JPS5629382A - Light emitting device of double hetero structure and manufacture thereof - Google Patents

Light emitting device of double hetero structure and manufacture thereof

Info

Publication number
JPS5629382A
JPS5629382A JP10499479A JP10499479A JPS5629382A JP S5629382 A JPS5629382 A JP S5629382A JP 10499479 A JP10499479 A JP 10499479A JP 10499479 A JP10499479 A JP 10499479A JP S5629382 A JPS5629382 A JP S5629382A
Authority
JP
Japan
Prior art keywords
layer
type
light emitting
liquid phase
gaas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10499479A
Other languages
Japanese (ja)
Inventor
Toshimasa Ishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP10499479A priority Critical patent/JPS5629382A/en
Publication of JPS5629382A publication Critical patent/JPS5629382A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/0004Devices characterised by their operation
    • H01L33/002Devices characterised by their operation having heterojunctions or graded gap
    • H01L33/0025Devices characterised by their operation having heterojunctions or graded gap comprising only AIIIBV compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To obtain the device having high light emitting efficiency by epitaxially growing an N type GaAlAs layer, a III-V group layer containing one or more kinds of Si and P type or N type impurites and a P type GaAlAs layer on an N type III- V group semiconductor substrate in a liquid phase and obtaining the double hetero structure. CONSTITUTION:At first, an N type GaAlAs layer 2 is epitaxially grown in a liquid phase in the slowly cooling process from the normal temperature at a decreasing speed of 1 deg.C/min on an N<+> type GaAs substrate 1 by using the solution comprising Ga, Al, As, and Te. Then, P type GaAs active layer 3 is epitaxially grown in a liquid phase on the layer 2 by slowly cooling at 1 deg.C/min by using the solution comprising Ga, GaAs, Si, and Te at the relatively low temperature of 800 deg.C. Thereafter, a P type GaAs layer 4 is grown on the layer 3, and an ohmic electrode 6 with a specified pattern is formed on the layer 4. An ohmic electrode 5 is deposited on all the surface of the back of the substrate 1. In this constitution, the compensation ratio of the active layer 3 is accurately adjusted, and the wavelength of the emitted light can be controlled at high light emitting efficiency.
JP10499479A 1979-08-20 1979-08-20 Light emitting device of double hetero structure and manufacture thereof Pending JPS5629382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10499479A JPS5629382A (en) 1979-08-20 1979-08-20 Light emitting device of double hetero structure and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10499479A JPS5629382A (en) 1979-08-20 1979-08-20 Light emitting device of double hetero structure and manufacture thereof

Publications (1)

Publication Number Publication Date
JPS5629382A true JPS5629382A (en) 1981-03-24

Family

ID=14395641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10499479A Pending JPS5629382A (en) 1979-08-20 1979-08-20 Light emitting device of double hetero structure and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS5629382A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59213179A (en) * 1983-05-19 1984-12-03 Toshiba Corp Light emitting element
EP0576105A2 (en) * 1988-07-05 1993-12-29 Hewlett-Packard Company P-side up double heterojunction AlGaAs light emitting diode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59213179A (en) * 1983-05-19 1984-12-03 Toshiba Corp Light emitting element
EP0576105A2 (en) * 1988-07-05 1993-12-29 Hewlett-Packard Company P-side up double heterojunction AlGaAs light emitting diode
EP0576105A3 (en) * 1988-07-05 1994-05-18 Hewlett Packard Co P-side up double heterojunction algaas light emitting diode

Similar Documents

Publication Publication Date Title
JPS5629382A (en) Light emitting device of double hetero structure and manufacture thereof
JPS5493380A (en) Semiconductor light emitting device
US3963537A (en) Process for the production of a semiconductor luminescence diode
JPS5737827A (en) Manufacture of semiconductor device
JPS54152879A (en) Structure of semiconductor laser element and its manufacture
JPS55165688A (en) Preparation of light emission semiconductor device
JPS5453974A (en) Manufacture for gallium phosphide green light emitting element
US4609411A (en) Liquid-phase epitaxial growth method of a IIIb-Vb group compound
JPS5724591A (en) Manufacture of semiconductor laser device
JPS561528A (en) Manufacture of epitaxial wafer of 3-5 group compound semiconductor
JPS5635411A (en) Epitaxial wafer of gallium arsenide and its manufacture
JPS5574195A (en) Manufacturing semiconductor laser
JPS5670676A (en) Luminous diode
JPS52146555A (en) Liquid phase epitaxial growth method
JPS5453977A (en) Manufacture for gallium phosphide green light emitting element
JPS5621386A (en) Manufacture of luminous element
JPS5795621A (en) Method of liquid phase epitaxial growth
JPS5319777A (en) Semiconductor laser
JPS55165689A (en) Preparation of light emission semiconductor device
JPS5624995A (en) Manufacture of semiconductor laser
JPS5534482A (en) Manufacturing method for semiconductor laser
JPS6442879A (en) Manufacture of semiconductor light-emitting element
JPS57153487A (en) Manufacture of semiconductor light emitting device
JPS5778132A (en) Liquid phase epitaxial growing method
JPS6449216A (en) Semiconductor crystal growth