JPS56103487A - Manufacture of gunn diode - Google Patents

Manufacture of gunn diode

Info

Publication number
JPS56103487A
JPS56103487A JP593780A JP593780A JPS56103487A JP S56103487 A JPS56103487 A JP S56103487A JP 593780 A JP593780 A JP 593780A JP 593780 A JP593780 A JP 593780A JP S56103487 A JPS56103487 A JP S56103487A
Authority
JP
Japan
Prior art keywords
gaas
layer
gaas layer
transition region
sulphur
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP593780A
Other languages
Japanese (ja)
Other versions
JPS6250996B2 (en
Inventor
Tsutomu Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP593780A priority Critical patent/JPS56103487A/en
Publication of JPS56103487A publication Critical patent/JPS56103487A/en
Publication of JPS6250996B2 publication Critical patent/JPS6250996B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N80/00Bulk negative-resistance effect devices
    • H10N80/01Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

PURPOSE:To enable to always constantly control the depth of an N-GaAs layer converted into a transition region by a method wherein an N<+>-GaAs layer is formed on the surface of the N-GaAs active layer and ions are injected. CONSTITUTION:An N<++> type buffer GaAs layer, the N-GaAs active layer 23 and the N<+>-GaAs layer 24 of sulphur or selenium doped are formed in sequence on the N<++>-GaAs substrate 21 by an epitaxial growth method. Thereafter, an impurity causing the sulphur or selenium which is kept doped in the N<+>-GaAs layer to be speed-up diffused is injected by the ion-injecting method and heat-treated, thereby enabling the N<++> type primary layer 26 and the constant thickness transition region to simultaneously be formed on the N-GaAs layer 23. Thus, the depth of the N-GaAs layer 23 converted to the transition region can always constantly be controlled. As a result, the Gunn diode less in fluctuation of the frequency is obtained.
JP593780A 1980-01-22 1980-01-22 Manufacture of gunn diode Granted JPS56103487A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP593780A JPS56103487A (en) 1980-01-22 1980-01-22 Manufacture of gunn diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP593780A JPS56103487A (en) 1980-01-22 1980-01-22 Manufacture of gunn diode

Publications (2)

Publication Number Publication Date
JPS56103487A true JPS56103487A (en) 1981-08-18
JPS6250996B2 JPS6250996B2 (en) 1987-10-28

Family

ID=11624805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP593780A Granted JPS56103487A (en) 1980-01-22 1980-01-22 Manufacture of gunn diode

Country Status (1)

Country Link
JP (1) JPS56103487A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1267417A3 (en) * 2001-06-14 2005-01-12 Ixys Corporation Semiconductor devices having group III-V compound layers
JP2009214944A (en) * 2004-02-17 2009-09-24 Menicon Singapore Pte Ltd Package
US10865028B2 (en) 2005-02-14 2020-12-15 Mentcon Singapore Pte Ltd. Heat sealable, retortable laminated foil

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1267417A3 (en) * 2001-06-14 2005-01-12 Ixys Corporation Semiconductor devices having group III-V compound layers
KR100768803B1 (en) * 2001-06-14 2007-10-19 익시스 코포레이션 Semiconductor devices having group ?-? compound layers
US10786057B2 (en) 2002-08-17 2020-09-29 Menicon Singapore Pte Ltd. Packaging for disposable soft contact lenses
JP2009214944A (en) * 2004-02-17 2009-09-24 Menicon Singapore Pte Ltd Package
US10865028B2 (en) 2005-02-14 2020-12-15 Mentcon Singapore Pte Ltd. Heat sealable, retortable laminated foil

Also Published As

Publication number Publication date
JPS6250996B2 (en) 1987-10-28

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