JPS57153487A - Manufacture of semiconductor light emitting device - Google Patents
Manufacture of semiconductor light emitting deviceInfo
- Publication number
- JPS57153487A JPS57153487A JP3851181A JP3851181A JPS57153487A JP S57153487 A JPS57153487 A JP S57153487A JP 3851181 A JP3851181 A JP 3851181A JP 3851181 A JP3851181 A JP 3851181A JP S57153487 A JPS57153487 A JP S57153487A
- Authority
- JP
- Japan
- Prior art keywords
- type
- substrate
- layer
- inp
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To grow a required epitaxial layer in a V shaped groove with fine reproductivity by slowing down super cooling speed and cooling speed of material melting liquid. CONSTITUTION:A V shaped groove 4 is formed with it tip reaching an n type InP substrate 1 penetrating a p type InP layer 2 by treating an InP substrate 3 of 100 face azimuth with different azimuth etching liquid. The direction in which the groove 4 is formed is either azimuth 00 or 011 according to etching liquid. Then an n type InP layers 5, 5' are grown respectively in the groove 4 and on the surface of the substrate 3 by bringing these in contact with InP melting liquid with its saturation temperature less than 10 deg.C at the speed less than 0.2 deg.C/min. to perform liquid phase epitaxial growth. Then n type Ga As P layers 6, 6', a p type InP layer 7, and a p type In Ga As P layer 8 are grown on the surface of the substrate 3. A required epitaxial layer is thus formed with fine reproductivity.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3851181A JPS57153487A (en) | 1981-03-17 | 1981-03-17 | Manufacture of semiconductor light emitting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3851181A JPS57153487A (en) | 1981-03-17 | 1981-03-17 | Manufacture of semiconductor light emitting device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57153487A true JPS57153487A (en) | 1982-09-22 |
Family
ID=12527287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3851181A Pending JPS57153487A (en) | 1981-03-17 | 1981-03-17 | Manufacture of semiconductor light emitting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57153487A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4631802A (en) * | 1980-06-24 | 1986-12-30 | Sumitomo Electric Industries, Ltd. | Process for the production of a semiconductor device |
-
1981
- 1981-03-17 JP JP3851181A patent/JPS57153487A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4631802A (en) * | 1980-06-24 | 1986-12-30 | Sumitomo Electric Industries, Ltd. | Process for the production of a semiconductor device |
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