JPS5610926A - Electron beam drawing device - Google Patents

Electron beam drawing device

Info

Publication number
JPS5610926A
JPS5610926A JP8498379A JP8498379A JPS5610926A JP S5610926 A JPS5610926 A JP S5610926A JP 8498379 A JP8498379 A JP 8498379A JP 8498379 A JP8498379 A JP 8498379A JP S5610926 A JPS5610926 A JP S5610926A
Authority
JP
Japan
Prior art keywords
diaphragm
electron
linear
deflector
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8498379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6161251B2 (OSRAM
Inventor
Naotake Saito
Susumu Ozasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8498379A priority Critical patent/JPS5610926A/ja
Publication of JPS5610926A publication Critical patent/JPS5610926A/ja
Publication of JPS6161251B2 publication Critical patent/JPS6161251B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP8498379A 1979-07-06 1979-07-06 Electron beam drawing device Granted JPS5610926A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8498379A JPS5610926A (en) 1979-07-06 1979-07-06 Electron beam drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8498379A JPS5610926A (en) 1979-07-06 1979-07-06 Electron beam drawing device

Publications (2)

Publication Number Publication Date
JPS5610926A true JPS5610926A (en) 1981-02-03
JPS6161251B2 JPS6161251B2 (OSRAM) 1986-12-24

Family

ID=13845843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8498379A Granted JPS5610926A (en) 1979-07-06 1979-07-06 Electron beam drawing device

Country Status (1)

Country Link
JP (1) JPS5610926A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58189204A (ja) * 1982-04-30 1983-11-04 Konishiroku Photo Ind Co Ltd 高分子重合体の製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414435U (OSRAM) * 1987-07-14 1989-01-25
JPH0344043U (OSRAM) * 1989-09-08 1991-04-24

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS545663A (en) * 1977-06-15 1979-01-17 Cho Lsi Gijutsu Kenkyu Kumiai Device for exposing electron beam
JPS5413755A (en) * 1977-06-30 1979-02-01 Raytheon Co Output coupler
JPS5454581A (en) * 1977-10-11 1979-04-28 Fujitsu Ltd Electron beam exposure apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS545663A (en) * 1977-06-15 1979-01-17 Cho Lsi Gijutsu Kenkyu Kumiai Device for exposing electron beam
JPS5413755A (en) * 1977-06-30 1979-02-01 Raytheon Co Output coupler
JPS5454581A (en) * 1977-10-11 1979-04-28 Fujitsu Ltd Electron beam exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58189204A (ja) * 1982-04-30 1983-11-04 Konishiroku Photo Ind Co Ltd 高分子重合体の製造方法

Also Published As

Publication number Publication date
JPS6161251B2 (OSRAM) 1986-12-24

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