1976-07-30 | 1978-02-15 | Toshiba Corp | Electron beam exposure apparatus |
JPS545663A (en) * | 1977-06-15 | 1979-01-17 | Cho Lsi Gijutsu Kenkyu Kumiai | Device for exposing electron beam |
JPS5413755A (en) * | 1977-06-30 | 1979-02-01 | Raytheon Co | Output coupler |
JPS5454581A (en) * | 1977-10-11 | 1979-04-28 | Fujitsu Ltd | Electron beam exposure apparatus |
-
1979
- 1979-07-06 JP JP8498379A patent/JPS5610926A/ja active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52103967A (en) * | 1976-02-05 | 1977-08-31 | Western Electric Co | Method of iluminating surface of material to be machined and apparatus therefor |
JPS5316578A (en) * | 1976-07-30 | 1978-02-15 | Toshiba Corp | Electron beam exposure apparatus |
JPS545663A (en) * | 1977-06-15 | 1979-01-17 | Cho Lsi Gijutsu Kenkyu Kumiai | Device for exposing electron beam |
JPS5413755A (en) * | 1977-06-30 | 1979-02-01 | Raytheon Co | Output coupler |
JPS5454581A (en) * | 1977-10-11 | 1979-04-28 | Fujitsu Ltd | Electron beam exposure apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58189204A (ja) * | 1982-04-30 | 1983-11-04 | Konishiroku Photo Ind Co Ltd | 高分子重合体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6161251B2 (OSRAM) | 1986-12-24 |
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