IT1229131B - Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione. - Google Patents

Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione.

Info

Publication number
IT1229131B
IT1229131B IT8919697A IT1969789A IT1229131B IT 1229131 B IT1229131 B IT 1229131B IT 8919697 A IT8919697 A IT 8919697A IT 1969789 A IT1969789 A IT 1969789A IT 1229131 B IT1229131 B IT 1229131B
Authority
IT
Italy
Prior art keywords
procedure
manufacture
eprom memory
memory matrix
tablecloth
Prior art date
Application number
IT8919697A
Other languages
English (en)
Other versions
IT8919697A0 (it
Inventor
Orio Bellezza
Massimo Melanotte
Original Assignee
Sgs Thomson Microelectronics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sgs Thomson Microelectronics filed Critical Sgs Thomson Microelectronics
Priority to IT8919697A priority Critical patent/IT1229131B/it
Publication of IT8919697A0 publication Critical patent/IT8919697A0/it
Priority to DE69022865T priority patent/DE69022865T2/de
Priority to EP90104002A priority patent/EP0386631B1/en
Priority to US07/487,480 priority patent/US5117269A/en
Priority to JP2057858A priority patent/JP2814129B2/ja
Application granted granted Critical
Publication of IT1229131B publication Critical patent/IT1229131B/it

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
IT8919697A 1989-03-09 1989-03-09 Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione. IT1229131B (it)

Priority Applications (5)

Application Number Priority Date Filing Date Title
IT8919697A IT1229131B (it) 1989-03-09 1989-03-09 Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione.
DE69022865T DE69022865T2 (de) 1989-03-09 1990-03-01 EPROM-Speicheranordnung mit Crosspoint-Konfiguration und Verfahren zu ihrer Herstellung.
EP90104002A EP0386631B1 (en) 1989-03-09 1990-03-01 Eprom memory with crosspoint configuration and method for its manufacture
US07/487,480 US5117269A (en) 1989-03-09 1990-03-02 Eprom memory array with crosspoint configuration
JP2057858A JP2814129B2 (ja) 1989-03-09 1990-03-08 交差点形状を有するｅｐｒｏｍメモリアレイおよびその製造のための方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8919697A IT1229131B (it) 1989-03-09 1989-03-09 Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione.

Publications (2)

Publication Number Publication Date
IT8919697A0 IT8919697A0 (it) 1989-03-09
IT1229131B true IT1229131B (it) 1991-07-22

Family

ID=11160468

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8919697A IT1229131B (it) 1989-03-09 1989-03-09 Matrice di memoria eprom con struttura a tovaglia e procedimento per la sua fabbricazione.

Country Status (5)

Country Link
US (1) US5117269A (it)
EP (1) EP0386631B1 (it)
JP (1) JP2814129B2 (it)
DE (1) DE69022865T2 (it)
IT (1) IT1229131B (it)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2755781B2 (ja) * 1990-04-23 1998-05-25 株式会社東芝 半導体記憶装置およびその製造方法
TW232092B (it) * 1991-07-01 1994-10-11 Sharp Kk
US5268585A (en) * 1991-07-01 1993-12-07 Sharp Kabushiki Kaisha Non-volatile memory and method of manufacturing the same
US5618742A (en) * 1992-01-22 1997-04-08 Macronix Internatioal, Ltd. Method of making flash EPROM with conductive sidewall spacer contacting floating gate
EP0552531B1 (en) * 1992-01-22 2000-08-16 Macronix International Co., Ltd. Non-volatile memory cell and array architecture
US5526307A (en) * 1992-01-22 1996-06-11 Macronix International Co., Ltd. Flash EPROM integrated circuit architecture
JP3522788B2 (ja) * 1992-10-29 2004-04-26 株式会社ルネサステクノロジ 半導体集積回路装置
US5313419A (en) * 1993-02-01 1994-05-17 National Semiconductor Corporation Self-aligned trench isolation scheme for select transistors in an alternate metal virtual ground (AMG) EPROM array
DE4333978A1 (de) * 1993-10-05 1995-04-13 Gold Star Electronics Nichtflüchtiger Halbleiterspeicher und Verfahren zu dessen Herstellung
JP3474614B2 (ja) * 1993-12-14 2003-12-08 マクロニクス インターナショナル カンパニイ リミテッド 不揮発性半導体メモリ装置及びその動作方法
DE69514502T2 (de) * 1995-05-05 2000-08-03 Stmicroelectronics S.R.L., Agrate Brianza Nichtflüchtige Speicheranordnung mit Sektoren, deren Grösse und Anzahl bestimmbar sind
DE69520665T2 (de) * 1995-05-05 2001-08-30 Stmicroelectronics S.R.L., Agrate Brianza Anordnung von nichtflüchtigen EEPROM,insbesondere Flash-EEPROM
EP0741415A1 (en) * 1995-05-05 1996-11-06 STMicroelectronics S.r.l. Flash-EEPROM memory with contactless memory cells
DE69533429T2 (de) * 1995-06-07 2005-08-18 Macronix International Co. Ltd., Hsinchu Automatischer progammier-algorithmus für flash-speicher im seitenmodus mit variabler programmierimpulshöhe und -breite
EP1017097A1 (en) 1998-12-29 2000-07-05 STMicroelectronics S.r.l. Manufacturing method of salicide contacts for non-volatile memory
JP2002050705A (ja) * 2000-08-01 2002-02-15 Fujitsu Ltd 半導体記憶装置及びその製造方法
KR100455282B1 (ko) * 2001-01-11 2004-11-08 삼성전자주식회사 램 및 롬 기능을 갖는 단일 트랜지스터를 포함하는 메모리소자와 그 동작 및 제조방법
US7030488B2 (en) 2001-10-30 2006-04-18 Intel Corporation Packaged combination memory for electronic devices

