JPS56108259A - Semiconductor memory device - Google Patents

Semiconductor memory device

Info

Publication number
JPS56108259A
JPS56108259A JP992980A JP992980A JPS56108259A JP S56108259 A JPS56108259 A JP S56108259A JP 992980 A JP992980 A JP 992980A JP 992980 A JP992980 A JP 992980A JP S56108259 A JPS56108259 A JP S56108259A
Authority
JP
Japan
Prior art keywords
selecting
bit lines
lines
line
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP992980A
Other languages
English (en)
Inventor
Jun Sugiura
Yasunobu Osa
Kazuhiro Komori
Ken Uchida
Shinji Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP992980A priority Critical patent/JPS56108259A/ja
Priority to US06/228,086 priority patent/US4451904A/en
Priority to DE19813103143 priority patent/DE3103143A1/de
Publication of JPS56108259A publication Critical patent/JPS56108259A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B69/00Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
JP992980A 1980-02-01 1980-02-01 Semiconductor memory device Pending JPS56108259A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP992980A JPS56108259A (en) 1980-02-01 1980-02-01 Semiconductor memory device
US06/228,086 US4451904A (en) 1980-02-01 1981-01-26 Semiconductor memory device
DE19813103143 DE3103143A1 (de) 1980-02-01 1981-01-30 Halbleiterspeicher

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP992980A JPS56108259A (en) 1980-02-01 1980-02-01 Semiconductor memory device

Publications (1)

Publication Number Publication Date
JPS56108259A true JPS56108259A (en) 1981-08-27

Family

ID=11733752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP992980A Pending JPS56108259A (en) 1980-02-01 1980-02-01 Semiconductor memory device

Country Status (3)

Country Link
US (1) US4451904A (ja)
JP (1) JPS56108259A (ja)
DE (1) DE3103143A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61136274A (ja) * 1984-12-07 1986-06-24 Toshiba Corp 半導体装置
JPH02291168A (ja) * 1989-03-15 1990-11-30 Sgs Thomson Microelectron Srl Epromメモリセル構造

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5713772A (en) * 1980-06-30 1982-01-23 Hitachi Ltd Semiconductor device and manufacture thereof
DE3141390A1 (de) * 1981-10-19 1983-04-28 Deutsche Itt Industries Gmbh, 7800 Freiburg Floating-gate-speicherzelle, bei der das schreiben und loeschen durch injektion heisser ladungstraeger erfolgt
US4590504A (en) * 1982-12-28 1986-05-20 Thomson Components - Mostek Corporation Nonvolatile MOS memory cell with tunneling element
US4949154A (en) * 1983-02-23 1990-08-14 Texas Instruments, Incorporated Thin dielectrics over polysilicon
US4697330A (en) * 1983-02-23 1987-10-06 Texas Instruments Incorporated Floating gate memory process with improved dielectric
USRE34535E (en) * 1983-02-23 1994-02-08 Texas Instruments Incorporated Floating gate memory with improved dielectric
US4701776A (en) * 1983-08-29 1987-10-20 Seeq Technology, Inc. MOS floating gate memory cell and process for fabricating same
US4769340A (en) * 1983-11-28 1988-09-06 Exel Microelectronics, Inc. Method for making electrically programmable memory device by doping the floating gate by implant
US4654825A (en) * 1984-01-06 1987-03-31 Advanced Micro Devices, Inc. E2 prom memory cell
JP2515715B2 (ja) * 1984-02-24 1996-07-10 株式会社日立製作所 半導体集積回路装置の製造方法
IT1213241B (it) * 1984-11-07 1989-12-14 Ates Componenti Elettron Matrice di memoria eprom con celle elementari simmetriche mos e suo metodo di scrittura.
FR2603128B1 (fr) * 1986-08-21 1988-11-10 Commissariat Energie Atomique Cellule de memoire eprom et son procede de fabrication
US5168334A (en) * 1987-07-31 1992-12-01 Texas Instruments, Incorporated Non-volatile semiconductor memory
US4812885A (en) * 1987-08-04 1989-03-14 Texas Instruments Incorporated Capacitive coupling
US4780424A (en) * 1987-09-28 1988-10-25 Intel Corporation Process for fabricating electrically alterable floating gate memory devices
JPH021988A (ja) * 1987-12-03 1990-01-08 Texas Instr Inc <Ti> 電気的にプログラム可能なメモリ・セル
JPH0797608B2 (ja) * 1988-10-19 1995-10-18 株式会社東芝 不揮発性半導体メモリおよびその製造方法
US5262846A (en) * 1988-11-14 1993-11-16 Texas Instruments Incorporated Contact-free floating-gate memory array with silicided buried bitlines and with single-step-defined floating gates
JP2772020B2 (ja) * 1989-02-22 1998-07-02 株式会社東芝 Mos型半導体装置
US5172198A (en) * 1989-02-22 1992-12-15 Kabushiki Kaisha Toshiba MOS type semiconductor device
IT1229131B (it) * 1989-03-09 1991-07-22 Sgs Thomson Microelectronics Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione.
JPH088316B2 (ja) * 1990-01-31 1996-01-29 株式会社東芝 紫外線消去型不揮発性半導体メモリ装置
US5371031A (en) * 1990-08-01 1994-12-06 Texas Instruments Incorporated Method of making EEPROM array with buried N+ windows and with separate erasing and programming regions
US5273926A (en) * 1991-06-27 1993-12-28 Texas Instruments Incorporated Method of making flash EEPROM or merged FAMOS cell without alignment sensitivity
US5218568A (en) * 1991-12-17 1993-06-08 Texas Instruments Incorporated Electrically-erasable, electrically-programmable read-only memory cell, an array of such cells and methods for making and using the same
EP0552531B1 (en) * 1992-01-22 2000-08-16 Macronix International Co., Ltd. Non-volatile memory cell and array architecture
GB9217743D0 (en) * 1992-08-19 1992-09-30 Philips Electronics Uk Ltd A semiconductor memory device
EP0830684B1 (en) * 1995-06-07 2004-08-25 Macronix International Co., Ltd. Automatic programming algorithm for page mode flash memory with variable programming pulse height and pulse width
DE19946884A1 (de) * 1999-09-30 2001-04-12 Micronas Gmbh Eprom-Struktur für Halbleiterspeicher
US8017480B2 (en) * 2006-06-13 2011-09-13 Macronix International Co., Ltd. Apparatus and associated method for making a floating gate cell in a virtual ground array

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4122544A (en) * 1976-12-27 1978-10-24 Texas Instruments Incorporated Electrically alterable floating gate semiconductor memory device with series enhancement transistor
US4173791A (en) * 1977-09-16 1979-11-06 Fairchild Camera And Instrument Corporation Insulated gate field-effect transistor read-only memory array
US4145759A (en) * 1978-04-13 1979-03-20 Motorola, Inc. Virtual power supply ROM
US4335391A (en) * 1978-12-11 1982-06-15 Texas Instruments Incorporated Non-volatile semiconductor memory elements and methods of making
JPS5654693A (en) * 1979-10-05 1981-05-14 Hitachi Ltd Programable rom

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61136274A (ja) * 1984-12-07 1986-06-24 Toshiba Corp 半導体装置
JPH02291168A (ja) * 1989-03-15 1990-11-30 Sgs Thomson Microelectron Srl Epromメモリセル構造

Also Published As

Publication number Publication date
DE3103143A1 (de) 1981-12-03
US4451904A (en) 1984-05-29

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