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54156484A (en) * 1978-05-30 1979-12-10 Nec Corp Non-volatile semiconductor memory device
JPS6048111B2 (ja) * 1978-05-30 1985-10-25 日本電気株式会社 不揮発性半導体記憶装置
US4342099A (en) * 1979-06-18 1982-07-27 Texas Instruments Incorporated Electrically erasable programmable MNOS read only memory
US4554643A (en) * 1979-06-18 1985-11-19 Texas Instruments Incorporated Electrically erasable programmable MNOS read only memory
US4493057A (en) * 1980-01-07 1985-01-08 Texas Instruments Incorporated Method of making high density semiconductor device such as floating gate electrically programmable ROM or the like
JPS56108259A (en) * 1980-02-01 1981-08-27 Hitachi Ltd Semiconductor memory device
JPS5743470A (en) * 1980-08-29 1982-03-11 Fujitsu Ltd Semiconductor device
JPS57102073A (en) * 1980-12-16 1982-06-24 Mitsubishi Electric Corp Semiconductor memory and manufacture thereof
JPS6130063A (ja) * 1984-07-23 1986-02-12 Nec Corp 不揮発性半導体記憶装置
IT1213218B (it) * 1984-09-25 1989-12-14 Ates Componenti Elettron Processo per la fabbricazione di una cella di memoria non volatile con area di ossido sottile di dimensioni molto piccole, e cella ottenuta con il processo suddetto.
IT1213241B (it) * 1984-11-07 1989-12-14 Ates Componenti Elettron Matrice di memoria eprom con celle elementari simmetriche mos e suo metodo di scrittura.
US4597060A (en) * 1985-05-01 1986-06-24 Texas Instruments Incorporated EPROM array and method for fabricating
US4698900A (en) * 1986-03-27 1987-10-13 Texas Instruments Incorporated Method of making a non-volatile memory having dielectric filled trenches
IT1215380B (it) * 1987-03-12 1990-02-08 Sgs Microelettronica Spa Cella di memoria eprom a due semicelle simmetriche con gate flottante separata.
US4853895A (en) * 1987-11-30 1989-08-01 Texas Instruments Incorporated EEPROM including programming electrode extending through the control gate electrode
US4924437A (en) * 1987-12-09 1990-05-08 Texas Instruments Incorporated Erasable programmable memory including buried diffusion source/drain lines and erase lines
FR2634318B1 (fr) * 1988-07-13 1992-02-21 Commissariat Energie Atomique Procede de fabrication d'une cellule de memoire integree
US5008721A (en) * 1988-07-15 1991-04-16 Texas Instruments Incorporated Electrically-erasable, electrically-programmable read-only memory cell with self-aligned tunnel
US4912676A (en) * 1988-08-09 1990-03-27 Texas Instruments, Incorporated Erasable programmable memory
FR2635409B1 (fr) * 1988-08-11 1991-08-02 Sgs Thomson Microelectronics Memoire de type eprom a haute densite d'integration possedant un facteur de couplage eleve, et son procede de fabrication
US4994403A (en) * 1989-12-28 1991-02-19 Texas Instruments Incorporated Method of making an electrically programmable, electrically erasable memory array cell

Also Published As

Publication number Publication date
DE69022865D1 (de) 1995-11-16
US5117269A (en) 1992-05-26
EP0386631A2 (en) 1990-09-12
EP0386631B1 (en) 1995-10-11
EP0386631A3 (en) 1992-12-30
JP2814129B2 (ja) 1998-10-22
JPH02291167A (ja) 1990-11-30
IT8919697A0 (it) 1989-03-09
DE69022865T2 (de) 1996-05-23

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970329